Design of high‐χ block copolymers for lithography WJ Durand, G Blachut, MJ Maher, S Sirard, S Tein, MC Carlson, Y Asano, ... Journal of Polymer Science Part A: Polymer Chemistry 53 (2), 344-352, 2015 | 168 | 2015 |
Interfacial design for block copolymer thin films MJ Maher, CM Bates, G Blachut, S Sirard, JL Self, MC Carlson, LM Dean, ... Chemistry of Materials 26 (3), 1471-1479, 2014 | 131 | 2014 |
Directed self-assembly of silicon-containing block copolymer thin films MJ Maher, CT Rettner, CM Bates, G Blachut, MC Carlson, WJ Durand, ... ACS applied materials & interfaces 7 (5), 3323-3328, 2015 | 82 | 2015 |
Experimental and modeling study of domain orientation in confined block copolymer thin films WJ Durand, MC Carlson, MJ Maher, G Blachut, LJ Santos, S Tein, ... Macromolecules 49 (1), 308-316, 2016 | 38 | 2016 |
Photopatternable interfaces for block copolymer lithography MJ Maher, CM Bates, G Blachut, MC Carlson, JL Self, DW Janes, ... ACS Macro Letters 3 (8), 824-828, 2014 | 31 | 2014 |
Pattern transfer of sub-10 nm features via tin-containing block copolymers MJ Maher, K Mori, SM Sirard, AM Dinhobl, CM Bates, E Gurer, G Blachut, ... ACS Macro Letters 5 (3), 391-395, 2016 | 29 | 2016 |
Quantifying the Interface Energy of Block Copolymer Top Coats DF Sunday, MJ Maher, S Tein, MC Carlson, CJ Ellison, CG Willson, ... ACS Macro Letters 5 (12), 1306-1311, 2016 | 12 | 2016 |
Large area fabrication of graphene nanoribbons by wetting transparency-assisted block copolymer lithography R Katsumata, MN Yogeesh, H Wong, SX Zhou, SM Sirard, T Huang, ... Polymer 110, 131-138, 2017 | 11 | 2017 |
Spatial Control of the Self-assembled Block Copolymer Domain Orientation and Alignment on Photopatterned Surfaces JY Kim, P Liu, MJ Maher, DH Callan, CM Bates, MC Carlson, Y Asano, ... ACS applied materials & interfaces 12 (20), 23399-23409, 2020 | 10 | 2020 |
Service, GJ, Tombers, NM, Hughes-Borst, RJ, et al.(in press A). Implications of minimizing trauma during conventional length cochlear implantation MC Carlson, CLW Driscoll, RH Gifford Otology & Neurotology, 0 | 9 | |
Block Copolymers for DSA in the 100 Å Regime CG Willson, G Blachut, MJ Maher, WJ Durand, CM Bates, MC Carlson, ... Journal of Photopolymer Science and Technology 27 (4), 415-418, 2014 | 1 | 2014 |
Modeling of block copolymer thin film behavior between neutral and preferential interfaces M Carlson, W Durand, G Blachut, M Maher, C Ellison, C Willson ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY 249, 2015 | | 2015 |
Modeling block copolymer thin film orientation in the presence of neutral and preferential interfaces W Durand, M Carlson, G Blachut, M Maher, C Ellison, C Willson ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY 249, 2015 | | 2015 |
Directed self-assembly of silicon-containing block copolymers for lithography M Maher, C Rettner, C Bates, G Blachut, M Carlson, W Durand, J Cheng, ... ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY 249, 2015 | | 2015 |
Photopatternable interfaces control the orientation of block copolymer domains MJ Maher, CM Bates, G Blachut, JL Self, MC Carlson, WJ Durand, ... ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY 248, 2014 | | 2014 |
Top coats confer orientation control of block copolymer domains M Carlson, M Maher, C Bates, J Self, C Ellison, CG Willson ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY 247, 2014 | | 2014 |
New top coat design controls orientation of sub-10 nm block copolymer domains MJ Maher, CM Bates, G Blachut, JD Cushen, MC Carlson, JL Self, ... ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY 247, 2014 | | 2014 |
Supporting Information for Pattern Transfer of Sub-10 nm Features via Tin-containing Block Copolymers MJ Maher, K Mori, SM Sirard, AM Dinhobl, CM Bates, E Gurer, G Blachut, ... | | |
Photo-patternable Interfaces for Block Copolymer Thin Films MJ Maher, CM Bates, G Blachut, MC Carlson, JL Self, DW Janes, ... | | |
Supporting Information for Interfacial Design for Block Copolymer Thin Films MJ Maher, CM Bates, G Blachut, S Sirard, JL Self, MC Carlson, LM Dean, ... | | |