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Kentaro Kawai
Kentaro Kawai
Bestätigte E-Mail-Adresse bei prec.eng.osaka-u.ac.jp
Titel
Zitiert von
Zitiert von
Jahr
Metal-assisted chemical etching of Ge (100) surfaces in water toward nanoscale patterning
T Kawase, A Mura, K Dei, K Nishitani, K Kawai, J Uchikoshi, M Morita, ...
Nanoscale research letters 8 (1), 151, 2013
562013
Highly efficient planarization of sliced 4H–SiC (0001) wafer by slurryless electrochemical mechanical polishing
X Yang, X Yang, K Kawai, K Arima, K Yamamura
International Journal of Machine Tools and Manufacture 144, 103431, 2019
542019
Investigation of anodic oxidation mechanism of 4H-SiC (0001) for electrochemical mechanical polishing
X Yang, R Sun, Y Ohkubo, K Kawai, K Arima, K Endo, K Yamamura
Electrochimica Acta 271, 666-676, 2018
462018
Chemical etching of a semiconductor surface assisted by single sheets of reduced graphene oxide
T Hirano, K Nakade, S Li, K Kawai, K Arima
Carbon 127, 681-687, 2018
392018
Damage-free highly efficient plasma-assisted polishing of a 20-mm square large mosaic single crystal diamond substrate
N Liu, K Sugawara, N Yoshitaka, H Yamada, D Takeuchi, Y Akabane, ...
Scientific Reports 10 (1), 19432, 2020
382020
Obtaining atomically smooth 4H–SiC (0001) surface by controlling balance between anodizing and polishing in electrochemical mechanical polishing
X Yang, X Yang, R Sun, K Kawai, K Arima, K Yamamura
Nanomanufacturing and Metrology 2, 140-147, 2019
312019
Ultrasonic-assisted anodic oxidation of 4H-SiC (0001) surface
X Yang, X Yang, K Kawai, K Arima, K Yamamura
Electrochemistry Communications 100, 1-5, 2019
312019
Cyanobacterial cell lineage analysis of the spatiotemporal hetR expression profile during heterocyst pattern formation in Anabaena sp. PCC 7120
H Asai, S Iwamori, K Kawai, S Ehira, J Ishihara, K Aihara, S Shoji, ...
PLoS One 4 (10), e7371, 2009
302009
Catalytic behavior of metallic particles in anisotropic etching of Ge (100) surfaces in water mediated by dissolved oxygen
T Kawase, A Mura, K Nishitani, Y Kawai, K Kawai, J Uchikoshi, M Morita, ...
Journal of Applied Physics 111 (12), 2012
292012
Efficient and slurryless ultrasonic vibration assisted electrochemical mechanical polishing for 4H–SiC wafers
X Yang, X Yang, H Gu, K Kawai, K Arima, K Yamamura
Ceramics International 48 (6), 7570-7583, 2022
272022
Dominant factors and their action mechanisms on material removal rate in electrochemical mechanical polishing of 4H-SiC (0001) surface
X Yang, X Yang, K Kawai, K Arima, K Yamamura
Applied Surface Science 562, 150130, 2021
262021
Effects of polishing pressure and sliding speed on the material removal mechanism of single crystal diamond in plasma-assisted polishing
N Liu, K Sugimoto, N Yoshitaka, H Yamada, R Sun, K Kawai, K Arima, ...
Diamond and Related Materials 124, 108899, 2022
242022
Flow control methods and devices in micrometer scale channels
S Shoji, K Kawai
Microfluidics: Technologies and Applications, 1-25, 2011
222011
Novel SiC wafer manufacturing process employing three-step slurryless electrochemical mechanical polishing
X Yang, X Yang, K Kawai, K Arima, K Yamamura
Journal of Manufacturing Processes 70, 350-360, 2021
192021
Comparative study of GeO2/Ge and SiO2/Si structures on anomalous charging of oxide films upon water adsorption revealed by ambient-pressure X-ray photoelectron spectroscopy
D Mori, H Oka, T Hosoi, K Kawai, M Morita, EJ Crumlin, Z Liu, ...
Journal of Applied Physics 120 (9), 2016
192016
Microfluidic valve array control system integrating a fluid demultiplexer circuit
K Kawai, K Arima, M Morita, S Shoji
Journal of Micromechanics and Microengineering 25 (6), 065016, 2015
182015
High-quality plasma-assisted polishing of aluminum nitride ceramic
R Sun, X Yang, K Arima, K Kawai, K Yamamura
CIRP Annals 69 (1), 301-304, 2020
172020
Surface modification and microstructuring of 4H-SiC (0001) by anodic oxidation with sodium chloride aqueous solution
X Yang, R Sun, K Kawai, K Arima, K Yamamura
ACS applied materials & interfaces 11 (2), 2535-2542, 2018
172018
Catalyst‐Assisted Electroless Flattening of Ge Surfaces in Dissolved‐O2‐Containing Water
T Kawase, Y Saito, A Mura, T Okamoto, K Kawai, Y Sano, M Morita, ...
ChemElectroChem 2 (11), 1656-1659, 2015
172015
Catalytic properties of chemically modified graphene sheets to enhance etching of ge surface in water
R Mikurino, A Ogasawara, T Hirano, Y Nakata, H Yamashita, S Li, ...
The Journal of Physical Chemistry C 124 (11), 6121-6129, 2020
162020
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