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Raphael Boichot
Raphael Boichot
Bestätigte E-Mail-Adresse bei simap.grenoble-inp.fr - Startseite
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Zitiert von
Zitiert von
Jahr
Flow distribution and mass transfer in a parallel microchannel contactor integrated with constructal distributors
J Yue, R Boichot, L Luo, Y Gonthier, G Chen, Q Yuan
AIChE journal 56 (2), 298-317, 2010
1612010
Tree-network structure generation for heat conduction by cellular automaton
R Boichot, L Luo, Y Fan
Energy Conversion and Management 50 (2), 376-386, 2009
922009
Nanostructured TiO2 anatase-rutile-carbon solid coating with visible light antimicrobial activity
SP Krumdieck, R Boichot, R Gorthy, JG Land, S Lay, AJ Gardecka, ...
Scientific Reports 9 (1), 1883, 2019
592019
Chalcogen Precursor Effect on Cold-Wall Gas-Source Chemical Vapor Deposition Growth of WS2
TH Choudhury, H Simchi, R Boichot, M Chubarov, SE Mohney, ...
Crystal Growth & Design 18 (8), 4357-4364, 2018
592018
Niobium nitride thin films deposited by high temperature chemical vapor deposition
F Mercier, S Coindeau, S Lay, A Crisci, M Benz, T Encinas, R Boichot, ...
Surface and Coatings Technology 260, 126-132, 2014
502014
High-temperature oxidation resistance of chromium-based coatings deposited by DLI-MOCVD for enhanced protection of the inner surface of long tubes
A Michau, F Maury, F Schuster, F Lomello, JC Brachet, E Rouesne, ...
Surface and Coatings Technology 349, 1048-1057, 2018
482018
Effects of AlN nucleation layers on the growth of AlN films using high temperature hydride vapor phase epitaxy
M Balaji, A Claudel, V Fellmann, I Gélard, E Blanquet, R Boichot, A Pierret, ...
Journal of Alloys and Compounds 526, 103-109, 2012
462012
Flow distribution property of the constructal distributor and heat transfer intensification in a mini heat exchanger
Y Fan, R Boichot, T Goldin, L Luo
AIChE journal 54 (11), 2796-2808, 2008
442008
A genetic algorithm for topology optimization of area-to-point heat conduction problem
R Boichot, Y Fan
International Journal of Thermal Sciences 108, 209-217, 2016
432016
Evolution of crystal structure during the initial stages of ZnO atomic layer deposition
R Boichot, L Tian, MI Richard, A Crisci, A Chaker, V Cantelli, S Coindeau, ...
Chemistry of Materials 28 (2), 592-600, 2016
412016
Epitaxial and polycrystalline growth of AlN by high temperature CVD: Experimental results and simulation
R Boichot, A Claudel, N Baccar, A Milet, E Blanquet, M Pons
Surface and coatings technology 205 (5), 1294-1301, 2010
412010
Night cooling with a ventilated internal double wall
G Fraisse, R Boichot, JL Kouyoumji, B Souyri
Energy and Buildings 42 (3), 393-400, 2010
382010
High temperature chemical vapor deposition of aluminum nitride, growth and evaluation
M Pons, R Boichot, N Coudurier, A Claudel, E Blanquet, S Lay, F Mercier, ...
Surface and Coatings Technology 230, 111-118, 2013
362013
Influence of the V/III ratio in the gas phase on thin epitaxial AlN layers grown on (0001) sapphire by high temperature hydride vapor phase epitaxy
A Claudel, V Fellmann, I Gélard, N Coudurier, D Sauvage, M Balaji, ...
Thin Solid Films 573, 140-147, 2014
322014
Chemical vapor deposition of titanium nitride thin films: kinetics and experiments
J Su, R Boichot, E Blanquet, F Mercier, M Pons
CrystEngComm 21 (26), 3974-3981, 2019
312019
Chromium carbide growth by direct liquid injection chemical vapor deposition in long and narrow tubes, experiments, modeling and simulation
A Michau, F Maury, F Schuster, I Nuta, Y Gazal, R Boichot, M Pons
Coatings 8 (6), 220, 2018
292018
Chromium carbide growth at low temperature by a highly efficient DLI-MOCVD process in effluent recycling mode
A Michau, F Maury, F Schuster, R Boichot, M Pons, E Monsifrot
Surface and Coatings Technology 332, 96-104, 2017
292017
Epitaxial growth of AlN on c-plane sapphire by High Temperature Hydride Vapor Phase Epitaxy: Influence of the gas phase N/Al ratio and low temperature protective layer
R Boichot, N Coudurier, F Mercier, S Lay, A Crisci, S Coindeau, A Claudel, ...
Surface and Coatings Technology 237, 118-125, 2013
262013
Investigation on AlN epitaxial growth and related etching phenomenon at high temperature using high temperature chemical vapor deposition process
A Claudel, E Blanquet, D Chaussende, R Boichot, B Doisneau, ...
Journal of crystal growth 335 (1), 17-24, 2011
232011
High temperature properties of AlN coatings deposited by chemical vapor deposition for solar central receivers
D Chen, J Colas, F Mercier, R Boichot, L Charpentier, C Escape, ...
Surface and Coatings Technology 377, 124872, 2019
222019
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