Modal wavefront reconstruction from its gradient I Mochi, KA Goldberg
Applied Optics 54 (12), 3780-3785, 2015
73 2015 Fluorescence lidar imaging of the cathedral and baptistery of Parma D Lognoli, G Cecchi, I Mochi, L Pantani, V Raimondi, R Chiari, ...
Applied Physics B 76, 457-465, 2003
68 2003 Printability of native blank defects and programmed defects and their stack structures HJ Kwon, J Harris-Jones, R Teki, A Cordes, T Nakajima, I Mochi, ...
Photomask Technology 2011 8166, 60-69, 2011
53 2011 Commissioning an EUV mask microscope for lithography generations reaching 8 nm KA Goldberg, I Mochi, M Benk, AP Allezy, MR Dickinson, CW Cork, ...
Extreme Ultraviolet (EUV) Lithography IV 8679, 347-356, 2013
51 2013 The GIANO spectrometer: towards its first light at the TNG E Oliva, L Origlia, R Maiolino, C Baffa, V Biliotti, P Bruno, G Falcini, ...
Ground-based and Airborne Instrumentation for Astronomy IV 8446, 1307-1315, 2012
50 2012 Actinic imaging of native and programmed defects on a full-field mask I Mochi
46 2010 The GIANO-TNG spectrometer E Oliva, L Origlia, C Baffa, C Biliotti, P Bruno, F D'Amato, C Del Vecchio, ...
Ground-based and Airborne Instrumentation for Astronomy 6269, 431-440, 2006
44 2006 RESCAN: an actinic lensless microscope for defect inspection of EUV reticles I Mochi, P Helfenstein, I Mohacsi, R Rajeev, D Kazazis, S Yoshitake, ...
Journal of Micro/Nanolithography, MEMS, and MOEMS 16 (4), 041003-041003, 2017
36 2017 Actinic extreme ultraviolet mask inspection beyond KA Goldberg, P Naulleau, I Mochi, EH Anderson, SB Rekawa, CD Kemp, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2008
34 2008 Wavelength-specific reflections: A decade of extreme ultraviolet actinic mask inspection research KA Goldberg, I Mochi
Journal of Vacuum Science & Technology B 28 (6), C6E1-C6E10, 2010
33 2010 GIANO-TNG spectroscopy of red supergiants in the young star cluster RSGC2 L Origlia, E Oliva, R Maiolino, A Mucciarelli, C Baffa, V Biliotti, P Bruno, ...
Astronomy & Astrophysics 560, A46, 2013
32 2013 Extreme ultraviolet laser-based table-top aerial image metrology of lithographic masks F Brizuela, S Carbajo, A Sakdinawat, D Alessi, DH Martz, Y Wang, ...
Optics Express 18 (14), 14467-14473, 2010
32 2010 Progress in EUV resists towards high-NA EUV lithography X Wang, Z Tasdemir, I Mochi, M Vockenhuber, L van Lent-Protasova, ...
Extreme Ultraviolet (EUV) Lithography X 10957, 19-27, 2019
30 2019 Towards X-ray transient grating spectroscopy C Svetina, R Mankowsky, G Knopp, F Koch, G Seniutinas, B Rösner, ...
Optics letters 44 (3), 574-577, 2019
28 2019 Assist features: placement, impact, and relevance for EUV imaging I Mochi, V Philipsen, E Gallagher, E Hendrickx, K Lyakhova, F Wittebrood, ...
Extreme Ultraviolet (EUV) Lithography VII 9776, 513-529, 2016
28 2016 Beam drift and partial probe coherence effects in EUV reflective-mode coherent diffractive imaging P Helfenstein, R Rajeev, I Mochi, A Kleibert, CAF Vaz, Y Ekinci
Optics Express 26 (9), 12242-12256, 2018
27 2018 An EUV Fresnel zoneplate mask-imaging microscope for lithography generations reaching 8 nm KA Goldberg, I Mochi, SB Rekawa, NS Smith, JB Macdougall, ...
Extreme Ultraviolet (EUV) Lithography II 7969, 331-342, 2011
27 2011 Replicated mask surface roughness effects on EUV lithographic patterning and line edge roughness SA George, PP Naulleau, EM Gullikson, I Mochi, F Salmassi, KA Goldberg, ...
Extreme Ultraviolet (EUV) Lithography II 7969, 137-146, 2011
27 2011 A study of defects on EUV masks using blank inspection, patterned mask inspection, and wafer inspection S Huh, L Ren, D Chan, S Wurm, K Goldberg, I Mochi, T Nakajima, ...
Extreme ultraviolet (EUV) lithography 7636, 182-188, 2010
27 2010 Improving the performance of the Actinic Inspection Tool with an optimized alignment procedure I Mochi, KA Goldberg, P Naulleau, S Huh
Alternative Lithographic Technologies 7271, 590-600, 2009
27 2009