| Thermal reflow of polymers for innovative and smart 3D structures: A review R Kirchner, H Schift Materials Science in Semiconductor Processing 92, 58-72, 2019 | 71 | 2019 |
| Novel 3D micro-and nanofabrication method using thermally activated selective topography equilibration (TASTE) of polymers A Schleunitz, VA Guzenko, M Messerschmidt, H Atasoy, R Kirchner, ... Nano Convergence 1 (1), 7, 2014 | 67 | 2014 |
| High fidelity 3D thermal nanoimprint with UV curable polydimethyl siloxane stamps N Chidambaram, R Kirchner, M Altana, H Schift Journal of Vacuum Science & Technology B 34 (6), 2016 | 43 | 2016 |
| ZEP520A—A resist for electron-beam grayscale lithography and thermal reflow R Kirchner, VA Guzenko, I Vartiainen, N Chidambaram, H Schift Microelectronic Engineering 153, 71-76, 2016 | 41 | 2016 |
| Energy-based thermal reflow simulation for 3D polymer shape prediction using Surface Evolver R Kirchner, A Schleunitz, H Schift Journal of Micromechanics and Microengineering 24 (5), 055010, 2014 | 41 | 2014 |
| UV-NIL fabricated bio-inspired inlays for injection molding to influence the friction behavior of ceramic surfaces M Mühlberger, M Rohn, J Danzberger, E Sonntag, A Rank, L Schumm, ... Microelectronic Engineering 141, 140-144, 2015 | 39 | 2015 |
| Selective surface smoothening of polymer microlenses by depth confined softening N Chidambaram, R Kirchner, R Fallica, L Yu, M Altana, H Schift Advanced Materials Technologies 2 (5), 1700018, 2017 | 38 | 2017 |
| High-resolution grayscale patterning using extreme ultraviolet interference lithography R Fallica, R Kirchner, H Schift, Y Ekinci Microelectronic Engineering 177, 1-5, 2017 | 35 | 2017 |
| Bio-inspired 3D funnel structures made by grayscale electron-beam patterning and selective topography equilibration R Kirchner, VA Guzenko, M Rohn, E Sonntag, M Mühlberger, I Bergmair, ... Microelectronic Engineering 141, 107-111, 2015 | 33 | 2015 |
| High aspect ratio pattern collapse of polymeric UV-nano-imprint molds due to cleaning A Finn, B Lu, R Kirchner, X Thrun, K Richter, WJ Fischer Microelectronic Engineering 110, 112-118, 2013 | 33 | 2013 |
| Lithographic performance of ZEP520A and mr-PosEBR resists exposed by electron beam and extreme ultraviolet lithography R Fallica, D Kazazis, R Kirchner, A Voigt, I Mochi, H Schift, Y Ekinci Journal of Vacuum Science & Technology B 35 (6), 2017 | 28 | 2017 |
| Mobility based 3D simulation of selective, viscoelastic polymer reflow using surface evolver R Kirchner, H Schift Journal of Vacuum Science & Technology B 32 (6), 06F701, 2014 | 26 | 2014 |
| Nanoimprint assisted inkjet printing to fabricate sub-micron channel organic field effect transistors L Teng, M Plötner, A Türke, B Adolphi, A Finn, R Kirchner, WJ Fischer Microelectronic Engineering 110, 292-297, 2013 | 23 | 2013 |
| Geometrical properties of multilayer nano-imprint-lithography molds for optical applications A Finn, R Hensel, F Hagemann, R Kirchner, A Jahn, WJ Fischer Microelectronic Engineering 98, 284-287, 2012 | 20 | 2012 |
| How post-processing by selective thermal reflow can reduce the roughness of 3D lithography in micro-optical lenses R Kirchner, N Chidambaram, M Altana, H Schift Proc. of SPIE Vol 10095, 1009507-1, 2017 | 17 | 2017 |
| Effect of nanoimprint on the elastic modulus of PMMA: Comparison between standard and ultrafast thermal NIL M Pianigiani, R Kirchner, E Sovernigo, A Pozzato, M Tormen, H Schift Microelectronic Engineering 155, 85-91, 2016 | 16 | 2016 |
| mr-PosEBR: a novel positive tone resist for high resolution electron beam lithography and 3D surface patterning S Pfirrmann, R Kirchner, O Lohse, VA Guzenko, A Voigt, I Harder, ... Advances in Patterning Materials and Processes XXXIII 9779, 2016 | 16 | 2016 |
| Direct UV-Imprinting of Hybrid-Polymer Photonic Microring Resonators and Their Characterization R Kirchner, A Finn, R Landgraf, L Nueske, L Teng, M Vogler, WJ Fischer Journal of Lightwave Technology 32 (9), 1674-1681, 2014 | 16 | 2014 |
| Adjustable sidewall slopes by electron-beam exposure layout C Kaspar, J Butschke, M Irmscher, S Martens, H Sailer, R Kirchner, ... Journal of Vacuum Science & Technology B 35 (6), 2017 | 15 | 2017 |
| Comparative study of resists and lithographic tools using the Lumped Parameter Model R Fallica, R Kirchner, Y Ekinci, D Mailly Journal of Vacuum Science & Technology B 34 (6), 2016 | 15 | 2016 |
Helmut SchiftGruppenleiter Polymere Nanotechnology, Paul Scherrer InstitutVerified email at psi.ch
