Christophe Navarro
Christophe Navarro
Arkema
Verified email at arkema.com
Title
Cited by
Cited by
Year
Chemistry and mechanical properties of epoxy-based thermosets reinforced by reactive and nonreactive SBMX block copolymers
V Rebizant, AS Venet, F Tournilhac, E Girard-Reydet, C Navarro, ...
Macromolecules 37 (21), 8017-8027, 2004
2012004
Organo-catalyzed rop of ϵ-caprolactone: methanesulfonic acid competes with trifluoromethanesulfonic acid
S Gazeau-Bureau, D Delcroix, B Martín-Vaca, D Bourissou, C Navarro, ...
Macromolecules 41 (11), 3782-3784, 2008
1262008
Ring-opening polymerization of trimethylene carbonate catalyzed by methanesulfonic acid: activated monomer versus active chain end mechanisms
D Delcroix, B Martin-Vaca, D Bourissou, C Navarro
Macromolecules 43 (21), 8828-8835, 2010
1072010
Phosphoric and phosphoramidic acids as bifunctional catalysts for the ring-opening polymerization of ε-caprolactone: a combined experimental and theoretical study
D Delcroix, A Couffin, N Susperregui, C Navarro, L Maron, B Martin-Vaca, ...
Polymer Chemistry 2 (10), 2249-2256, 2011
822011
Sub‐10 nm Features Obtained from Directed Self‐Assembly of Semicrystalline Polycarbosilane‐Based Block Copolymer Thin Films
K Aissou, M Mumtaz, G Fleury, G Portale, C Navarro, E Cloutet, ...
Advanced Materials 27 (2), 261-265, 2015
572015
Hydrogenation method for unsaturated block copolymers and hydrogenated unsaturated block copolymers
B Boussand, P Bonnet, M Devic, M Hidalgo, C Navarro
US Patent 7,202,308, 2007
502007
The potential of block copolymer’s directed self-assembly for contact hole shrink and contact multiplication
R Tiron, A Gharbi, M Argoud, X Chevalier, J Belledent, PP Barros, I Servin, ...
Alternative Lithographic Technologies V 8680, 868012, 2013
452013
Nanoscale block copolymer ordering induced by visible interferometric micropatterning: a route towards large scale block copolymer 2D crystals
K Aissou, J Shaver, G Fleury, G Pécastaings, C Brochon, C Navarro, ...
Advanced Materials 25 (2), 213-217, 2013
432013
Mild and efficient preparation of block and gradient copolymers by methanesulfonic acid catalyzed ring-opening polymerization of caprolactone and trimethylene carbonate
A Couffin, D Delcroix, B Martin-Vaca, D Bourissou, C Navarro
Macromolecules 46 (11), 4354-4360, 2013
422013
Optimization of block copolymer self-assembly through graphoepitaxy: a defectivity study
R Tiron, X Chevalier, C Couderc, J Pradelles, J Bustos, L Pain, C Navarro, ...
Journal of Vacuum Science & Technology B, Nanotechnology and …, 2011
412011
Assessing the local nanomechanical properties of self-assembled block copolymer thin films by peak force tapping
M Lorenzoni, L Evangelio, S Verhaeghe, C Nicolet, C Navarro, ...
Langmuir 31 (42), 11630-11638, 2015
392015
Compositions based on semicrystalline thermoplastic resins and block copolymers, resulting materials and methods for obtaining same
L Leibler, A Mourran, C Navarro, V Royackkers
US Patent 7,144,952, 2006
392006
Kinetics and mechanism of anionic polymerization of (meth) acrylates in the presence of lithium 2-methoxyethoxide
A Maurer, X Marcarian, AHE Müller, B Vuillemin, C Navarro
Polym Prepr (Am Chem Soc, Div Polym Chem) 38 (1), 467, 1997
321997
Pattern density multiplication by direct self assembly of block copolymers: toward 300mm CMOS requirements
R Tiron, X Chevalier, S Gaugiran, J Pradelles, H Fontaine, C Couderc, ...
Alternative Lithographic Technologies IV 8323, 83230O, 2012
292012
In situ mid-IR and UV–visible spectroscopies applied to the determination of kinetic parameters in the anionic copolymerization of styrene and isoprene
S Quinebèche, C Navarro, Y Gnanou, M Fontanille
Polymer 50 (6), 1351-1357, 2009
292009
“Constrained Geometry” Titanium Complexes: Exceptionally Robust Systems for Living Polymerization of Methacrylates at High Temperature and Model Studies toward Chain Transfer …
B Lian, CM Thomas, C Navarro, JF Carpentier
Organometallics 26 (1), 187-195, 2007
292007
Etch challenges for DSA implementation in CMOS via patterning
PP Barros, S Barnola, A Gharbi, M Argoud, I Servin, R Tiron, X Chevalier, ...
Advanced Etch Technology for Nanopatterning III 9054, 90540G, 2014
262014
Scaling-down lithographic dimensions with block-copolymer materials: 10-nm-sized features with poly(styrene)-block-poly(methylmethacrylate)
X Chevalier, C Nicolet, R Tiron, A Gharbi, M Argoud, J Pradelles, ...
Journal of Micro/Nanolithography, MEMS, and MOEMS 12 (3), 031102, 2013
252013
Process that enables the creation of nanometric structures by self-assembly of block copolymers
M Mumtaz, K Aissou, C Brochon, E Cloutet, G Fleury, G Hadziioannou, ...
US Patent App. 15/103,740, 2016
242016
Probing self-assembly of cylindrical morphology block copolymer using in situ and ex situ grazing incidence small-angle X-ray scattering: the attractive case of graphoepitaxy
M Maret, R Tiron, X Chevalier, P Gergaud, A Gharbi, C Lapeyre, ...
Macromolecules 47 (20), 7221-7229, 2014
242014
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