| Highly indistinguishable photons from deterministic quantum-dot microlenses utilizing three-dimensional in situ electron-beam lithography M Gschrey, A Thoma, P Schnauber, M Seifried, R Schmidt, B Wohlfeil, ... Nature communications 6 (1), 7662, 2015 | 333 | 2015 |
| Exploring dephasing of a solid-state quantum emitter via time-and temperature-dependent Hong-Ou-Mandel experiments A Thoma, P Schnauber, M Gschrey, M Seifried, J Wolters, JH Schulze, ... Physical review letters 116 (3), 033601, 2016 | 223 | 2016 |
| In situ electron-beam lithography of deterministic single-quantum-dot mesa-structures using low-temperature cathodoluminescence spectroscopy M Gschrey, F Gericke, A Schüßler, R Schmidt, JH Schulze, T Heindel, ... Applied Physics Letters 102 (25), 2013 | 129 | 2013 |
| A bright triggered twin-photon source in the solid state T Heindel, A Thoma, M von Helversen, M Schmidt, A Schlehahn, ... Nature communications 8 (1), 14870, 2017 | 86 | 2017 |
| Single-photon emission at a rate of 143 MHz from a deterministic quantum-dot microlens triggered by a mode-locked vertical-external-cavity surface-emitting laser A Schlehahn, M Gaafar, M Vaupel, M Gschrey, P Schnauber, JH Schulze, ... Applied Physics Letters 107 (4), 2015 | 61 | 2015 |
| Resolution and alignment accuracy of low-temperature in situ electron beam lithography for nanophotonic device fabrication M Gschrey, R Schmidt, JH Schulze, A Strittmatter, S Rodt, S Reitzenstein Journal of Vacuum Science & Technology B 33 (2), 2015 | 60 | 2015 |
| Quantum metrology of solid-state single-photon sources using photon-number-resolving detectors M Von Helversen, J Böhm, M Schmidt, M Gschrey, JH Schulze, ... New Journal of Physics 21 (3), 035007, 2019 | 55 | 2019 |
| Tools for the performance optimization of single-photon quantum key distribution T Kupko, M von Helversen, L Rickert, JH Schulze, A Strittmatter, ... npj Quantum Information 6 (1), 29, 2020 | 54 | 2020 |
| Path-controlled time reordering of paired photons in a dressed three-level cascade S Bounouar, M Strauß, A Carmele, P Schnauber, A Thoma, M Gschrey, ... Physical review letters 118 (23), 233601, 2017 | 42 | 2017 |
| Two-photon interference from remote deterministic quantum dot microlenses A Thoma, P Schnauber, J Böhm, M Gschrey, JH Schulze, A Strittmatter, ... Applied Physics Letters 110 (1), 2017 | 40 | 2017 |
| Operating single quantum emitters with a compact Stirling cryocooler A Schlehahn, L Krüger, M Gschrey, JH Schulze, S Rodt, A Strittmatter, ... Review of Scientific Instruments 86 (1), 2015 | 39 | 2015 |
| Generation of maximally entangled states and coherent control in quantum dot microlenses S Bounouar, C de la Haye, M Strauß, P Schnauber, A Thoma, M Gschrey, ... Applied Physics Letters 112 (15), 2018 | 33 | 2018 |
| Accessing the dark exciton spin in deterministic quantum-dot microlenses T Heindel, A Thoma, I Schwartz, ER Schmidgall, L Gantz, D Cogan, ... Apl Photonics 2 (12), 2017 | 31 | 2017 |
| Advanced in-situ electron-beam lithography for deterministic nanophotonic device processing A Kaganskiy, M Gschrey, A Schlehahn, R Schmidt, JH Schulze, T Heindel, ... Review of Scientific Instruments 86 (7), 2015 | 28 | 2015 |
| Observation of resonance fluorescence and the Mollow triplet from a coherently driven site-controlled quantum dot S Unsleber, S Maier, DPS McCutcheon, YM He, M Dambach, M Gschrey, ... Optica 2 (12), 1072-1077, 2015 | 27 | 2015 |
| In (Ga) As/GaAs site‐controlled quantum dots with tailored morphology and high optical quality C Schneider, A Huggenberger, M Gschrey, P Gold, S Rodt, A Forchel, ... physica status solidi (a) 209 (12), 2379-2386, 2012 | 24 | 2012 |
| Using low-contrast negative-tone PMMA at cryogenic temperatures for 3D electron beam lithography P Schnauber, R Schmidt, A Kaganskiy, T Heuser, M Gschrey, S Rodt, ... Nanotechnology 27 (19), 195301, 2016 | 23 | 2016 |
| Bright single-photon sources based on anti-reflection coated deterministic quantum dot microlenses P Schnauber, A Thoma, CV Heine, A Schlehahn, L Gantz, M Gschrey, ... Technologies 4 (1), 1, 2015 | 18 | 2015 |
| Study of high-resolution electron-beam resists for applications in low-temperature lithography M Gschrey, R Schmidt, A Kaganskiy, S Rodt, S Reitzenstein Journal of Vacuum Science & Technology B 32 (6), 2014 | 14 | 2014 |
| Strong charge-carrier localization in InAs/GaAs submonolayer stacks prepared by Sb-assisted metalorganic vapor-phase epitaxy D Quandt, JH Schulze, A Schliwa, Z Diemer, C Prohl, A Lenz, H Eisele, ... Physical Review B 91 (23), 235418, 2015 | 12 | 2015 |
Stephan ReitzensteinTechnische Universität BerlinBestätigte E-Mail-Adresse bei physik.tu-berlin.de
