| Improving optical measurement accuracy using multi-technique nested uncertainties RM Silver, NF Zhang, BM Barnes, H Zhou, A Heckert, R Dixson, ... Metrology, Inspection, and Process Control for Microlithography XXIII 7272 …, 2009 | 50 | 2009 |
| Deep subwavelength nanometric image reconstruction using Fourier domain optical normalization J Qin, RM Silver, BM Barnes, H Zhou, RG Dixson, MA Henn Light: Science & Applications 5 (2), e16038-e16038, 2016 | 47 | 2016 |
| Improving optical measurement uncertainty with combined multitool metrology using a Bayesian approach NF Zhang, RM Silver, H Zhou, BM Barnes Applied Optics 51 (25), 6196-6206, 2012 | 45 | 2012 |
| Three-dimensional deep sub-wavelength defect detection using λ= 193 nm optical microscopy BM Barnes, MY Sohn, F Goasmat, H Zhou, AE Vladár, RM Silver, A Arceo Optics express 21 (22), 26219-26226, 2013 | 37 | 2013 |
| Enhancing 9 nm node dense patterned defect optical inspection using polarization, angle, and focus BM Barnes, F Goasmat, MY Sohn, H Zhou, RM Silver, A Arceo Metrology, Inspection, and Process Control for Microlithography XXVII 8681 …, 2013 | 32 | 2013 |
| Fourier domain optical tool normalization for quantitative parametric image reconstruction J Qin, RM Silver, BM Barnes, H Zhou, F Goasmat Applied optics 52 (26), 6512-6522, 2013 | 25 | 2013 |
| Dependence of morphology on miscut angle for Si(111) etched in J Fu, H Zhou, J Kramar, R Silver, S Gonda Applied physics letters 82 (18), 3014-3016, 2003 | 25 | 2003 |
| Scatterfield microscopy of 22-nm node patterned defects using visible and DUV light BM Barnes, YJ Sohn, F Goasmat, H Zhou, RM Silver, A Arceo Metrology, Inspection, and Process Control for Microlithography XXVI 8324 …, 2012 | 21 | 2012 |
| The limits and extensibility of optical patterned defect inspection RM Silver, BM Barnes, Y Sohn, R Quintanilha, H Zhou, C Deeb, ... Metrology, Inspection, and Process Control for Microlithography XXIV 7638 …, 2010 | 19 | 2010 |
| Optimizing hybrid metrology: rigorous implementation of Bayesian and combined regression MA Henn, RM Silver, JS Villarrubia, NF Zhang, H Zhou, BM Barnes, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 14 (4), 044001, 2015 | 17 | 2015 |
| Time-resolved kinetic Monte-Carlo simulation study on Si (111) etching H Zhou, J Fu, RM Silver The Journal of Physical Chemistry C 111 (9), 3566-3574, 2007 | 16 | 2007 |
| Effects of wafer noise on the detection of 20-nm defects using optical volumetric inspection BM Barnes, F Goasmat, MY Sohn, H Zhou, AE Vladár, RM Silver Journal of Micro/Nanolithography, MEMS, and MOEMS 14 (1), 014001-014001, 2015 | 14 | 2015 |
| Nested uncertainties and hybrid metrology to improve measurement accuracy RM Silver, NF Zhang, BM Barnes, H Zhou, J Qin, R Dixson Metrology, Inspection, and Process Control for Microlithography XXV 7971 …, 2011 | 14 | 2011 |
| Through-focus scanning and scatterfield optical methods for advanced overlay target analysis R Attota, M Stocker, R Silver, A Heckert, H Zhou, R Kasica, L Chen, ... Metrology, Inspection, and Process Control for Microlithography XXIII 7272 …, 2009 | 13 | 2009 |
| Data-driven approaches to optical patterned defect detection MA Henn, H Zhou, BM Barnes OSA continuum 2 (9), 2683-2693, 2019 | 11 | 2019 |
| Combining model-based measurement results of critical dimensions from multiple tools NF Zhang, BM Barnes, H Zhou, MA Henn, RM Silver Measurement Science and Technology 28 (6), 065002, 2017 | 11 | 2017 |
| Optical illumination optimization for patterned defect inspection BM Barnes, R Quinthanilha, YJ Sohn, H Zhou, RM Silver Metrology, Inspection, and Process Control for Microlithography XXV 7971 …, 2011 | 11 | 2011 |
| Optimizing image-based patterned defect inspection through FDTD simulations at multiple ultraviolet wavelengths BM Barnes, H Zhou, MA Henn, MY Sohn, RM Silver Modeling Aspects in Optical Metrology VI 10330, 192-206, 2017 | 10 | 2017 |
| Optimizing hybrid metrology through a consistent multi-tool parameter set and uncertainty model RM Silver, BM Barnes, NF Zhang, H Zhou, A Vladar, J Villarrubia, J Kline, ... Metrology, Inspection, and Process Control for Microlithography XXVIII 9050 …, 2014 | 10 | 2014 |
| Assessing form-dependent optical scattering at vacuum-and extreme-ultraviolet wavelengths of nanostructures with two-dimensional periodicity BM Barnes, MA Henn, MY Sohn, H Zhou, RM Silver Physical Review Applied 11 (6), 064056, 2019 | 9 | 2019 |
