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Francesco Villasmunta
Francesco Villasmunta
Ph.D. Candidate, BTU
Bestätigte E-Mail-Adresse bei th-wildau.de
Titel
Zitiert von
Zitiert von
Jahr
Silicon-organic hybrid photonics: an overview of recent advances, electro-optical effects and CMOS integration concepts
P Steglich, C Mai, C Villringer, B Dietzel, S Bondarenko, V Ksianzou, ...
Journal of Physics: Photonics 3 (2), 022009, 2021
182021
Grafting of amine functions on cellulose acetate fibers by plasma processing
M Kajjout, Y Lemmouchi, C Jama, C Rolando, F Villasmunta, F Heinrich, ...
Reactive and Functional Polymers 134, 40-48, 2019
112019
Spectroscopic reflectometry for characterization of Through Silicon Via profile of Bosch etching process
J Bauer, O Fursenko, S Marschmeyer, F Heinrich, F Villasmunta, ...
Journal of Vacuum Science & Technology B 37 (6), 2019
52019
Endoscopic orientation by multimodal data fusion
S Pulwer, R Fiebelkorn, C Zesch, P Steglich, C Villringer, F Villasmunta, ...
MOEMS and Miniaturized Systems XVIII 10931, 251-256, 2019
22019
Numerical Simulation of Optical Through-Silicon Waveguide for 3D Photonic Interconnections
F Villasmunta, P Steglich, S Schrader, H Schenk, A Mai
2021 International Conference on Numerical Simulation of Optoelectronic …, 2021
12021
Design, fabrication, and characterization of integrated optical through-silicon waveguides for 3D photonic interconnections
F Villasmunta, P Steglich, C Villringer, S Schrader, H Schenk, A Mai, ...
Optical Interconnects XXIV 12892, 118-129, 2024
2024
Optical Through-Silicon Waveguides for 3D-Chip-Interconnections
F Villasmunta, P Steglich, F Heinrich, C Villringer, A Mai, S Schrader, ...
2023
Messverfahren zur Kontrolle tiefer Siliziumstrukturen für die 3D-Chip-Integration
J Bauer, F Villasmunta, F Heinrich, C Villringer, J Reck, S Peters, A Treffer, ...
Deutsche Gesellschaft für angewandte Optik (DGaO), 2023
2023
Numerical Simulation of Optical Through-Silicon Waveguide for 3D Photonic Interconnections
H Schenk, F Villasmunta, P Steglich, S Schrader, A Mai
IEEE, 2021
2021
PMMA Filled Through-Silicon Vias (TSVs) and Back Etch Process Controlled by Plasma Emission Interferometry
F Villasmunta, P Steglich, C Mai, F Heinrich, V Ksianzou, S Schrader, ...
MikroSystemTechnik 2019; Congress, 1-4, 2019
2019
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