Raluca Tiron
Raluca Tiron
CEA LETI
Verified email at cea.fr
Title
Cited by
Cited by
Year
Spin-spin cross relaxation in single-molecule magnets
W Wernsdorfer, S Bhaduri, R Tiron, DN Hendrickson, G Christou
Physical review letters 89 (19), 197201, 2002
1332002
Strain-induced magnetic anisotropy in epitaxial manganite films
L Ranno, A Llobet, R Tiron, E Favre-Nicolin
Applied surface science 188 (1-2), 170-175, 2002
1212002
Spin quantum tunneling via entangled states in a dimer of exchange-coupled single-molecule magnets
R Tiron, W Wernsdorfer, D Foguet-Albiol, N Aliaga-Alcalde, G Christou
Physical review letters 91 (22), 227203, 2003
942003
Quantum tunneling in a three-dimensional network of exchange-coupled single-molecule magnets
R Tiron, W Wernsdorfer, N Aliaga-Alcalde, G Christou
Physical Review B 68 (14), 140407, 2003
702003
The potential of block copolymer’s directed self-assembly for contact hole shrink and contact multiplication
R Tiron, A Gharbi, M Argoud, X Chevalier, J Belledent, PP Barros, I Servin, ...
Alternative Lithographic Technologies V 8680, 868012, 2013
452013
DNA origami mask for sub-ten-nanometer lithography
CT Diagne, C Brun, D Gasparutto, X Baillin, R Tiron
ACS nano 10 (7), 6458-6463, 2016
422016
HBr plasma treatment versus VUV light treatment to improve 193 nm photoresist pattern linewidth roughness
E Pargon, L Azarnouche, M Fouchier, K Menguelti, R Tiron, C Sourd, ...
Plasma Processes and Polymers 8 (12), 1184-1195, 2011
422011
Hyperbranched Polymers for Photolithographic Applications–Towards Understanding the Relationship between Chemical Structure of Polymer Resin and Lithographic Performances
CL Chochos, E Ismailova, C Brochon, N Leclerc, R Tiron, C Sourd, ...
Advanced Materials 21 (10‐11), 1121-1125, 2009
422009
Optimization of block copolymer self-assembly through graphoepitaxy: a defectivity study
R Tiron, X Chevalier, C Couderc, J Pradelles, J Bustos, L Pain, C Navarro, ...
Journal of Vacuum Science & Technology B, Nanotechnology and …, 2011
412011
Pattern density multiplication by direct self assembly of block copolymers: toward 300mm CMOS requirements
R Tiron, X Chevalier, S Gaugiran, J Pradelles, H Fontaine, C Couderc, ...
Alternative Lithographic Technologies IV 8323, 83230O, 2012
292012
Etch challenges for DSA implementation in CMOS via patterning
PP Barros, S Barnola, A Gharbi, M Argoud, I Servin, R Tiron, X Chevalier, ...
Advanced Etch Technology for Nanopatterning III 9054, 90540G, 2014
262014
Study of dynamical formation and shape of microlenses formed by the reflow method
S Audran, B Faure, B Mortini, C Aumont, R Tiron, C Zinck, Y Sanchez, ...
Advances in Resist Technology and Processing XXIII 6153, 61534D, 2006
262006
Scaling-down lithographic dimensions with block-copolymer materials: 10-nm-sized features with poly(styrene)-block-poly(methylmethacrylate)
X Chevalier, C Nicolet, R Tiron, A Gharbi, M Argoud, J Pradelles, ...
Journal of Micro/Nanolithography, MEMS, and MOEMS 12 (3), 031102, 2013
252013
Probing self-assembly of cylindrical morphology block copolymer using in situ and ex situ grazing incidence small-angle X-ray scattering: the attractive case of graphoepitaxy
M Maret, R Tiron, X Chevalier, P Gergaud, A Gharbi, C Lapeyre, ...
Macromolecules 47 (20), 7221-7229, 2014
242014
Ultrahigh-resolution pattern using electron-beam lithography HF wet etching
R Tiron, L Mollard, O Louveau, E Lajoinie
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2007
242007
Template affinity role in CH shrink by DSA planarization
R Tiron, A Gharbi, PP Barros, S Bouanani, C Lapeyre, S Bos, A Fouquet, ...
Alternative Lithographic Technologies VII 9423, 942317, 2015
222015
Contact hole shrink by directed self-assembly: Process integration and stability monitored on 300 mm pilot line
I Servin, R Tiron, A Gharbi, M Argoud, K Jullian, G Chamiot-Maitral, ...
Japanese Journal of Applied Physics 53 (6S), 06JC05, 2014
222014
300mm pilot line DSA contact hole process stability
M Argoud, I Servin, A Gharbi, PP Barros, K Jullian, M Sanche, ...
Alternative Lithographic Technologies VI 9049, 904929, 2014
212014
Investigation of block depth distribution in PS‐b‐PMMA block copolymer using ultra‐low‐energy cesium sputtering in ToF‐SIMS
T Terlier, R Tiron, A Gharbi, X Chevalier, M Veillerot, E Martinez, ...
Surface and Interface Analysis 46 (2), 83-91, 2014
202014
DSA planarization approach to solve pattern density issue
PP Barros, A Gharbi, A Sarrazin, R Tiron, N Posseme, S Barnola, S Bos, ...
Advanced Etch Technology for Nanopatterning IV 9428, 94280D, 2015
172015
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