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Kota Murali
Kota Murali
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Year
Effect of band-to-band tunneling on junctionless transistors
S Gundapaneni, M Bajaj, RK Pandey, KVRM Murali, S Ganguly, ...
IEEE Transactions on Electron Devices 59 (4), 1023-1029, 2012
2312012
A Tunnel FET forScaling Below 0.6 V With a CMOS-Comparable Performance
R Asra, M Shrivastava, KVRM Murali, RK Pandey, H Gossner, VR Rao
IEEE Transactions on Electron Devices 58 (7), 1855-1863, 2011
1872011
Direct selective laser sintering of iron–graphite powder mixture
K Murali, AN Chatterjee, P Saha, R Palai, S Kumar, SK Roy, PK Mishra, ...
Journal of Materials Processing Technology 136 (1-3), 179-185, 2003
1112003
Probing decoherence with electromagnetically induced transparency in superconductive quantum circuits
K Murali, Z Dutton, WD Oliver, DS Crankshaw, TP Orlando
Physical review letters 93 (8), 087003, 2004
1002004
Quantum-information processing by nuclear magnetic resonance: Experimental implementation of half-adder and subtractor operations using an oriented spin-7/2 system
K Murali, N Sinha, TS Mahesh, MH Levitt, KV Ramanathan, A Kumar
Physical Review A 66 (2), 022313, 2002
782002
CMOS logic device and circuit performance of Si gate all around nanowire MOSFET
K Nayak, M Bajaj, A Konar, PJ Oldiges, K Natori, H Iwai, KVRM Murali, ...
IEEE Transactions on Electron Devices 61 (9), 3066-3074, 2014
752014
Scheduling cost efficient datacenter load distribution
AN Chatterjee, HF Hamann, KM Shankar, S Lu, KVRM Murali
US Patent 9,654,414, 2017
682017
Carrier transport in high mobility InAs nanowire junctionless transistors
A Konar, J Mathew, K Nayak, M Bajaj, RK Pandey, S Dhara, KVRM Murali, ...
Nano letters 15 (3), 1684-1690, 2015
622015
Random dopant fluctuation induced variability in undoped channel Si gate all around nanowire n-MOSFET
K Nayak, S Agarwal, M Bajaj, KVRM Murali, VR Rao
IEEE Transactions on Electron Devices 62 (2), 685-688, 2015
582015
Electromagnetically induced transparency in superconducting quantum circuits: Effects of decoherence, tunneling, and multilevel crosstalk
Z Dutton, K Murali, WD Oliver, TP Orlando
Physical Review B 73 (10), 104516, 2006
512006
Effect of meso-structure on strength and size effect in concrete under compression
S Rangari, K Murali, A Deb
Engineering Fracture Mechanics 195, 162-185, 2018
492018
Nanotechnology for energy sustainability, 3 volume set
B Raj, M Van de Voorde, Y Mahajan
John Wiley & Sons, 2017
432017
Trap generation in IL and HK layers during BTI/TDDB stress in scaled HKMG N and P MOSFETs
S Mukhopadhyay, K Joshi, V Chaudhary, N Goel, S De, RK Pandey, ...
2014 IEEE International Reliability Physics Symposium, GD. 3.1-GD. 3.11, 2014
412014
Metal-gate granularity-induced threshold voltage variability and mismatch in Si gate-all-around nanowire n-MOSFETs
K Nayak, S Agarwal, M Bajaj, PJ Oldiges, KVRM Murali, VR Rao
IEEE Transactions on Electron Devices 61 (11), 3892-3895, 2014
392014
A binary tunnel field effect transistor with a steep sub-threshold swing and increased on current
R Asra, KVRM Murali, VR Rao
Japanese Journal of Applied Physics 49 (12R), 120203, 2010
382010
A comprehensive DC/AC model for ultra-fast NBTI in deep EOT scaled HKMG p-MOSFETs
N Goel, S Mukhopadhyay, N Nanaware, S De, RK Pandey, K Murali, ...
2014 IEEE International Reliability Physics Symposium, 6A. 4.1-6A. 4.12, 2014
312014
A novel ALD SiBCN low-k spacer for parasitic capacitance reduction in FinFETs
T Yamashita, S Mehta, VS Basker, R Southwick, A Kumar, ...
2015 Symposium on VLSI Technology (VLSI Technology), T154-T155, 2015
302015
Crystallographic-orientation-dependent gate-induced drain leakage in nanoscale MOSFETs
RK Pandey, KVRM Murali, SS Furkay, PJ Oldiges, EJ Nowak
IEEE transactions on electron devices 57 (9), 2098-2105, 2010
302010
Role of point defects and HfO2/TiN interface stoichiometry on effective work function modulation in ultra-scaled complementary metal–oxide–semiconductor devices
RK Pandey, R Sathiyanarayanan, U Kwon, V Narayanan, KVRM Murali
Journal of Applied Physics 114 (3), 2013
292013
On the Electron and Hole Tunneling in aGate Stack With Extreme Interfacial-Layer Scaling
T Ando, ND Sathaye, KVRM Murali, EA Cartier
IEEE electron device letters 32 (7), 865-867, 2011
292011
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