| High power pulsed magnetron sputtering: A review on scientific and engineering state of the art K Sarakinos, J Alami, S Konstantinidis Surface and coatings technology 204 (11), 1661-1684, 2010 | 1197 | 2010 |
| Ionization of sputtered metals in high power pulsed magnetron sputtering J Bohlmark, J Alami, C Christou, AP Ehiasarian, U Helmersson Journal of Vacuum Science & Technology A 23 (1), 18-22, 2005 | 334 | 2005 |
| Ion-assisted physical vapor deposition for enhanced film properties on nonflat surfaces J Alami, PO Persson, D Music, JT Gudmundsson, J Bohlmark, ... Journal of Vacuum Science & Technology A 23 (2), 278-280, 2005 | 299 | 2005 |
| Spatial and temporal behavior of the plasma parameters in a pulsed magnetron discharge JT Gudmundsson, J Alami, U Helmersson Surface and Coatings Technology 161 (2-3), 249-256, 2002 | 274 | 2002 |
| Challenges in developing electrodes, electrolytes, and diagnostics tools to understand and advance sodium‐ion batteries GL Xu, R Amine, A Abouimrane, H Che, M Dahbi, ZF Ma, I Saadoune, ... Advanced Energy Materials 8 (14), 1702403, 2018 | 259 | 2018 |
| On the deposition rate in a high power pulsed magnetron sputtering discharge J Alami, K Sarakinos, G Mark, M Wuttig Applied physics letters 89 (15), 2006 | 209 | 2006 |
| On the relationship between the peak target current and the morphology of chromium nitride thin films deposited by reactive high power pulsed magnetron sputtering J Alami, K Sarakinos, F Uslu, M Wuttig Journal of Physics D: Applied Physics 42 (1), 015304, 2008 | 184 | 2008 |
| Evolution of the electron energy distribution and plasma parameters in a pulsed magnetron discharge JT Gudmundsson, J Alami, U Helmersson Applied Physics Letters 78 (22), 3427-3429, 2001 | 180 | 2001 |
| Process characteristics and film properties upon growth of TiOx films by high power pulsed magnetron sputtering K Sarakinos, J Alami, M Wuttig Journal of Physics D: Applied Physics 40 (7), 2108, 2007 | 172 | 2007 |
| Phase tailoring of Ta thin films by highly ionized pulsed magnetron sputtering J Alami, P Eklund, JM Andersson, M Lattemann, E Wallin, J Bohlmark, ... Thin Solid Films 515 (7-8), 3434-3438, 2007 | 170 | 2007 |
| High power pulsed magnetron sputtering: Fundamentals and applications J Alami, S Bolz, K Sarakinos Journal of Alloys and Compounds 483 (1-2), 530-534, 2009 | 159 | 2009 |
| Enabling high energy lithium metal batteries via single-crystal Ni-rich cathode material co-doping strategy X Ou, T Liu, W Zhong, X Fan, X Guo, X Huang, L Cao, J Hu, B Zhang, ... Nature communications 13 (1), 2319, 2022 | 155 | 2022 |
| Spatial electron density distribution in a high-power pulsed magnetron discharge J Bohlmark, JT Gudmundsson, J Alami, M Latteman, U Helmersson IEEE Transactions on Plasma Science 33 (2), 346-347, 2005 | 149 | 2005 |
| Recycling of phosphate mine tailings for the production of geopolymers S Moukannaa, M Loutou, M Benzaazoua, L Vitola, J Alami, R Hakkou Journal of Cleaner Production 185, 891-903, 2018 | 147 | 2018 |
| High-power impulse magnetron sputtering of Ti–Si–C thin films from a Ti3SiC2 compound target J Alami, P Eklund, J Emmerlich, O Wilhelmsson, U Jansson, H Högberg, ... Thin Solid Films 515 (4), 1731-1736, 2006 | 136 | 2006 |
| Low temperature deposition of a-Al2O3 thin films by sputtering using a Cr2O3 template P Jin, G Xu, M Tazawa, K Yoshimura, D Music, J Alami, U Helmersson Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films 20 (6 …, 2002 | 136 | 2002 |
| Plasma dynamics in a highly ionized pulsed magnetron discharge J Alami, JT Gudmundsson, J Bohlmark, J Birch, U Helmersson Plasma Sources Science and Technology 14 (3), 525, 2005 | 135 | 2005 |
| Advantages of nanocomposite coatings deposited by high power pulse magnetron sputtering technology K Bobzin, N Bagcivan, P Immich, S Bolz, J Alami, R Cremer Journal of materials processing technology 209 (1), 165-170, 2009 | 122 | 2009 |
| Wood carbon based single-atom catalyst for rechargeable Zn–air batteries L Zhong, C Jiang, M Zheng, X Peng, T Liu, S Xi, X Chi, Q Zhang, L Gu, ... ACS Energy Letters 6 (10), 3624-3633, 2021 | 109 | 2021 |
| Process stabilization and enhancement of deposition rate during reactive high power pulsed magnetron sputtering of zirconium oxide K Sarakinos, J Alami, C Klever, M Wuttig Surface and Coatings Technology 202 (20), 5033-5035, 2008 | 107 | 2008 |
