W.M.M. (Erwin) KESSELS
W.M.M. (Erwin) KESSELS
Unknown affiliation
Verified email at tue.nl - Homepage
Title
Cited by
Cited by
Year
Ultralow surface recombination of substrates passivated by plasma-assisted atomic layer deposited
B Hoex, SBS Heil, E Langereis, MCM Van de Sanden, WMM Kessels
Applied Physics Letters 89 (4), 042112, 2006
7732006
Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al 2 O 3
B Hoex, SBS Heil, E Langereis, MCM Van de Sanden, WMM Kessels
Applied Physics Letters 89 (4), 042112, 2006
7732006
Plasma-assisted atomic layer deposition: basics, opportunities, and challenges
HB Profijt, SE Potts, MCM Van de Sanden, WMM Kessels
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 29 (5 …, 2011
7262011
Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
G Dingemans, WMM Kessels
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 30 (4 …, 2012
6652012
On the surface passivation mechanism by the negative-charge-dielectric
B Hoex, JJH Gielis, MCM Van de Sanden, WMM Kessels
Journal of Applied Physics 104 (11), 113703, 2008
5712008
Surface passivation of high‐efficiency silicon solar cells by atomic‐layer‐deposited Al2O3
J Schmidt, A Merkle, R Brendel, B Hoex, MCM de Sanden, WMM Kessels
Progress in photovoltaics: research and applications 16 (6), 461-466, 2008
4962008
Silicon surface passivation by atomic layer deposited
B Hoex, J Schmidt, P Pohl, MCM Van de Sanden, WMM Kessels
Journal of Applied Physics 104 (4), 044903, 2008
4892008
Excellent passivation of highly doped -type Si surfaces by the negative-charge-dielectric
B Hoex, J Schmidt, R Bock, PP Altermatt, MCM Van De Sanden, ...
Applied Physics Letters 91 (11), 112107, 2007
4372007
High efficiency -type Si solar cells on -passivated boron emitters
J Benick, B Hoex, MCM Van De Sanden, WMM Kessels, O Schultz, ...
Applied Physics Letters 92 (25), 253504, 2008
4162008
Determining the material structure of microcrystalline silicon from Raman spectra
C Smit, R Van Swaaij, H Donker, A Petit, WMM Kessels, ...
Journal of applied physics 94 (5), 3582-3588, 2003
3672003
In situ spectroscopic ellipsometry as a versatile tool for studying atomic layer deposition
E Langereis, SBS Heil, HCM Knoops, W Keuning, MCM Van de Sanden, ...
Journal of Physics D: Applied Physics 42 (7), 073001, 2009
3102009
Plasma-assisted atomic layer deposition of moisture permeation barriers on polymers
E Langereis, M Creatore, SBS Heil, MCM Van de Sanden, WMM Kessels
Applied physics letters 89 (8), 081915, 2006
3002006
Plasma and Thermal ALD of Al2O3 in a Commercial 200 mm ALD Reactor
JL Van Hemmen, SBS Heil, JH Klootwijk, F Roozeboom, CJ Hodson, ...
Journal of the Electrochemical Society 154 (7), G165, 2007
2692007
Vacancies and voids in hydrogenated amorphous silicon
AHM Smets, WMM Kessels, MCM Van de Sanden
Applied physics letters 82 (10), 1547-1549, 2003
2652003
The use of atomic layer deposition in advanced nanopatterning
AJM Mackus, AA Bol, WMM Kessels
Nanoscale 6 (19), 10941-10960, 2014
2222014
Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV‐Irradiated TiO2 Scaffolds on Plastic Substrates
F Di Giacomo, V Zardetto, A D'Epifanio, S Pescetelli, F Matteocci, S Razza, ...
Advanced Energy Materials 5 (8), 1401808, 2015
2052015
Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
G Dingemans, R Seguin, P Engelhart, MCM Sanden, WMM Kessels
physica status solidi (RRL)–Rapid Research Letters 4 (1‐2), 10-12, 2010
1992010
Influence of the deposition temperature on the c-Si surface passivation by Al2O3 films synthesized by ALD and PECVD
G Dingemans, MCM Van de Sanden, WMM Kessels
Electrochemical and Solid State Letters 13 (3), H76, 2009
1962009
Atomic layer deposition for photovoltaics: applications and prospects for solar cell manufacturing
JA Van Delft, D Garcia-Alonso, WMM Kessels
Semiconductor Science and Technology 27 (7), 074002, 2012
1882012
Plasma chemistry aspects of deposition using an expanding thermal plasma
MCM Van de Sanden, RJ Severens, WMM Kessels, RFG Meulenbroeks, ...
Journal of applied physics 84 (5), 2426-2435, 1998
1711998
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