W.M.M. (Erwin) KESSELS
W.M.M. (Erwin) KESSELS
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Plasma-assisted atomic layer deposition: basics, opportunities, and challenges
HB Profijt, SE Potts, MCM Van de Sanden, WMM Kessels
Journal of Vacuum Science & Technology A 29 (5), 2011
Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
G Dingemans, WMM Kessels
Journal of Vacuum Science & Technology A 30 (4), 2012
Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
B Hoex, SBS Heil, E Langereis, MCM Van de Sanden, WMM Kessels
Applied physics letters 89 (4), 2006
On the c-Si surface passivation mechanism by the negative-charge-dielectric Al2O3
B Hoex, JJH Gielis, MCM Van de Sanden, WMM Kessels
Journal of Applied physics 104 (11), 2008
Silicon surface passivation by atomic layer deposited Al2O3
B Hoex, J Schmidt, P Pohl, MCM Van de Sanden, WMM Kessels
Journal of Applied Physics 104 (4), 2008
Surface passivation of high‐efficiency silicon solar cells by atomic‐layer‐deposited Al2O3
J Schmidt, A Merkle, R Brendel, B Hoex, MCM de Sanden, WMM Kessels
Progress in photovoltaics: research and applications 16 (6), 461-466, 2008
Excellent passivation of highly doped p-type Si surfaces by the negative-charge-dielectric Al2O3
B Hoex, J Schmidt, R Bock, PP Altermatt, MCM Van De Sanden, ...
Applied Physics Letters 91 (11), 2007
High efficiency n-type Si solar cells on Al2O3-passivated boron emitters
J Benick, B Hoex, MCM Van De Sanden, WMM Kessels, O Schultz, ...
Applied Physics Letters 92 (25), 2008
Determining the material structure of microcrystalline silicon from Raman spectra
C Smit, R Van Swaaij, H Donker, A Petit, WMM Kessels, ...
Journal of applied physics 94 (5), 3582-3588, 2003
The use of atomic layer deposition in advanced nanopatterning
AJM Mackus, AA Bol, WMM Kessels
Nanoscale 6 (19), 10941-10960, 2014
Plasma atomic layer deposition
HCM Knoops, K De Peuter, WMM Kessels
US Patent 9,637,823, 2017
In situ spectroscopic ellipsometry as a versatile tool for studying atomic layer deposition
E Langereis, SBS Heil, HCM Knoops, W Keuning, MCM Van de Sanden, ...
Journal of Physics D: Applied Physics 42 (7), 073001, 2009
Method and apparatus for atomic layer deposition using an atmospheric pressure glow discharge plasma
HW De Vries, MCM van de Sanden, M Creatore, WMM Kessels
US Patent App. 12/304,614, 2009
Passivating contacts for crystalline silicon solar cells: From concepts and materials to prospects
J Melskens, BWH van de Loo, B Macco, LE Black, S Smit, WMM Kessels
IEEE Journal of Photovoltaics 8 (2), 373-388, 2018
Plasma and thermal ALD of Al2O3 in a commercial 200 mm ALD reactor
JL Van Hemmen, SBS Heil, JH Klootwijk, F Roozeboom, CJ Hodson, ...
Journal of The Electrochemical Society 154 (7), G165, 2007
Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
E Langereis, M Creatore, SBS Heil, MCM Van de Sanden, WMM Kessels
Applied physics letters 89 (8), 2006
Vacancies and voids in hydrogenated amorphous silicon
AHM Smets, WMM Kessels, MCM Van de Sanden
Applied physics letters 82 (10), 1547-1549, 2003
Flexible perovskite photovoltaic modules and cells rased on atomic layer deposited compact layers and UV-irradiated TiO2 scaffolds on plastic substrates
F Di Giacomo, V Zardetto, A D'Epifanio, S Pescetelli, F Matteocci, S Razza, ...
Advanced Energy Materials 5 (8), 1-9, 2015
Influence of the deposition temperature on the c-Si surface passivation by Al2O3 films synthesized by ALD and PECVD
G Dingemans, MCM Van de Sanden, WMM Kessels
Electrochemical and Solid-state letters 13 (3), H76, 2009
Atomic layer deposition for photovoltaics: applications and prospects for solar cell manufacturing
JA Van Delft, D Garcia-Alonso, WMM Kessels
Semiconductor Science and Technology 27 (7), 074002, 2012
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