Scanning probe microscopy: electrical and electromechanical phenomena at the nanoscale SV Kalinin, A Gruverman Springer Science & Business Media, 2007 | 504 | 2007 |
Assessing the performance of two-dimensional dopant profiling techniques N Duhayon, P Eyben, M Fouchier, T Clarysse, W Vandervorst, D Álvarez, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004 | 78 | 2004 |
Sub-5-nm-spatial resolution in scanning spreading resistance microscopy using full-diamond tips D Alvarez, J Hartwich, M Fouchier, P Eyben, W Vandervorst Applied physics letters 82 (11), 1724-1726, 2003 | 74 | 2003 |
An atomic force microscopy-based method for line edge roughness measurement M Fouchier, E Pargon, B Bardet Journal of applied physics 113 (10), 2013 | 56 | 2013 |
Unbiased line width roughness measurements with critical dimension scanning electron microscopy and critical dimension atomic force microscopy L Azarnouche, E Pargon, K Menguelti, M Fouchier, D Fuard, P Gouraud, ... Journal of Applied Physics 111 (8), 2012 | 54 | 2012 |
HBr plasma treatment versus VUV light treatment to improve 193 nm photoresist pattern linewidth roughness E Pargon, L Azarnouche, M Fouchier, K Menguelti, R Tiron, C Sourd, ... Plasma Processes and Polymers 8 (12), 1184-1195, 2011 | 46 | 2011 |
Benefits of plasma treatments on critical dimension control and line width roughness transfer during gate patterning L Azarnouche, E Pargon, K Menguelti, M Fouchier, O Joubert, P Gouraud, ... Journal of Vacuum Science & Technology B 31 (1), 2013 | 40 | 2013 |
Probing semiconductor technology and devices with scanning spreading resistance microscopy P Eyben, W Vandervorst, D Alvarez, M Xu, M Fouchier Scanning Probe Microscopy: Electrical and Electromechanical Phenomena at the …, 2007 | 39 | 2007 |
Scanning Probe Microscopy P Eyben, W Vandervorst, D Alvarez, M Xu, M Fouchier, S Kalinin, ... Scanning Probe Microscopy, Springer, New York, 2007 | 30 | 2007 |
S. Kalinin and A. Gruverman SP Microscopy, P Eyben, W Vandervorst, D Alvarez, M Xu, M Fouchier Springer, New York, 2007 | 27 | 2007 |
Atomic-scale silicon etching control using pulsed Cl2 plasma C Petit-Etienne, M Darnon, P Bodart, M Fouchier, G Cunge, E Pargon, ... Journal of Vacuum Science & Technology B 31 (1), 2013 | 26 | 2013 |
Vacuum UV broad-band absorption spectroscopy: a powerful diagnostic tool for reactive plasma monitoring G Cunge, M Fouchier, M Brihoum, P Bodart, M Touzeau, N Sadeghi Journal of Physics D: Applied Physics 44 (12), 122001, 2011 | 22 | 2011 |
Etching mechanisms of thin SiO2 exposed to Cl2 plasma C Petit-Etienne, M Darnon, L Vallier, E Pargon, G Cunge, M Fouchier, ... Journal of Vacuum Science & Technology B 29 (5), 2011 | 20 | 2011 |
Dual tip atomic force microscopy probe and method for producing such a probe M Fouchier US Patent 7,500,387, 2009 | 18 | 2009 |
Vacuum ultra violet absorption spectroscopy of 193 nm photoresists M Fouchier, E Pargon, L Azarnouche, K Menguelti, O Joubert, ... Applied Physics A 105, 399-405, 2011 | 17 | 2011 |
Fabrication of conductive atomic force microscope probes and their evaluation for carrier mapping M Fouchier, P Eyben, D Alvarez, N Duhayon, M Xu, S Brongersma, ... Smart Sensors, Actuators, and MEMS 5116, 607-616, 2003 | 14 | 2003 |
Plasma treatments to improve line-width roughness during gate patterning L Azarnouche, E Pargon, K Menguelti, M Fouchier, M Brihoum, R Ramos, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 12 (4), 041304-041304, 2013 | 13 | 2013 |
Fabrication and characterization of full diamond tips for scanning spreading-resistance microscopy D Alvarez, M Fouchier, J Kretz, J Hartwich, S Schoemann, W Vandervorst Microelectronic engineering 73, 910-915, 2004 | 13 | 2004 |
Energy of Si (111) dimer-stacking-fault structures M Fouchier, JJ Boland Physical Review B 57 (15), 8997, 1998 | 13 | 1998 |
Polarized cathodoluminescence for strain measurement M Fouchier, N Rochat, E Pargon, JP Landesman Review of Scientific Instruments 90 (4), 2019 | 12 | 2019 |