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Michael Lublow
Michael Lublow
VDI/VDE Innovation + Technik GmbH
在 vdivde-it.de 的电子邮件经过验证
标题
引用次数
引用次数
年份
Solar hydrogen evolution using metal-free photocatalytic polymeric carbon nitride/CuInS 2 composites as photocathodes
F Yang, V Kuznietsov, M Lublow, C Merschjann, A Steigert, J Klaer, ...
Journal of materials chemistry A 1 (21), 6407-6415, 2013
1372013
Photophysics of polymeric carbon nitride: An optical quasimonomer
C Merschjann, T Tyborski, S Orthmann, F Yang, K Schwarzburg, ...
Physical Review B 87 (20), 205204, 2013
1332013
A Molecular Approach to SelfSupported CobaltSubstituted ZnO Materials as Remarkably Stable Electrocatalysts for Water Oxidation
J Pfrommer, M Lublow, A Azarpira, C Göbel, M Lücke, A Steigert, ...
Angewandte Chemie 126 (20), 5283-5287, 2014
742014
MetalFree Photocatalytic Graphitic Carbon Nitride on pType Chalcopyrite as a Composite Photocathode for LightInduced Hydrogen Evolution
F Yang, M Lublow, S Orthmann, C Merschjann, T Tyborski, M Rusu, ...
ChemSusChem 5 (7), 1227-1232, 2012
612012
Hydrophobic Nanoreactor SoftTemplating: A Supramolecular Approach to Yolk@ Shell Materials
A Guiet, C Göbel, K Klingan, M Lublow, T Reier, U Vainio, R Kraehnert, ...
Advanced Functional Materials 25 (39), 6228-6240, 2015
462015
Efficient and Stable TiO2:Pt–Cu(In,Ga)Se2 Composite Photoelectrodes for Visible Light Driven Hydrogen Evolution
A Azarpira, M Lublow, A Steigert, P Bogdanoff, D Greiner, CA Kaufmann, ...
Advanced Energy Materials 5 (12), 1402148, 2015
372015
Photoelectrochemical conditioning of MOVPE p-InP films for light-induced hydrogen evolution: chemical, electronic and optical properties
AG Munoz, C Heine, M Lublow, HW Klemm, N Szabó, T Hannappel, ...
ECS Journal of Solid State Science and Technology 2 (4), Q51, 2013
352013
Electrochemical preparation of a stable accumulation layer on Si: A synchrotron radiation photoelectron spectroscopy study
K Skorupska, M Lublow, M Kanis, H Jungblut, HJ Lewerenz
Applied Physics Letters 87 (26), 2005
282005
Morphological and chemical optimization of ex situ NH4F (40%) conditioned Si (111)-(1× 1): H
M Lublow, T Stempel, K Skorupska, AG Muñoz, M Kanis, HJ Lewerenz
Applied Physics Letters 93 (6), 2008
272008
Combined AFM and Brewster-angle analysis of gradually etched ultrathin SiO2–Comparison with SRPES results
M Lublow, HJ Lewerenz
Surface science 601 (7), 1693-1700, 2007
232007
Fractal photocorrosion of silicon electrodes in concentrated ammonium fluoride
M Lublow, HJ Lewerenz
Electrochemical and solid-state letters 10 (8), C51, 2007
212007
Gö bel
J Pfrommer, M Lublow, A Azarpira
C., Lü cke, M., Steigert, A., Pogrzeba, M., Menezes, PW, Fischer, A …, 2014
192014
Real-time monitoring of SiO2/Si (1 1 1) interlayer etching by Brewster-angle reflectometry
M Lublow, HJ Lewerenz
Surface science 602 (9), 1677-1687, 2008
182008
On the surface chemistry of silicon under reducing conditions: An SRPES investigation
K Skorupska, M Lublow, M Kanis, H Jungblut, HJ Lewerenz
Electrochemistry communications 7 (10), 1077-1081, 2005
182005
Micro-and nanotopographies for photoelectrochemical energy conversion. II: Photoelectrocatalysis–Classical and advanced systems
HJ Lewerenz, K Skorupska, AG Muñoz, T Stempel, N Nüsse, M Lublow, ...
Electrochimica acta 56 (28), 10726-10736, 2011
172011
On the behaviour of Au plasmonic nanoparticles during hydrogen evolution at p-Si
M Lublow, K Skorupska, S Zoladek, PJ Kulesza, T Vo-Dinh, HJ Lewerenz
Electrochemistry communications 12 (10), 1298-1301, 2010
172010
Graphitic carbon nitride nano-emitters on silicon: a photoelectrochemical heterojunction composed of earth-abundant materials for enhanced evolution of hydrogen
M Lublow, A Fischer, C Merschjann, F Yang, T Schedel-Niedrig, JF Veyan, ...
Journal of Materials Chemistry A 2 (32), 12697-12702, 2014
162014
Silica-coated Au/Ag nanorods with tunable surface plasmon bands for nanoplasmonics with single particles
S Wu, AW Schell, M Lublow, J Kaiser, T Aichele, S Schietinger, F Polzer, ...
Colloid and Polymer Science 291, 585-594, 2013
162013
Photoactive nanostructure device by electrochemical processing of silicon
HJ Lewerenz, M Aggour, T Stempel, M Lublow, J Grzanna, K Skorupska
Journal of Electroanalytical Chemistry 619, 137-142, 2008
152008
XPS studies on dispersed and immobilised carbon nitrides used for dye degradation
J Rieß, M Lublow, S Anders, M Tasbihi, A Acharjya, K Kailasam, ...
Photochemical & Photobiological Sciences 18, 1833-1839, 2019
142019
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