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Peter Trefonas III
Peter Trefonas III
(retired)
Keine bestätigte E-Mail-Adresse - Startseite
Titel
Zitiert von
Zitiert von
Jahr
Double-heterojunction nanorod light-responsive LEDs for display applications
N Oh, BH Kim, SY Cho, S Nam, SP Rogers, Y Jiang, JC Flanagan, Y Zhai, ...
Science 355 (6325), 616-619, 2017
2452017
Organosilane high polymers: Electronic spectra and photodegradation
P Trefonas III, R West, RD Miller, D Hofer
Journal of Polymer Science: Polymer Letters Edition 21 (10), 823-829, 1983
240*1983
Organosilane high polymers: thermochromic behavior in solution
P Trefonas III, JR Damewood Jr, R West, RD Miller
Organometallics 4 (7), 1318-1319, 1985
2231985
Shot noise, LER, and quantum efficiency of EUV photoresists
RL Brainard, P Trefonas, JH Lammers, CA Cutler, JF Mackevich, ...
Emerging Lithographic Technologies VIII 5374, 74-85, 2004
2152004
Polysilane high polymers: mechanism of photodegradation
P Trefonas, R West, RD Miller
Journal of the American Chemical Society 107 (9), 2737-2742, 1985
1941985
The optical and electrical properties of silver nanowire mesh films
G Khanarian, J Joo, XQ Liu, P Eastman, D Werner, K O'Connell, ...
Journal of Applied Physics 114 (2), 2013
1682013
Multilayer transfer printing for pixelated, multicolor quantum dot light-emitting diodes
BH Kim, S Nam, N Oh, SY Cho, KJ Yu, CH Lee, J Zhang, K Deshpande, ...
ACS nano 10 (5), 4920-4925, 2016
1392016
Organosilane high polymers: Synthesis of formable homopolymers
P Trefonas III, PI Djurovich, XH Zhang, R West, RD Miller, D Hofer
Journal of Polymer Science: Polymer Letters Edition 21 (10), 819-822, 1983
1331983
Nanoscopic cylindrical dual concentric and lengthwise block brush terpolymers as covalent preassembled high-resolution and high-sensitivity negative-tone photoresist materials
G Sun, S Cho, C Clark, SV Verkhoturov, MJ Eller, A Li, A Pavía-Jiménez, ...
Journal of the American Chemical Society 135 (11), 4203-4206, 2013
1302013
New principle for image enhancement in single layer positive photoresists
P Trefonas III, BK Daniels
Advances in Resist Technology and Processing IV 771, 194-210, 1987
105*1987
Double-heterojunction nanorods
MS Nuri Oh, Sooji Nam, You Zhai, Kishori Deshpande, Pete Trefonas
Nature Communications 5, 3642, 2014
1032014
Organogermane homopolymers and copolymers with organosilane
P Trefonas, R West
Journal of Polymer Science: Polymer Chemistry Edition 23 (8), 2099-2107, 1985
1011985
Resist effects at small pitches
D Van Steenwinckel, JH Lammers, T Koehler, RL Brainard, P Trefonas
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2006
882006
Orientation control in thin films of a high-χ block copolymer with a surface active embedded neutral layer
J Zhang, MB Clark, C Wu, M Li, P Trefonas III, PD Hustad
Nano letters 16 (1), 728-735, 2016
782016
Dilute solution physical properties of organosilane polymers
PM Cotts, RD Miller, PT Trefonas III, R West, GN Fickes
Macromolecules 20 (5), 1046-1052, 1987
751987
Methods utilizing antireflective coating compositions with exposure under 200 nm
TG Adams, EK Pavelchek, RF Sinta, M DoCanto, RF Blacksmith, ...
US Patent 6,410,209, 2002
732002
Novel strategy for photopatterning emissive polymer brushes for organic light emitting diode applications
ZA Page, B Narupai, CW Pester, R Bou Zerdan, A Sokolov, DS Laitar, ...
ACS central science 3 (6), 654-661, 2017
692017
Simple method for measuring acid generation quantum efficiency at 193 nm
CR Szmanda, RJ Kavanagh, JF Bohland, JF Cameron, P Trefonas III, ...
Advances in Resist Technology and Processing XVI 3678, 857-866, 1999
681999
Soluble polysilanes: an interesting new class of radiation sensitive materials
RD Miller, D Hofer, GN Fickes, CG Willson, E Marinero, P Trefonas III, ...
Polymer Engineering & Science 26 (16), 1129-1134, 1986
671986
Copolymer formulation for directed self assembly, methods of manufacture thereof and articles comprising the same
PD Hustad, P Trefonas III, SW Chang
US Patent 11,021,630, 2021
662021
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