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Christian Wenzel
Christian Wenzel
Verified email at tu-dresden.de
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Radiofrequency endovenous ClosureFAST versus laser ablation for the treatment of great saphenous reflux: a multicenter, single-blinded, randomized study (RECOVERY study)
JI Almeida, J Kaufman, O Göckeritz, P Chopra, MT Evans, DF Hoheim, ...
Journal of Vascular and Interventional Radiology 20 (6), 752-759, 2009
3952009
Crystallographic and morphological characterization of reactively sputtered Ta, TaN and TaNO thin films
M Stavrev, D Fischer, C Wenzel, K Drescher, N Mattern
Thin Solid Films 307 (1-2), 79-88, 1997
2001997
Three-year European follow-up of endovenous radiofrequency-powered segmental thermal ablation of the great saphenous vein with or without treatment of calf varicosities
TM Proebstle, J Alm, O Göckeritz, C Wenzel, T Noppeney, C Lebard, ...
Journal of vascular surgery 54 (1), 146-152, 2011
1842011
PET/MRI in head and neck cancer: initial experience
I Platzek, B Beuthien-Baumann, M Schneider, V Gudziol, J Langner, ...
European journal of nuclear medicine and molecular imaging 40, 6-11, 2013
162*2013
Five-year results from the prospective European multicentre cohort study on radiofrequency segmental thermal ablation for incompetent great saphenous veins
TM Proebstle, BJ Alm, O Göckeritz, C Wenzel, T Noppeney, C Lebard, ...
Journal of British Surgery 102 (3), 212-218, 2015
1492015
Behavior of thin Ta-based films in the Cu/barrier/Si system
M Stavrev, D Fischer, F Praessler, C Wenzel, K Drescher
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 17 (3 …, 1999
1021999
Sputtering of tantalum-based diffusion barriers in SiCu metallization: effects of gas pressure and composition
M Stavrev, C Wenzel, A Möller, K Drescher
Applied surface science 91 (1-4), 257-262, 1995
711995
Study of Ta–Si–N thin films for use as barrier layer in copper metallizations
D Fischer, T Scherg, JG Bauer, HJ Schulze, C Wenzel
Microelectronic Engineering 50 (1-4), 459-464, 2000
622000
Fabrication of a 3D differential-capacitive acceleration sensor by UV-LIGA
W Qu, C Wenzel, G Gerlach
Sensors and Actuators A: Physical 77 (1), 14-20, 1999
591999
Influence of N content on microstructure and thermal stability of Ta–N thin films for Cu interconnection
M Hecker, D Fischer, V Hoffmann, HJ Engelmann, A Voss, N Mattern, ...
Thin Solid Films 414 (2), 184-191, 2002
492002
Optical and structural characteristics of Ga-doped ZnO films
OA Novodvorsky, LS Gorbatenko, VY Panchenko, OD Khramova, ...
Semiconductors 43, 419-424, 2009
422009
Relationship between microstructure and electromigration damage in unpassivated PVD copper damascene interconnects
TG Koetter, H Wendrock, H Schuehrer, C Wenzel, K Wetzig
Microelectronics Reliability 40 (8-10), 1295-1299, 2000
422000
Study of nanocrystalline Ta (N, O) diffusion barriers for use in Cu metallization
M Stavrev, D Fischer, A Preuß, C Wenzel, N Mattern
Microelectronic engineering 33 (1-4), 269-275, 1997
421997
Focusing hard x rays beyond the critical angle of total reflection by adiabatically focusing lenses
J Patommel, S Klare, R Hoppe, S Ritter, D Samberg, F Wittwer, A Jahn, ...
Applied Physics Letters 110 (10), 2017
392017
UV-LIGA: a promising and low-cost variant for microsystem technology
W Qu, C Wenzel, A Jahn, D Zeidler
1998 Conference on Optoelectronic and Microelectronic Materials and Devices …, 1998
351998
Electrical evaluation of Ru–W (-N), Ru–Ta (-N) and Ru–Mn films as Cu diffusion barriers
H Wojcik, R Kaltofen, U Merkel, C Krien, S Strehle, J Gluch, M Knaut, ...
Microelectronic engineering 92, 71-75, 2012
322012
Improvement of sputtered Galfenol thin films for sensor applications
B Adolphi, J McCord, M Bertram, CG Oertel, U Merkel, U Marschner, ...
Smart materials and structures 19 (5), 055013, 2010
312010
Physical characterization of PECVD and PEALD Ru (-C) films and comparison with PVD ruthenium film properties
H Wojcik, M Junige, W Bartha, M Albert, V Neumann, U Merkel, A Peeva, ...
Journal of The Electrochemical Society 159 (2), H166, 2011
242011
One-mask procedure for the fabrication of movable high-aspect-ratio 3D microstructures
W Qu, C Wenzel, A Jahn
Journal of Micromechanics and Microengineering 8 (4), 279, 1998
241998
Study of Ta (N, O) diffusion barrier stability: analytical and electrical characterization of low level Cu contamination in Si
M Stavrev, D Fischer, C Wenzel, T Heiser
Microelectronic Engineering 37, 245-251, 1997
241997
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