Marcel Junige
Marcel Junige
Professional Research Assistant at University of Colorado Boulder
Verified email at - Homepage
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In-situ real-time ellipsometric investigations during the atomic layer deposition of ruthenium: A process development from [(ethylcyclopentadienyl)(pyrrolyl …
M Knaut, M Junige, M Albert, JW Bartha
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 30 (1 …, 2012
Atomic layer deposition for high aspect ratio through silicon vias
M Knaut, M Junige, V Neumann, H Wojcik, T Henke, C Hossbach, A Hiess, ...
Microelectronic Engineering 107, 80-83, 2013
In-situ analysis on the initial growth of ultra-thin ruthenium films with atomic layer deposition
M Geidel, M Junige, M Albert, JW Bartha
Microelectronic Engineering 107, 151-155, 2013
Physical characterization of PECVD and PEALD Ru (-C) films and comparison with PVD Ruthenium film properties
H Wojcik, M Junige, W Bartha, M Albert, V Neumann, U Merkel, A Peeva, ...
Journal of The Electrochemical Society 159 (2), H166-H176, 2011
Graphene based electron field emitter
C Wenger, J Kitzmann, A Wolff, M Fraschke, C Walczyk, G Lupina, ...
Journal of Vacuum Science & Technology B, Nanotechnology and …, 2015
Area-selective atomic layer deposition of Ru on electron-beam-written Pt (C) patterns versus SiO2 substratum
M Junige, M Löffler, M Geidel, M Albert, JW Bartha, E Zschech, ...
Nanotechnology 28 (39), 395301, 2017
Monitoring atomic layer deposition processes in situ and in real-time by spectroscopic ellipsometry
M Junige, M Geidel, M Knaut, M Albert, JW Bartha
2011 Semiconductor Conference Dresden, 1-4, 2011
Comparison of PVD, PECVD & PEALD Ru (-C) films as Cu diffusion barriers by means of bias temperature stress measurements
H Wojcik, U Merkel, A Jahn, K Richter, M Junige, C Klein, J Gluch, ...
Microelectronic Engineering 88 (5), 641-645, 2011
3D system integration on 300 mm wafer level : high-aspect-ratio TSVs with ruthenium seed layer by thermal ald and subsequent copper electroplating
S Killge, I Bartusseck, M Junige, V Neumann, C Wenzel, M Böttcher, ...
Materials for Advanced Metallization, 2017
Overview of early publications on Atomic Layer Deposition
J Aarik, AR Akbashev, M Bechelany, M Berdova, D Cameron, N Chekurov, ...
AVS 14th International Conference on Atomic Layer Deposition, 2014
Area-selective molecular layer deposition of nylon 6, 2 polyamide: Growth on carbon and inhibition on silica
M Junige, SM George
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 39 (2 …, 2021
High-definition nanoimprint stamp fabrication by atomic layer etching
SA Khan, DB Suyatin, J Sundqvist, M Graczyk, M Junige, C Kauppinen, ...
ACS Applied Nano Materials 1 (6), 2476-2482, 2018
In-situ real-time Spectroscopic Ellipsometry for the investigation of Atomic Layer Depositions on Graphene
M Junige, T Oddoy, M Geidel, V Darakchieva, R Yakimova, C Wenger, ...
9th Workshop Ellipsometry, 2015
Virtual project on the history of ALD: Overview and current status
RL Puurunen, Y Koshtyal, H Pedersen, JR van Ommen, J Sundqvist
poster presentation at 13th International Baltic Conference on Atomic Layer …, 2015
Atomic Layer Deposition of Al2O3 on NF3-pre-treated graphene
M Junige, T Oddoy, R Yakimova, V Darakchieva, C Wenger, G Lupina, ...
SPIE microtechnologies 2015 : Nanotechnology VII 9519, 951915, 2015
In-Situ Real-Time Monitoring And Control Of Kinetic Processes In Atomic Layer Depositions By Spectroscopic Ellipsometry With 1.25 Hz Sampling Rate
M Junige, V Sharma, R Tanner, D Schmidt, G Pribil, MS Matthias Albert, ...
International Conference on Frontiers of Characterization and Metrology for …, 2015
Progress in Spectroscopic Ellipsometry for the in-situ real-time investigation of Atomic Layer Depositions
M Junige, V Sharma, D Schmidt, M Albert, M Schubert, JW Bartha
8th Workshop Ellipsometry, 2014
Entwicklung und Charakterisierung eines Prozesses zur thermischen Atomlagenabscheidung von Ruthenium mit in-situ Messtechnik
M Junige
Technische Universität Dresden, 2011
On the early history of atomic layer deposition : most significant works and applications
J Aarik, E Ahvenniemi, AR Akbashev, S Ali, M Bechelany, M Berdova, ...
AVS 16th International Conference on Atomic Layer Deposition, 2016
In situ ellipsometric investigations during the ALD growth of Ru
M Junige, M Knaut, M Geidel, M Albert, JW Bartha
AVS 11th International Conference on Atomic Layer Deposition, 2011
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