| In-situ real-time ellipsometric investigations during the atomic layer deposition of ruthenium: A process development from [(ethylcyclopentadienyl)(pyrrolyl … M Knaut, M Junige, M Albert, JW Bartha Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 30 (1 …, 2012 | 38 | 2012 |
| Atomic layer deposition for high aspect ratio through silicon vias M Knaut, M Junige, V Neumann, H Wojcik, T Henke, C Hossbach, A Hiess, ... Microelectronic Engineering 107, 80-83, 2013 | 36 | 2013 |
| In-situ analysis on the initial growth of ultra-thin ruthenium films with atomic layer deposition M Geidel, M Junige, M Albert, JW Bartha Microelectronic Engineering 107, 151-155, 2013 | 22 | 2013 |
| Physical characterization of PECVD and PEALD Ru (-C) films and comparison with PVD Ruthenium film properties H Wojcik, M Junige, W Bartha, M Albert, V Neumann, U Merkel, A Peeva, ... Journal of The Electrochemical Society 159 (2), H166-H176, 2011 | 19 | 2011 |
| Graphene based electron field emitter C Wenger, J Kitzmann, A Wolff, M Fraschke, C Walczyk, G Lupina, ... Journal of Vacuum Science & Technology B, Nanotechnology and …, 2015 | 15 | 2015 |
| Area-selective atomic layer deposition of Ru on electron-beam-written Pt (C) patterns versus SiO2 substratum M Junige, M Löffler, M Geidel, M Albert, JW Bartha, E Zschech, ... Nanotechnology 28 (39), 395301, 2017 | 14 | 2017 |
| Monitoring atomic layer deposition processes in situ and in real-time by spectroscopic ellipsometry M Junige, M Geidel, M Knaut, M Albert, JW Bartha 2011 Semiconductor Conference Dresden, 1-4, 2011 | 11 | 2011 |
| Comparison of PVD, PECVD & PEALD Ru (-C) films as Cu diffusion barriers by means of bias temperature stress measurements H Wojcik, U Merkel, A Jahn, K Richter, M Junige, C Klein, J Gluch, ... Microelectronic Engineering 88 (5), 641-645, 2011 | 11 | 2011 |
| 3D system integration on 300 mm wafer level : high-aspect-ratio TSVs with ruthenium seed layer by thermal ald and subsequent copper electroplating S Killge, I Bartusseck, M Junige, V Neumann, C Wenzel, M Böttcher, ... Materials for Advanced Metallization, 2017 | 10 | 2017 |
| Overview of early publications on Atomic Layer Deposition J Aarik, AR Akbashev, M Bechelany, M Berdova, D Cameron, N Chekurov, ... AVS 14th International Conference on Atomic Layer Deposition, 2014 | 8* | 2014 |
| Area-selective molecular layer deposition of nylon 6, 2 polyamide: Growth on carbon and inhibition on silica M Junige, SM George Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 39 (2 …, 2021 | 7 | 2021 |
| High-definition nanoimprint stamp fabrication by atomic layer etching SA Khan, DB Suyatin, J Sundqvist, M Graczyk, M Junige, C Kauppinen, ... ACS Applied Nano Materials 1 (6), 2476-2482, 2018 | 4 | 2018 |
| In-situ real-time Spectroscopic Ellipsometry for the investigation of Atomic Layer Depositions on Graphene M Junige, T Oddoy, M Geidel, V Darakchieva, R Yakimova, C Wenger, ... 9th Workshop Ellipsometry, 2015 | 3 | 2015 |
| Virtual project on the history of ALD: Overview and current status RL Puurunen, Y Koshtyal, H Pedersen, JR van Ommen, J Sundqvist poster presentation at 13th International Baltic Conference on Atomic Layer …, 2015 | 2 | 2015 |
| Atomic Layer Deposition of Al2O3 on NF3-pre-treated graphene M Junige, T Oddoy, R Yakimova, V Darakchieva, C Wenger, G Lupina, ... SPIE microtechnologies 2015 : Nanotechnology VII 9519, 951915, 2015 | 2 | 2015 |
| In-Situ Real-Time Monitoring And Control Of Kinetic Processes In Atomic Layer Depositions By Spectroscopic Ellipsometry With 1.25 Hz Sampling Rate M Junige, V Sharma, R Tanner, D Schmidt, G Pribil, MS Matthias Albert, ... International Conference on Frontiers of Characterization and Metrology for …, 2015 | 2 | 2015 |
| Progress in Spectroscopic Ellipsometry for the in-situ real-time investigation of Atomic Layer Depositions M Junige, V Sharma, D Schmidt, M Albert, M Schubert, JW Bartha 8th Workshop Ellipsometry, 2014 | 2 | 2014 |
| Entwicklung und Charakterisierung eines Prozesses zur thermischen Atomlagenabscheidung von Ruthenium mit in-situ Messtechnik M Junige Technische Universität Dresden, 2011 | 2 | 2011 |
| On the early history of atomic layer deposition : most significant works and applications J Aarik, E Ahvenniemi, AR Akbashev, S Ali, M Bechelany, M Berdova, ... AVS 16th International Conference on Atomic Layer Deposition, 2016 | 1* | 2016 |
| In situ ellipsometric investigations during the ALD growth of Ru M Junige, M Knaut, M Geidel, M Albert, JW Bartha AVS 11th International Conference on Atomic Layer Deposition, 2011 | 1 | 2011 |
Johann W. BarthaProfessor für Halbleitertechnik, Technische Universität DresdenVerified email at tu-dresden.de
