| Boundary layer model to account for thick mask effects in photolithography J Tirapu-Azpiroz, P Burchard, E Yablonovitch Optical Microlithography XVI 5040, 1611-1619, 2003 | 88 | 2003 |
| Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process K Lai, AE Rosenbluth, S Bagheri, J Hoffnagle, K Tian, D Melville, ... Optical Microlithography XXII 7274, 82-93, 2009 | 70 | 2009 |
| Intensive optimization of masks and sources for 22nm lithography AE Rosenbluth, DO Melville, K Tian, S Bagheri, J Tirapu-Azpiroz, K Lai, ... Optical Microlithography XXII 7274, 67-81, 2009 | 66 | 2009 |
| Benefits and trade-offs of global source optimization in optical lithography K Tian, A Krasnoperova, D Melville, AE Rosenbluth, D Gil, ... Optical Microlithography XXII 7274, 105-116, 2009 | 50 | 2009 |
| Efficient isotropic modeling approach to incorporate electromagnetic effects into lithographic process simulations JT Azpiroz, AE Rosenbluth, I Graur US Patent 8,078,995, 2011 | 43 | 2011 |
| Process optimization through model based SRAF printing prediction R Viswanathan, JT Azpiroz, P Selvam Optical Microlithography XXV 8326, 437-446, 2012 | 41 | 2012 |
| Graphene-enabled and directed nanomaterial placement from solution for large-scale device integration M Engel, DB Farmer, JT Azpiroz, JWT Seo, J Kang, P Avouris, ... Nature communications 9 (1), 4095, 2018 | 35 | 2018 |
| Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations D Melville, AE Rosenbluth, K Tian, K Lai, S Bagheri, J Tirapu-Azpiroz, ... Optical Microlithography XXIII 7640, 51-68, 2010 | 34 | 2010 |
| Massively-parallel FDTD simulations to address mask electromagnetic effects in hyper–NA immersion lithography JT Azpiroz, GW Burr, AE Rosenbluth, M Hibbs Optical Microlithography XXI 6924, 336-350, 2008 | 29 | 2008 |
| Modeling polarization for hyper-NA lithography tools and masks K Lai, AE Rosenbluth, G Han, J Tirapu-Azpiroz, J Meiring, ... Optical Microlithography XX 6520, 152-173, 2007 | 29 | 2007 |
| Fast evaluation of photomask near-fields in subwavelength 193-nm lithography J Tirapu-Azpiroz, E Yablonovitch Optical Microlithography XVII 5377, 1528-1535, 2004 | 28 | 2004 |
| Study of the delay characteristics of 1‐D photonic bandgap microstrip structures J Tirapu, T Lopetegi, MAG Laso, MJ Erro, F Falcone, M Sorolla Microwave and Optical Technology Letters 23 (6), 346-349, 1999 | 28 | 1999 |
| system and method for projection lithography with immersed image-aligned diffractive element D Gil, DO Melville, AE Rosenbluth, K Tian, JT Azpiroz US Patent App. 12/168,310, 2010 | 26 | 2010 |
| Method for optimizing source and mask to control line width roughness and image log slope K Tian, AE Rosenbluth, DO Melville, JT Azpiroz, S Bagheri, K Lai US Patent 8,372,565, 2013 | 24 | 2013 |
| Improving yield through the application of process window OPC JT Azpiroz, A Krasnoperova, S Siddiqui, K Settlemyer, I Graur, I Stobert, ... Optical Microlithography XXII 7274, 346-358, 2009 | 23 | 2009 |
| Incorporating mask topography edge diffraction in photolithography simulations J Tirapu-Azpiroz, E Yablonovitch JOSA A 23 (4), 821-828, 2006 | 23 | 2006 |
| Method for forming arbitrary lithographic wavefronts using standard mask technology AE Rosenbluth, J Tirapu-Azpiroz US Patent 8,108,802, 2012 | 21 | 2012 |
| Computational lithography: exhausting the resolution limits of 193-nm projection lithography systems DOS Melville, AE Rosenbluth, A Waechter, M Millstone, J Tirapu-Azpiroz, ... Journal of Vacuum Science & Technology B 29 (6), 2011 | 19 | 2011 |
| Analysis and modeling of photomask near-fields in sub-wavelength deep ultraviolet lithography with optical proximity corrections J Tirapu-Azpiroz Ph. D. Dissertation, University of California, Los Angeles, 2004 | 19 | 2004 |
| High resolution imaging process using an in-situ image modifying layer K Patel, WS Huang, MC Lawson, JT Azpiroz US Patent 7,709,187, 2010 | 16 | 2010 |
Kafai LaiIBM ResearchVerified email at us.ibm.com
