| Inscription of fiber Bragg gratings with femtosecond pulses using a phase mask scanning technique J Thomas, E Wikszak, T Clausnitzer, U Fuchs, U Zeitner, S Nolte, ... Applied Physics A 86, 153-157, 2007 | 147 | 2007 |
| Laser lithographic fabrication and characterization of a spherical artificial compound eye D Radtke, J Duparré, UD Zeitner, A Tünnermann Optics express 15 (6), 3067-3077, 2007 | 146 | 2007 |
| Development, fabrication, and testing of an anamorphic imaging snap-together freeform telescope M Beier, J Hartung, T Peschel, C Damm, A Gebhardt, S Scheiding, ... Applied Optics 54 (12), 3530-3542, 2015 | 126 | 2015 |
| Laser-lithography on non-planar surfaces D Radtke, UD Zeitner Optics express 15 (3), 1167-1174, 2007 | 124 | 2007 |
| Ultra-short pulse propagation in complex optical systems U Fuchs, UD Zeitner, A Tünnermann Optics Express 13 (10), 3852-3861, 2005 | 120 | 2005 |
| Advanced mask aligner lithography: new illumination system R Voelkel, U Vogler, A Bich, P Pernet, KJ Weible, M Hornung, R Zoberbier, ... Optics express 18 (20), 20968-20978, 2010 | 118 | 2010 |
| Measuring the spatiotemporal electric field of tightly focused ultrashort pulses with sub-micron spatial resolution. P Bowlan, U Fuchs, R Trebino, UD Zeitner Optics Express 16 (18), 13663-13675, 2008 | 113 | 2008 |
| Beam homogenizers based on chirped microlens arrays F Wippermann, UD Zeitner, P Dannberg, A Bräuer, S Sinzinger Optics express 15 (10), 6218-6231, 2007 | 112 | 2007 |
| 152 W average power Tm-doped fiber CPA system F Stutzki, C Gaida, M Gebhardt, F Jansen, A Wienke, U Zeitner, F Fuchs, ... Optics letters 39 (16), 4671-4674, 2014 | 104 | 2014 |
| High performance diffraction gratings made by e-beam lithography UD Zeitner, M Oliva, F Fuchs, D Michaelis, T Benkenstein, T Harzendorf, ... Applied Physics A 109, 789-796, 2012 | 104 | 2012 |
| Homogeneous LED-illumination using microlens arrays P Schreiber, S Kudaev, P Dannberg, UD Zeitner Nonimaging Optics and Efficient Illumination Systems II 5942, 188-196, 2005 | 104 | 2005 |
| Advanced mask aligner lithography: fabrication of periodic patterns using pinhole array mask and Talbot effect L Stuerzebecher, T Harzendorf, U Vogler, UD Zeitner, R Voelkel Optics express 18 (19), 19485-19494, 2010 | 91 | 2010 |
| Wave optical analysis of light-emitting diode beam shaping using microlens arrays A Bu¨ ttner, UD Zeitner Optical Engineering 41 (10), 2393-2401, 2002 | 89 | 2002 |
| Watt-scale 50-MHz source of single-cycle waveform-stable pulses in the molecular fingerprint region TP Butler, D Gerz, C Hofer, J Xu, C Gaida, T Heuermann, M Gebhardt, ... Optics letters 44 (7), 1730-1733, 2019 | 86 | 2019 |
| Materials and technologies for fabrication of three-dimensional microstructures with sub-100 nm feature sizes by two-photon polymerization F Burmeister, S Steenhusen, R Houbertz, UD Zeitner, S Nolte, ... Journal of Laser Applications 24 (4), 2012 | 83 | 2012 |
| Table-top high-energy 7 μm OPCPA and 260 mJ Ho: YLF pump laser U Elu, T Steinle, D Sánchez, L Maidment, K Zawilski, P Schunemann, ... Optics letters 44 (13), 3194-3197, 2019 | 81 | 2019 |
| Illumination module for color display A Leitel, R Waldhäusl, P Schreiber, UD Zeitner US Patent 7,239,449, 2007 | 61 | 2007 |
| Ultrasonic probe and method for the optical detection of ultrasonic waves UD Zeitner, SI Schets, EV Sobrino US Patent 8,240,211, 2012 | 58 | 2012 |
| Fabrication of micro-optical surface profiles by using grayscale masks EB Kley, F Thoma, UD Zeitner, LC Wittig, H Aagedal Miniaturized Systems with Micro-Optics and Micromechanics III 3276, 254-262, 1998 | 57 | 1998 |
| Micromachined array-type Mirau interferometer for parallel inspection of MEMS J Albero, S Bargiel, N Passilly, P Dannberg, M Stumpf, UD Zeitner, ... Journal of Micromechanics and Microengineering 21 (6), 065005, 2011 | 55 | 2011 |
