Uwe Zeitner
Uwe Zeitner
Friedrich-Schiller-University Jena and Fraunhofer Institute of Applied Optics and Precision Engineering
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Cited by
Cited by
Laser lithographic fabrication and characterization of a spherical artificial compound eye
D Radtke, J Duparré, UD Zeitner, A Tünnermann
Optics express 15 (6), 3067-3077, 2007
Inscription of fiber Bragg gratings with femtosecond pulses using a phase mask scanning technique
J Thomas, E Wikszak, T Clausnitzer, U Fuchs, U Zeitner, S Nolte, ...
Applied Physics A 86, 153-157, 2007
Development, fabrication, and testing of an anamorphic imaging snap-together freeform telescope
M Beier, J Hartung, T Peschel, C Damm, A Gebhardt, S Scheiding, ...
Applied Optics 54 (12), 3530-3542, 2015
Laser-lithography on non-planar surfaces
D Radtke, UD Zeitner
Optics express 15 (3), 1167-1174, 2007
Ultra-short pulse propagation in complex optical systems
U Fuchs, UD Zeitner, A Tünnermann
Optics Express 13 (10), 3852-3861, 2005
Advanced mask aligner lithography: new illumination system
R Voelkel, U Vogler, A Bich, P Pernet, KJ Weible, M Hornung, R Zoberbier, ...
Optics express 18 (20), 20968-20978, 2010
Beam homogenizers based on chirped microlens arrays
F Wippermann, UD Zeitner, P Dannberg, A Bräuer, S Sinzinger
Optics express 15 (10), 6218-6231, 2007
Measuring the spatiotemporal electric field of tightly focused ultrashort pulses with sub-micron spatial resolution.
P Bowlan, U Fuchs, R Trebino, UD Zeitner
Optics Express 16 (18), 13663-13675, 2008
152 W average power Tm-doped fiber CPA system
F Stutzki, C Gaida, M Gebhardt, F Jansen, A Wienke, U Zeitner, F Fuchs, ...
Optics Letters 39 (16), 4671-4674, 2014
Homogeneous LED-illumination using microlens arrays
P Schreiber, S Kudaev, P Dannberg, UD Zeitner
Nonimaging Optics and Efficient Illumination Systems II 5942, 188-196, 2005
High performance diffraction gratings made by e-beam lithography
UD Zeitner, M Oliva, F Fuchs, D Michaelis, T Benkenstein, T Harzendorf, ...
Applied Physics A 109, 789-796, 2012
Advanced mask aligner lithography: fabrication of periodic patterns using pinhole array mask and Talbot effect
L Stuerzebecher, T Harzendorf, U Vogler, UD Zeitner, R Voelkel
Optics express 18 (19), 19485-19494, 2010
Wave optical analysis of light-emitting diode beam shaping using microlens arrays
A Bu¨ ttner, UD Zeitner
Optical Engineering 41 (10), 2393-2401, 2002
Watt-scale 50-MHz source of single-cycle waveform-stable pulses in the molecular fingerprint region
TP Butler, D Gerz, C Hofer, J Xu, C Gaida, T Heuermann, M Gebhardt, ...
Optics letters 44 (7), 1730-1733, 2019
Materials and technologies for fabrication of three-dimensional microstructures with sub-100 nm feature sizes by two-photon polymerization
F Burmeister, S Steenhusen, R Houbertz, UD Zeitner, S Nolte, ...
Journal of Laser Applications 24 (4), 2012
Table-top high-energy 7 μm OPCPA and 260 mJ Ho: YLF pump laser
U Elu, T Steinle, D Sánchez, L Maidment, K Zawilski, P Schunemann, ...
Optics letters 44 (13), 3194-3197, 2019
Illumination module for color display
A Leitel, R Waldhäusl, P Schreiber, UD Zeitner
US Patent 7,239,449, 2007
Fabrication of micro-optical surface profiles by using grayscale masks
EB Kley, F Thoma, UD Zeitner, LC Wittig, H Aagedal
Miniaturized Systems with Micro-Optics and Micromechanics III 3276, 254-262, 1998
Ultrasonic probe and method for the optical detection of ultrasonic waves
UD Zeitner, SI Schets, EV Sobrino
US Patent 8,240,211, 2012
Micromachined array-type Mirau interferometer for parallel inspection of MEMS
J Albero, S Bargiel, N Passilly, P Dannberg, M Stumpf, UD Zeitner, ...
Journal of Micromechanics and Microengineering 21 (6), 065005, 2011
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