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Markus Feifel
Markus Feifel
MOVPE Process Engineer bei II-VI Laser Enterprise
Bestätigte E-Mail-Adresse bei ii-vi.com
Titel
Zitiert von
Zitiert von
Jahr
Direct growth of a GaInP/GaAs/Si triple‐junction solar cell with 22.3% AM1. 5g efficiency
M Feifel, D Lackner, J Ohlmann, J Benick, M Hermle, F Dimroth
Solar RRL 3 (12), 1900313, 2019
732019
Gallium phosphide window layer for silicon solar cells
M Feifel, T Rachow, J Benick, J Ohlmann, S Janz, M Hermle, F Dimroth, ...
IEEE Journal of Photovoltaics 6 (1), 384-390, 2015
712015
Direct growth of III–V/silicon triple-junction solar cells with 19.7% efficiency
M Feifel, J Ohlmann, J Benick, M Hermle, J Belz, A Beyer, K Volz, ...
IEEE Journal of Photovoltaics 8 (6), 1590-1595, 2018
692018
MOVPE grown gallium phosphide–silicon heterojunction solar cells
M Feifel, J Ohlmann, J Benick, T Rachow, S Janz, M Hermle, F Dimroth, ...
IEEE Journal of Photovoltaics 7 (2), 502-507, 2017
682017
Epitaxial GaInP/GaAs/Si Triple‐Junction Solar Cell with 25.9% AM1.5g Efficiency Enabled by Transparent Metamorphic AlxGa1−xAsyP1−y Step‐Graded …
M Feifel, D Lackner, J Schön, J Ohlmann, J Benick, G Siefer, F Predan, ...
Solar RRL 5 (5), 2000763, 2021
482021
Influence of metal–organic vapor phase epitaxy reactor environment on the silicon bulk lifetime
J Ohlmann, M Feifel, T Rachow, J Benick, S Janz, F Dimroth, D Lackner
IEEE Journal of Photovoltaics 6 (6), 1668-1672, 2016
302016
Electron channeling contrast imaging investigation of stacking fault pyramids in GaP on Si nucleation layers
M Feifel, J Ohlmann, RM France, D Lackner, F Dimroth
Journal of Crystal Growth 532, 125422, 2020
222020
Single-and dual-variant atomic ordering in GaAsP compositionally graded buffers on GaP and Si substrates
RM France, M Feifel, J Belz, A Beyer, K Volz, J Ohlmann, D Lackner, ...
Journal of Crystal Growth 506, 61-70, 2019
92019
Monolithic integration of 940 nm AlGaAs distributed Bragg reflectors on bulk Ge substrates
Y Zhao, J Guo, M Feifel, HT Cheng, YC Yang, L Wang, L Chrostowski, ...
Optical Materials Express 12 (3), 1131-1139, 2022
82022
Advances in epitaxial GaInP/GaAs/Si triple junction solar cells
M Feifel, D Lackner, J Ohlmann, K Volz, T Hannappel, J Benick, M Hermle, ...
2020 47th IEEE Photovoltaic Specialists Conference (PVSC), 0194-0196, 2020
82020
A route to obtaining low-defect III–V epilayers on Si (100) utilizing MOCVD
M Nandy, A Paszuk, M Feifel, C Koppka, P Kleinschmidt, F Dimroth, ...
Crystal Growth & Design 21 (10), 5603-5613, 2021
62021
Counterbalancing light absorption and ionic transport losses in the electrolyte for integrated solar water splitting with III–V/Si dual-junctions
M Kölbach, C Özen, O Höhn, D Lackner, M Feifel, FF Abdi, MM May
Applied Physics Letters 119 (8), 2021
52021
Sol. RRL 3, 1900313 (2019)
M Feifel, D Lackner, J Ohlmann, J Benick, M Hermle, F Dimroth
5
Exploring new convergences between PV technologies for high efficiency tandem solar cells: Wide band gap epitaxial CIGS top cells on silicon bottom cells with III-V …
D Lincot, N Barreau, AB Slimane, T Bidaud, S Collin, M Feifel, F Dimroth, ...
Proceedings Oral Presentation 1AO 2, 1, 2018
32018
Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
S Janz, M Feifel, J Ohlmann, J Benick, C Weiss, M Hermle, AW Bett, ...
2016 IEEE 43rd Photovoltaic Specialists Conference (PVSC), 1902-1905, 2016
22016
Monolithically integrated 940 nm half VCSELs on bulk Ge substrates
Y Zhao, Z Wan, J Guo, YC Yang, HT Cheng, L Chrostowski, D Lackner, ...
IEEE Photonics Technology Letters, 2023
12023
Study of monolithically integrated 940 nm AlGaAs distributed Bragg reflectors on graded GaAsP/bulk Si substrates
J Guo, Y Zhao, M Feifel, HT Cheng, YC Yang, L Chrostowski, D Lackner, ...
Optical Materials Express 13 (4), 1077-1091, 2023
12023
Monolithically integrated 940 nm VCSELs on bulk Ge substrates
Z Wan, YC Yang, WH Chen, CC Chiu, Y Zhao, M Feifel, L Chrostowski, ...
Optics Express 32 (4), 6609-6618, 2024
2024
25 Gb/s NRZ transmission at 85° C using a high-speed 940 nm AlGaAs oxide-confined VCSEL grown on a Ge substrate
YC Yang, Z Wan, GT Hsu, CC Chiu, WH Chen, M Feifel, D Lackner, ...
Optics Letters 49 (3), 586-589, 2024
2024
Reduction of defects in GaP layers grown on Si (100) by MOCVD
M Nandy, A Paszuk, M Feifel, C Koppka, P Kleinschmidt, F Dimroth, ...
2021 IEEE 48th Photovoltaic Specialists Conference (PVSC), 1344-1347, 2021
2021
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