Atomic layer deposition for high aspect ratio through silicon vias M Knaut, M Junige, V Neumann, H Wojcik, T Henke, C Hossbach, A Hiess, ... Microelectronic Engineering 107, 80-83, 2013 | 47 | 2013 |
Growth of aluminum oxide thin films with enhanced film density by the integration of in situ flash annealing into low-temperature atomic layer deposition T Henke, M Knaut, C Hossbach, M Geidel, M Albert, JW Bartha Surface and Coatings Technology 309, 600-608, 2017 | 16 | 2017 |
Flash-enhanced atomic layer deposition: basics, opportunities, review, and principal studies on the flash-enhanced growth of thin films T Henke, M Knaut, C Hossbach, M Geidel, L Rebohle, M Albert, ... ECS Journal of Solid State Science and Technology 4 (7), P277, 2015 | 16 | 2015 |
Der Terroranschlag von Berlin–Die Vorgeschichte, der Einsatz und die Konsequenzen aus präklinischer Sicht TJ Henke, F Freund, D Wieprich, M Helm, MN Bergold, C Byhahn Notarzt 33 (02), 54-60, 2017 | 15 | 2017 |
Atomic layer deposition of tantalum oxide thin films using the precursor tert-butylimido-tris-ethylmethylamido-tantalum and water: Process characteristics and film … T Henke, M Knaut, M Geidel, F Winkler, M Albert, JW Bartha Thin Solid Films 627, 94-105, 2017 | 12 | 2017 |
Formation of regularly arranged large grain silicon islands by using embedded micro mirrors in the flash crystallization of amorphous silicon T Henke, JW Bartha, L Rebohle, U Merkel, R Hübner, M Albert, ... Journal of Applied Physics 115 (3), 2014 | 11 | 2014 |
Low‐thermal budget flash light annealing for Al2O3 surface passivation DK Simon, T Henke, PM Jordan, FPG Fengler, T Mikolajick, JW Bartha, ... physica status solidi (RRL)–Rapid Research Letters 9 (11), 631-635, 2015 | 5 | 2015 |
Flash-lamp-enhanced atomic layer deposition of thin films T Henke, M Knaut, C Hossbach, M Geidel, L Rebohle, M Albert, ... ECS Transactions 64 (9), 167, 2014 | 3 | 2014 |
The Berlin terrorist attack: the prehistory, the scene, and the aftermath from the prehospital point of view TJ Henke, F Freund, D Wieprich, M Helm, MN Bergold, C Byhahn Universität Ulm, 2017 | 2 | 2017 |
Untersuchungen zum Einsatz des ms-Blitzlampentemperns bei der Atomlagenabscheidung von dünnen Schichten und für die Rekristallisation von amorphem Silizium T Henke | | 2021 |
Untersuchungen zum Einsatz des ms-Blitzlampentemperns bei der Atomlagenabscheidung von dünnen Schichten und für die Rekristallisation von amorphem Silizium T Henke Dissertation, Dresden, Technische Universität Dresden, 2020, 2020 | | 2020 |
Full presentation can be viewed here: https://www. youtube. com/watch? v= f3OikQFsHkw C Hossbach, AA Günther, B Lüssem, M Sawatzki, T Henke, M Knaut, ... | | |