Tomas Kubart
Tomas Kubart
Verified email at angstrom.uu.se - Homepage
Title
Cited by
Cited by
Year
Chemical insights into the instability of Cu2ZnSnS4 films during annealing
JJ Scragg, T Ericson, T Kubart, M Edoff, C Platzer-Björkman
Chemistry of Materials 23 (20), 4625-4633, 2011
4552011
A detrimental reaction at the molybdenum back contact in Cu2ZnSn (S, Se) 4 thin-film solar cells
JJ Scragg, JT Watjen, M Edoff, T Ericson, T Kubart, C Platzer-Björkman
Journal of the American Chemical Society 134 (47), 19330-19333, 2012
3782012
Effects of Back Contact Instability on Cu2ZnSnS4 Devices and Processes
JJ Scragg, T Kubart, JT Wätjen, T Ericson, MK Linnarsson, ...
Chemistry of Materials 25 (15), 3162-3171, 2013
2762013
Influence of precursor sulfur content on film formation and compositional changes in Cu 2 ZnSnS 4 films and solar cells
C Platzer-Björkman, J Scragg, H Flammersberger, T Kubart, M Edoff
Solar Energy Materials and Solar Cells 98, 110-117, 2012
1932012
Temperature dependence of tribological properties of MoS< sub> 2</sub> and MoSe< sub> 2</sub> coatings
T Kubart, T Polcar, L Kopecký, R Novák, D Nováková
Surface and Coatings Technology 193 (1), 230-233, 2005
155*2005
Comparison of tribological behaviour of TiN, TiCN and CrN at elevated temperatures
T Polcar, T Kubart, R Novák, L Kopecký, P Široký
Surface and Coatings Technology 193 (1), 192-199, 2005
1552005
Rapid annealing of reactively sputtered precursors for Cu2ZnSnS4 solar cells
JJ Scragg, T Ericson, X Fontané, V Izquierdo‐Roca, A Pérez‐Rodríguez, ...
Progress in Photovoltaics: Research and Applications, 2012
1442012
Hysteresis and process stability in reactive high power impulse magnetron sputtering of metal oxides
M Aiempanakit, T Kubart, P Larsson, K Sarakinos, J Jensen, ...
Thin Solid Films 519 (22), 7779-7784, 2011
902011
Dynamic behaviour of the reactive sputtering process
T Kubart, O Kappertz, T Nyberg, S Berg
Thin Solid Films 515 (2), 421-424, 2006
892006
Understanding the discharge current behavior in reactive high power impulse magnetron sputtering of oxides
M Aiempanakit, A Aijaz, D Lundin, U Helmersson, T Kubart
Journal of Applied Physics 113 (13), 133302, 2013
832013
Effect of peak power in reactive high power impulse magnetron sputtering of titanium dioxide
M Aiempanakit, U Helmersson, A Aijaz, P Larsson, R Magnusson, ...
Surface and Coatings Technology 205 (20), 4828-4831, 2011
782011
Low-temperature synthesis of thermochromic vanadium dioxide thin films by reactive high power impulse magnetron sputtering
A Aijaz, YX Ji, J Montero, GA Niklasson, CG Granqvist, T Kubart
Solar Energy Materials and Solar Cells 149, 137-144, 2016
682016
Reactive sputtering of precursors for Cu 2 ZnSnS 4 thin film solar cells
T Ericson, T Kubart, JJ Scragg, C Platzer-Björkman
Thin Solid Films 520 (24), 7093-7099, 2012
682012
Process stabilization and increase of the deposition rate in reactive sputtering of metal oxides and oxynitrides
D Severin, O Kappertz, T Kubart, T Nyberg, S Berg, A Pflug, M Siemers, ...
Applied physics letters 88 (16), 161504, 2006
652006
Studies of hysteresis effect in reactive HiPIMS deposition of oxides
T Kubart, M Aiempanakit, J Andersson, T Nyberg, S Berg, U Helmersson
Surface and Coatings Technology 205, S303-S306, 2011
632011
ERD analysis and modification of TiO 2 thin films with heavy ions
J Jensen, D Martin, A Surpi, T Kubart
Nuclear Instruments and Methods in Physics Research Section B: Beam …, 2010
542010
High rate reactive magnetron sputter deposition of titanium oxide
T Kubart, D Depla, DM Martin, T Nyberg, S Berg
Applied Physics Letters 92 (22), 221501, 2008
542008
Annealing behavior of reactively sputtered precursor films for Cu 2 ZnSnS 4 solar cells
T Ericson, JJ Scragg, T Kubart, T Törndahl, C Platzer-Björkman
Thin Solid Films 535, 22-26, 2013
472013
Annealing behavior of reactively sputtered precursor films for Cu 2 ZnSnS 4 solar cells
T Ericson, JJ Scragg, T Kubart, T Törndahl, C Platzer-Björkman
Thin Solid Films 535, 22-26, 2013
472013
Modelling of low energy ion sputtering from oxide surfaces
T Kubart, T Nyberg, S Berg
Journal of Physics D: Applied Physics 43 (20), 205204, 2010
472010
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Articles 1–20