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Robert Hoekstra
Robert Hoekstra
Verified email at sandia.gov
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An overview of the Trilinos project
MA Heroux, RA Bartlett, VE Howle, RJ Hoekstra, JJ Hu, TG Kolda, ...
ACM Transactions on Mathematical Software (TOMS) 31 (3), 397-423, 2005
14752005
Two‐dimensional modeling of high plasma density inductively coupled sources for materials processing
PLG Ventzek, RJ Hoekstra, MJ Kushner
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1994
4581994
Two‐dimensional hybrid model of inductively coupled plasma sources for etching
PLG Ventzek, TJ Sommerer, RJ Hoekstra, MJ Kushner
Applied physics letters 63 (5), 605-607, 1993
2181993
Microtrenching resulting from specular reflection during chlorine etching of silicon
RJ Hoekstra, MJ Kushner, V Sukharev, P Schoenborn
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1998
1461998
Integrated plasma equipment model for polysilicon etch profiles in an inductively coupled plasma reactor with subwafer and superwafer topography
RJ Hoekstra, MJ Grapperhaus, MJ Kushner
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 15 (4 …, 1997
1441997
Predictions of ion energy distributions and radical fluxes in radio frequency biased inductively coupled plasma etching reactors
RJ Hoekstra, MJ Kushner
Journal of applied physics 79 (5), 2275-2286, 1996
1041996
A 10‐year follow‐up after transurethral resection of the prostate, contact laser prostatectomy and electrovaporization in men with benign prostatic hyperplasia; long‐term …
RJ Hoekstra, HHE Van Melick, ET Kok, JLH Ruud Bosch
BJU international 106 (6), 822-826, 2010
832010
Performance of a parallel algebraic multilevel preconditioner for stabilized finite element semiconductor device modeling
PT Lin, JN Shadid, M Sala, RS Tuminaro, GL Hennigan, RJ Hoekstra
Journal of Computational Physics 228 (17), 6250-6267, 2009
752009
Spatial distributions of dust particles in plasmas generated by capacitively coupled radiofrequency discharges
SJ Choi, PLG Ventzek, RJ Hoekstra, MJ Kushner
Plasma Sources Science and Technology 3 (3), 418, 1994
671994
Xyce Parallel Electronic Simulator: users' guide.
ER Keiter, T Mei, TV Russo, EL Rankin, RL Schiek, HK Thornquist, ...
Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA …, 2012
59*2012
A parallel preconditioning strategy for efficient transistor-level circuit simulation
HK Thornquist, ER Keiter, RJ Hoekstra, DM Day, EG Boman
Proceedings of the 2009 International Conference on Computer-Aided Design …, 2009
562009
Comparison of two-dimensional and three-dimensional models for profile simulation of poly-Si etching of finite length trenches
RJ Hoekstra, MJ Kushner
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 16 (6 …, 1998
431998
The Xyce™ parallel electronic simulator–an overview
S Hutchinson, E Keiter, R Hoekstra, H Watts, A Waters, T Russo, ...
Parallel Computing: Advances and Current Issues, 165-172, 2002
412002
Penile intraepithelial neoplasia: nomenclature, incidence and progression to malignancy in the Netherlands
RJ Hoekstra, EJ Trip, FJ Ten Kate, S Horenblas, MTWT Lock
International Journal of Urology 26 (3), 353-357, 2019
402019
Large-scale transient sensitivity analysis of a radiation-damaged bipolar junction transistor via automatic differentiation
ET Phipps, RA Bartlett, DM Gay, RJ Hoekstra
Advances in automatic differentiation, 351-362, 2008
402008
Parallel transistor-level circuit simulation
ER Keiter, HK Thornquist, RJ Hoekstra, TV Russo, RL Schiek, EL Rankin
Simulation and Verification of Electronic and Biological Systems, 1-21, 2011
302011
Redesigning the WARPED simulation kernel for analysis and application development
DE Martin, PA Wilsey, RJ Hoekstra, ER Keiter, SA Hutchinson, TV Russo, ...
36th Annual Simulation Symposium, 2003., 216-223, 2003
302003
Simulation of neutron radiation damage in silicon semiconductor devices
GL Hennigan, RJ Hoekstra, JP Castro, DA Fixel, JN Shadid
Sandia National Laboratories, Albuquerque, NM, Tech. Rep. SAND2007-7157, 2007
242007
Trilinos home page
MA Heroux, RA Bartlett, VE Howle, RJ Hoekstra, JJ Hu, TG Kolda, ...
Go online to http://software. sandia. gov/trilinos, 2004
242004
The effect of subwafer dielectrics on plasma properties in plasma etching reactors
RJ Hoekstra, MJ Kushner
Journal of applied physics 77 (8), 3668-3673, 1995
241995
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