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Sean King
Sean King
Principal Engineer
Bestätigte E-Mail-Adresse bei intel.com
Titel
Zitiert von
Zitiert von
Jahr
Cleaning of AlN and GaN surfaces
SW King, JP Barnak, MD Bremser, KM Tracy, C Ronning, RF Davis, ...
Journal of applied physics 84 (9), 5248-5260, 1998
4001998
Transistor having an etch stop layer including a metal compound that is selectively formed over a metal gate
A Ott, S King, A Sharma
US Patent 8,120,114, 2012
3892012
Adhesion and electromigration performance at an interface between a dielectric and metal
S King, J Klaus
US Patent 8,178,436, 2012
3732012
Plasma enhanced atomic layer deposition of SiNx: H and SiO2
SW King
Journal of Vacuum Science & Technology A 29 (4), 2011
2082011
Cleaning of GaN surfaces
LL Smith, SW King, RJ Nemanich, RF Davis
Journal of electronic materials 25 (5), 805-810, 1996
1961996
Selective deposition of amorphous silicon films on metal gates
J Klaus, S King, W Rachmady
US Patent 7,816,218, 2010
1862010
Dielectric barrier, etch stop, and metal capping materials for state of the art and beyond metal interconnects
SW King
ECS Journal of Solid State Science and Technology 4 (1), N3029, 2014
1792014
UV photoemission study of heteroepitaxial AlGaN films grown on 6H-SiC
MC Benjamin, MD Bremser, TW Weeks Jr, SW King, RF Davis, ...
Applied Surface Science 104, 455-460, 1996
1521996
Negative electron affinity surfaces of aluminum nitride and diamond
RJ Nemanich, PK Baumann, MC Benjamin, ...
Diamond Relat. Mater 5 (6), 790-796, 1996
1341996
Fourier transform infrared spectroscopy investigation of chemical bonding in low-k a-SiC: H thin films
SW King, M French, J Bielefeld, WA Lanford
Journal of Non-Crystalline Solids 357 (15), 2970-2983, 2011
1152011
Thermal conductivity and thermal boundary resistance of atomic layer deposited high-k dielectric aluminum oxide, hafnium oxide, and titanium oxide thin films on …
EA Scott, JT Gaskins, SW King, PE Hopkins
APL Materials 6 (5), 058302, 2018
1122018
Investigation and Review of the Thermal, Mechanical, Electrical, Optical, and Structural Properties of Atomic Layer Deposited High-k Dielectrics: Beryllium Oxide, Aluminum …
JT Gaskins, PE Hopkins, DR Merrill, SR Bauers, E Hadland, DC Johnson, ...
ECS Journal of Solid State Science and Technology 6 (10), N189-N208, 2017
1072017
Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
N Alimardani, SW King, BL French, C Tan, BP Lampert, JF Conley
Journal of Applied Physics 116 (2), 2014
972014
Dependence of (0001) GaN/AlN valence band discontinuity on growth temperature and surface reconstruction
SW King, C Ronning, RF Davis, MC Benjamin, RJ Nemanich
Journal of applied physics 84 (4), 2086-2090, 1998
941998
Influence of network bond percolation on the thermal, mechanical, electrical and optical properties of high and low-k a-SiC: H thin films
SW King, J Bielefeld, G Xu, WA Lanford, Y Matsuda, RH Dauskardt, N Kim, ...
Journal of Non-Crystalline Solids 379, 67-79, 2013
852013
Research Updates: The three M's (materials, metrology, and modeling) together pave the path to future nanoelectronic technologies
SW King, H Simka, D Herr, H Akinaga, M Garner
APL Materials 1 (4), 040701, 2013
822013
Intrinsic stress effect on fracture toughness of plasma enhanced chemical vapor deposited SiN x: H films
S King, R Chu, G Xu, J Huening
Thin Solid Films 518 (17), 4898-4907, 2010
782010
Selective deposition of a dielectric on a self-assembled monolayer-adsorbed metal
AK Sharma, S King, D Hanken, AW Ott
US Patent 7,790,631, 2010
752010
Film property requirements for hermetic low-k a-SiOxCyNz: H dielectric barriers
SW King, D Jacob, D Vanleuven, B Colvin, J Kelly, M French, J Bielefeld, ...
ECS Journal of Solid State Science and Technology 1 (6), N115, 2012
722012
Wet Chemical Processing of (0001) Si 6H‐SiC Hydrophobic and Hydrophilic Surfaces
SW King, RJ Nemanich, RF Davisa
Journal of the Electrochemical Society 146 (5), 1910-1917, 1999
721999
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