Jason Cain
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Year
Modeling within-die spatial correlation effects for process-design co-optimization
P Friedberg, Y Cao, J Cain, R Wang, J Rabaey, C Spanos
Sixth international symposium on quality electronic design (isqed'05), 516-521, 2005
2572005
EUV microexposures at the ALS using the 0.3-NA MET projection optics
P Naulleau, KA Goldberg, E Anderson, JP Cain, P Denham, B Hoef, ...
Emerging Lithographic Technologies IX 5751, 56-63, 2005
582005
Extreme ultraviolet microexposures at the Advanced Light Source using the 0.3 numerical aperture micro-exposure tool optic
PP Naulleau, KA Goldberg, E Anderson, JP Cain, P Denham, K Jackson, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004
552004
Decomposition strategies for self-aligned double patterning
Y Ma, J Sweis, C Bencher, H Dai, Y Chen, JP Cain, Y Deng, J Kye, ...
Design for Manufacturability through Design-Process Integration IV 7641, 76410T, 2010
532010
Electrical linewidth metrology for systematic CD variation characterization and causal analysis
JP Cain, CJ Spanos
Metrology, Inspection, and Process Control for Microlithography XVII 5038 …, 2003
382003
Experimental and model-based study of the robustness of line-edge roughness metric extraction in the presence of noise
PP Naulleau, JP Cain
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2007
352007
Investigation of the current resolution limits of advanced extreme ultraviolet (EUV) resists
PP Naulleau, C Rammeloo, JP Cain, K Dean, P Denham, KA Goldberg, ...
Emerging Lithographic Technologies X 6151, 61510Y, 2006
302006
Value-added metrology
BD Bunday, JA Allgair, M Caldwell, EP Solecky, CN Archie, BJ Rice, ...
IEEE Transactions on semiconductor manufacturing 20 (3), 266-277, 2007
282007
Lithography process control using scatterometry metrology and semi-physical modeling
K Lensing, J Cain, A Prabhu, A Vaid, R Chong, R Good, B LaFontaine, ...
Metrology, Inspection, and Process Control for Microlithography XXI 6518, 651804, 2007
262007
Extreme ultraviolet lithography capabilities at the advanced light source using a 0.3-NA optic
P Naulleau, KA Goldberg, JP Cain, EH Anderson, KR Dean, P Denham, ...
IEEE journal of quantum electronics 42 (1), 44-50, 2005
262005
Modeling within-field gate length spatial variation for process-design co-optimization
P Friedberg, Y Cao, J Cain, R Wang, J Rabaey, C Spanos
Design and Process Integration for Microelectronic Manufacturing III 5756 …, 2005
242005
Critical dimension sensitivity to post-exposure bake temperature variations in EUV photoresists
JP Cain, P Naulleau, CJ Spanos
Emerging Lithographic Technologies IX 5751, 1092-1100, 2005
212005
Characterization of the synchrotron-based 0.3 numerical aperture extreme ultraviolet microexposure tool at the Advanced Light Source
P Naulleau, JP Cain, E Anderson, K Dean, P Denham, KA Goldberg, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2005
202005
Characterization of the synchrotron-based 0.3 numerical aperture extreme ultraviolet microexposure tool at the Advanced Light Source
P Naulleau, JP Cain, E Anderson, K Dean, P Denham, KA Goldberg, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2005
202005
Across-wafer CD uniformity control through lithography and etch process: experimental verification
Q Zhang, C Tang, J Cain, A Hui, T Hsieh, N Maccrae, B Singh, K Poolla, ...
Metrology, Inspection, and Process Control for Microlithography XXI 6518, 65182C, 2007
172007
Lithographic characterization of the field dependent astigmatism and alignment stability of a 0.3 numerical aperture extreme ultraviolet microfield optic
PP Naulleau, JP Cain, KA Goldberg
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2005
172005
Planar superconductor-insulator-superconductor mixer array receivers for wide field of view astronomical observation
W Shan, S Ezaki, J Liu, S Asayama, T Noguchi, S Iguchi
Millimeter, Submillimeter, and Far-Infrared Detectors and Instrumentation …, 2018
15*2018
Methodology for analyzing and quantifying design style changes and complexity using topological patterns
JP Cain, YC Lai, F Gennari, J Sweis
Design-Process-Technology Co-optimization for Manufacturability X 9781, 978108, 2016
152016
Lithographic characterization of the spherical error in an extreme-ultraviolet optic by use of a programmable pupil-fill illuminator
PP Naulleau, JP Cain, KA Goldberg
Applied optics 45 (9), 1957-1963, 2006
152006
Lithographic measurement of EUV flare in the 0.3-NA micro exposure tool optic at the Advanced Laser Source
JP Cain, P Naulleau, CJ Spanos
Emerging Lithographic Technologies IX 5751, 301-311, 2005
152005
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Articles 1–20