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Martijn FJ Vos
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Atomic layer deposition of molybdenum oxide from (NtBu) 2 (NMe2) 2Mo and O2 plasma
MFJ Vos, B Macco, NFW Thissen, AA Bol, WMM Kessels
Journal of Vacuum Science & Technology A 34 (1), 2016
1442016
Low‐temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
B Macco, MFJ Vos, NFW Thissen, AA Bol, WMM Kessels
physica status solidi (RRL)–Rapid Research Letters 9 (7), 393-396, 2015
1172015
Area-selective deposition of ruthenium by combining atomic layer deposition and selective etching
MFJ Vos, SN Chopra, MA Verheijen, JG Ekerdt, S Agarwal, WMM Kessels, ...
Chemistry of Materials 31 (11), 3878-3882, 2019
1022019
Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
MFJ Vos, G van Straaten, WMME Kessels, AJM Mackus
The Journal of Physical Chemistry C 122 (39), 22519-22529, 2018
432018
Concepts and prospects of passivating contacts for crystalline silicon solar cells
J Melskens, BWH van de Loo, B Macco, MFJ Vos, J Palmans, S Smit, ...
2015 IEEE 42nd Photovoltaic Specialist Conference (PVSC), 1-6, 2015
292015
WMM (Erwin) Kessels
MFJ Vos, B Macco, NFW Thissen, AA Bol
J. Vac. Sci. Technol., A 34, 01A103, 2016
252016
Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
MFJ Vos, HCM Knoops, RA Synowicki, WMM Kessels, AJM Mackus
Applied Physics Letters 111 (11), 2017
212017
Isotropic plasma atomic layer etching of Al2O3 using a fluorine containing plasma and Al (CH3) 3
NJ Chittock, MFJ Vos, T Faraz, WMM Kessels, H Knoops, AJM Mackus
Applied Physics Letters 117 (16), 2020
172020
Atomic layer deposition of ruthenium using an ABC-type process: Role of oxygen exposure during nucleation
SN Chopra, MFJ Vos, MA Verheijen, JG Ekerdt, WMM Kessels, ...
Journal of Vacuum Science & Technology A 38 (6), 2020
102020
Plasma-enhanced atomic layer deposition of cobalt and cobalt nitride: what controls the incorporation of nitrogen?
G van Straaten, R Deckers, MFJ Vos, WMM Kessels, M Creatore
The Journal of Physical Chemistry C 124 (40), 22046-22054, 2020
102020
Atomic layer deposition and selective etching of ruthenium for area-selective deposition: Temperature dependence and supercycle design
MFJ Vos, SN Chopra, JG Ekerdt, S Agarwal, WMM Kessels, AJM Mackus
Journal of Vacuum Science & Technology A 39 (3), 2021
92021
Atomic-Layer Deposition Process Development-10 steps to successfully develop, optimize and characterize ALD recipes
MFJ Vos
EPFL: Swiss Federal Institute of Technology Lausanne, 2019
92019
Influence of magnetic configuration on edge turbulence and transport in the H-1 Heliac
CA Michael, F Zhao, B Blackwell, MFJ Vos, J Brotankova, SR Haskey, ...
Plasma Physics and Controlled Fusion 59 (2), 024001, 2016
52016
Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma
MFJ Vos, HCM Knoops, WMM Kessels, AJM Mackus
The Journal of Physical Chemistry C 125 (7), 3913-3923, 2021
42021
Development and understanding of advanced atomic layer deposition processes: AlF3, Co, and Ru
MFJ Vos
12019
Isotropic plasma atomic layer etching of Al
NJ Chittock, MFJ Vos, T Faraz, WMME Kessels, HCM Knoops, ...
Journal of Vacuum Science & Technology A 33, 020802, 2015
12015
Reaction Mechanisms during Atomic Layer Deposition of AlF₃ Using Al (CH₃) ₃ and SF₆ Plasma
MFJ Vos, H Knoops, WMM Kessels, AJM Mackus
2021
Een nieuwe atoomlaagdepositieproces voor efficiëntere zonnecellen
MFJ Vos, B Macco, WMM Kessels
Nevac Blad 5 (1), 8-13, 2016
2016
Atomic layer deposition of molybdenum oxide from (N {sup t} Bu){sub 2}(NMe {sub 2}){sub 2} Mo and O {sub 2} plasma
MFJ Vos, B Macco, NFW Thissen, AA Bol, WMM Kessels
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films 34 (1), 2016
2016
Atomic layer deposition of molybdenum oxide
MFJ Vos
2015
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