| Caching of lithography and etch simulation results G Lippincott, N Cobb, R Todd US Patent 6,973,633, 2005 | 69 | 2005 |
| Selective promotion for resolution enhancement techniques NB Cobb, LW Grodd, GP Lippincott, E Sahouria US Patent 6,668,367, 2003 | 58* | 2003 |
| Selective promotion for resolution enhancement techniques NB Cobb, LW Grodd, GP Lippincott, E Sahouria US Patent 6,668,367, 2003 | 58* | 2003 |
| Short edge management in rule based OPC GP Lippincott, K Sakajiri, LW Grodd US Patent 6,817,003, 2004 | 45 | 2004 |
| OPC conflict identification and edge priority system GP Lippincott US Patent 7,240,305, 2007 | 37 | 2007 |
| Short edge management in rule based OPC GP Lippincott, K Sakajiri, LW Grodd US Patent 7,181,721, 2007 | 35 | 2007 |
| Short edge smoothing for enhanced scatter bar placement GP Lippincott US Patent 6,857,109, 2005 | 30 | 2005 |
| OPC conflict identification and edge priority system GP Lippincott US Patent 7,865,863, 2011 | 29 | 2011 |
| Short edge smoothing for enhanced scatter bar placement GP Lippincott US Patent 7,281,234, 2007 | 29 | 2007 |
| Model-based OPC using the MEEF matrix II J Lei, L Hong, G Lippincott, J Word Optical Microlithography XXVII 9052, 170-178, 2014 | 16 | 2014 |
| Directed self-assembly (DSA) grapho-epitaxy template generation with immersion lithography Y Ma, J Lei, JA Torres, L Hong, J Word, G Fenger, A Tritchkov, ... Alternative Lithographic Technologies VII 9423, 23-33, 2015 | 14 | 2015 |
| Pre-bias optical proximity correction JAT Robles, AM Jost, MC Simmons, GP Lippincott US Patent 8,185,847, 2012 | 13 | 2012 |
| Pre-bias optical proximity correction JAT Robles, AM Jost, MC Simmons, GP Lippincott US Patent 7,739,650, 2010 | 12 | 2010 |
| Generation and placement of sub-resolution assist features GP Lippincott, L Friedrich US Patent App. 12/821,065, 2010 | 11 | 2010 |
| Retargeting based on process window simulation CE Reid, GP Lippincott US Patent 8,533,637, 2013 | 9 | 2013 |
| Directed self-assembly graphoepitaxy template generation with immersion lithography Y Ma, J Lei, J Andres Torres, L Hong, J Word, G Fenger, A Tritchkov, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 14 (3), 031216-031216, 2015 | 7 | 2015 |
| Can fast rule-based assist feature generation in random-logic contact layout provide sufficient process window? A Omran, G Lippincott, J Schacht, J Lei, L Hong, L Friedrich, R Shen, ... Optical Microlithography XXV 8326, 575-585, 2012 | 7 | 2012 |
| Layout design defect repair using inverse lithography G Lippincott, Y Granik, S Kobelkov US Patent 8,788,982, 2014 | 6 | 2014 |
| Layout decomposition based on partial intensity distribution CE Reid, GP Lippincott, SM Komirenko US Patent 8,352,891, 2013 | 6 | 2013 |
| Site selective optical proximity correction GP Lipincott, CE Reid US Patent 8,191,017, 2012 | 6 | 2012 |
