Marc Hofmann
Marc Hofmann
Fraunhofer Institute Solar Energy Systems
Bestätigte E-Mail-Adresse bei
Zitiert von
Zitiert von
Very low surface recombination velocity on -type -Si by high-rate plasma-deposited aluminum oxide
P Saint-Cast, D Kania, M Hofmann, J Benick, J Rentsch, R Preu
Applied Physics Letters 95 (15), 151502, 2009
High-efficiency c-Si solar cells passivated with ALD and PECVD aluminum oxide
P Saint-Cast, J Benick, D Kania, L Weiss, M Hofmann, J Rentsch, R Preu, ...
IEEE Electron Device Letters 31 (7), 695-697, 2010
Surface passivation of crystalline silicon by plasma-enhanced chemical vapor deposition double layers of silicon-rich silicon oxynitride and silicon nitride
J Seiffe, L Gautero, M Hofmann, J Rentsch, R Preu, S Weber, RA Eichel
Journal of Applied Physics 109 (3), 034105, 2011
Silicon surface passivation by thin thermal oxide/PECVD layer stack systems
S Mack, A Wolf, C Brosinsky, S Schmeisser, A Kimmerle, P Saint-Cast, ...
IEEE Journal of Photovoltaics 1 (2), 135-145, 2011
Recent developments in rear-surface passivation at Fraunhofer ISE
M Hofmann, S Janz, C Schmidt, S Kambor, D Suwito, N Kohn, J Rentsch, ...
Solar energy Materials and Solar cells 93 (6-7), 1074-1078, 2009
Stack system of PECVD amorphous silicon and PECVD silicon oxide for silicon solar cell rear side passivation
M Hofmann, C Schmidt, N Kohn, J Rentsch, SW Glunz, R Preu
Progress in Photovoltaics: Research and Applications 16 (6), 509-518, 2008
Phosphorus-doped SiC as an excellent -type Si surface passivation layer
S Janz, S Riepe, M Hofmann, S Reber, S Glunz
Applied Physics Letters 88 (13), 133516, 2006
Comparison of different dielectric passivation layers application in industrially feasible high efficiency crystalline silicon solar cells
SW Glunz, A Grohe, M Hermle, M Hofmann, S Janz, T Roth, O Schultz, ...
Presented at the 20th European Photovoltaic Solar Energy Conference and …, 2005
High-temperature stability of c-Si surface passivation by thick PECVD Al2O3 with and without hydrogenated capping layers
P Saint-Cast, D Kania, R Heller, S Kuehnhold, M Hofmann, J Rentsch, ...
Applied surface science 258 (21), 8371-8376, 2012
PECVD-ONO: A New Deposited Firing Stable Rear Surface Passivation Layer System for Crystalline Silicon Solar Cells.
M Hofmann, S Kambor, C Schmidt, D Grambole, J Rentsch, SW Glunz, ...
Advances in OptoElectronics, 2008
20th European Photovoltaic Solar Energy Conference
SW Glunz, A Grohe, M Hofmann, S Janz, O Schultz, M Vetter, I Martín, ...
Barcelona, Spain, 572, 2005
Variation of the layer thickness to study the electrical property of PECVD Al2O3/c-Si interface
P Saint-Cast, YH Heo, E Billot, P Olwal, M Hofmann, J Rentsch, SW Glunz, ...
Energy Procedia 8, 642-647, 2011
Advanced analytical model for the effective recombination velocity of locally contacted surfaces
P Saint-Cast, M Rüdiger, A Wolf, M Hofmann, J Rentsch, R Preu
Journal of Applied Physics 108 (1), 013705, 2010
Very low surface recombination velocity of boron doped emitter passivated with plasma-enhanced chemical-vapor-deposited AlOx layers
P Saint-Cast, A Richter, E Billot, M Hofmann, J Benick, J Rentsch, R Preu, ...
Thin Solid Films 522, 336-339, 2012
21%-efficient silicon solar cells using amorphous silicon rear side passivation
M Hofmann, S Glunz, R Preu, G Willeke
Proceedings of the 21st European Photovoltaic Solar Energy Conference and …, 2006
Silicon oxide/silicon nitride stack system for 20% efficient silicon solar cells
O Schultz, M Hofmann, SW Glunz, GP Willeke
Conference Record of the Thirty-first IEEE Photovoltaic Specialists …, 2005
High-temperature degradation in plasma-enhanced chemical vapor deposition Al2O3 surface passivation layers on crystalline silicon
S Kühnhold, P Saint-Cast, B Kafle, M Hofmann, F Colonna, M Zacharias
Journal of Applied Physics 116 (5), 054507, 2014
Cost modeling of silicon solar cell production innovation along the PV value chain
S Nold, N Voigt, L Friedrich, D Weber, I Hädrich, M Mittag, H Wirth, ...
Proceedings of the 27th European Photovoltaic Solar Energy Conference and …, 2012
Alternative rear surface passivation for industrial cell production
J Seiffe, L Weiss, M Hofmann, L Gautero, J Rentsch
Proceedings of the 23rd European Photovoltaic Solar Energy Conference, 1700-1703, 2008
Thermal oxidation as a key technology for high efficiency screen printed industrial silicon solar cells
D Biro, S Mack, A Wolf, A Lemke, U Belledin, D Erath, B Holzinger, ...
2009 34th IEEE Photovoltaic Specialists Conference (PVSC), 001594-001599, 2009
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