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Violeta Georgieva
Violeta Georgieva
R&D Engineer, imec
Bestätigte E-Mail-Adresse bei imec.be - Startseite
Titel
Zitiert von
Zitiert von
Jahr
Numerical investigation of ion-energy-distribution functions in single and dual frequency capacitively coupled plasma reactors
V Georgieva, A Bogaerts, R Gijbels
Physical Review E 69 (2), 026406, 2004
1582004
Plasma assisted catalytic decomposition of CO2
G. Chen, V. Georgieva, T. Godfroid, R. Snyders, M.-P. Delplancke-Ogletree
Applied Catalysis B: Environmental 190, 115-124, 2016
1532016
Numerical study of discharges in single- and dual-frequency capacitively coupled plasma reactors
V Georgieva, A Bogaerts, R Gijbels
Journal of applied physics 94 (6), 3748-3756, 2003
1342003
An overview on CO2 conversion in a microwave discharge: the role of plasma-catalysis
G Chen, N Britun, T Godfroid, V Georgieva, R Snyders, ...
Journal of Physics D: Applied Physics 50, 084001, 2017
1222017
Numerical simulation of dual frequency etching reactors: Influence of the external process parameters on the plasma characteristics
V Georgieva, A Bogaerts
Journal of applied physics 98 (2), 2005
1072005
Plasma-catalytic conversion of CO2 and CO2/H2O in a surface-wave sustained microwave discharge
Guoxing Chen, Thomas Godfroid, Nikolay Britun, Violeta Georgieva, Marie ...
Applied Catalysis B: Environmental 214, 114-125, 2017
1022017
Particle-in-cell/Monte Carlo simulation of a capacitively coupled radio frequency discharge: Effect of gas composition
V Georgieva, A Bogaerts, R Gijbels
Journal of applied physics 93 (5), 2369-2379, 2003
982003
Simultaneous dissociation of CO2 and H2O to syngas in a surface-wave microwave discharge
G Chen, T Silva, V Georgieva, T Godfroid, N Britun, R Snyders, ...
International Journal of Hydrogen Energy 40 (9), 3789-3796, 2015
952015
Sputter-deposited Mg–Al–O thin films: linking molecular dynamics simulations to experiments
V Georgieva, M Saraiva, N Jehanathan, OI Lebelev, D Depla, A Bogaerts
Journal of Physics D: Applied Physics 42 (6), 065107, 2009
532009
Understanding Microwave Surface‐Wave Sustained Plasmas at Intermediate Pressure by 2D Modeling and Experiments
V Georgieva, A Berthelot, T Silva, S Kolev, W Graef, N Britun, G Chen, ...
Plasma Processes and Polymers 14 (4-5), 1600185, 2017
452017
Compositional effects on the growth of Mg (M) O films
M Saraiva, V Georgieva, S Mahieu, K Van Aeken, A Bogaerts, D Depla
Journal of Applied Physics 107 (3), 2010
442010
Study of the nucleation and growth of TiO2 and ZnO thin films by means of molecular dynamics simulations
N Baguer, V Georgieva, L Calderin, IT Todorov, S Van Gils, A Bogaerts
Journal of crystal growth 311 (16), 4034-4043, 2009
432009
Computer modeling of plasmas and plasma‐surface interactions
A Bogaerts, E Bultinck, M Eckert, V Georgieva, M Mao, E Neyts, ...
Plasma Processes and Polymers 6 (5), 295-307, 2009
422009
Plasma characteristics of an Ar/CF4/N2 discharge in an asymmetric dual frequency reactor: numerical investigation by a PIC/MC model
V Georgieva, A Bogaerts
Plasma Sources Science and Technology 15 (3), 368, 2006
402006
Understanding the surface diffusion processes during magnetron sputter-deposition of complex oxide Mg–Al–O thin films
V Georgieva, AF Voter, A Bogaerts
Crystal growth & design 11 (6), 2553-2558, 2011
282011
Modeling of the plasma chemistry and plasma–surface interactions in reactive plasmas
A Bogaerts, C De Bie, M Eckert, V Georgieva, T Martens, E Neyts, S Tinck
Pure and Applied Chemistry 82 (6), 1283-1299, 2010
262010
Molecular dynamics simulation of oxide thin film growth: Importance of the inter-atomic interaction potential
V Georgieva, IT Todorov, A Bogaerts
Chemical Physics Letters 485 (4-6), 315-319, 2010
212010
Computer simulations for processing plasmas
A Bogaerts, K De Bleecker, V Georgieva, I Kolev, M Madani, E Neyts
Plasma Processes and Polymers 3 (2), 110-119, 2006
182006
Influence of Al content on the properties of MgO grown by reactive magnetron sputtering
M Saraiva, H Chen, WP Leroy, S Mahieu, N Jehanathan, O Lebedev, ...
Plasma Processes and Polymers 6 (S1), S751-S754, 2009
142009
Negative ion behavior in single-and dual-frequency plasma etching reactors: Particle-in-cell/Monte Carlo collision study
V Georgieva, A Bogaerts
Physical Review E—Statistical, Nonlinear, and Soft Matter Physics 73 (3 …, 2006
142006
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