|Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates|
SO Kim, HH Solak, MP Stoykovich, NJ Ferrier, JJ de Pablo, PF Nealey
Nature 424 (6947), 411-414, 2003
|A hemispherical electronic eye camera based on compressible silicon optoelectronics|
HC Ko, MP Stoykovich, J Song, V Malyarchuk, WM Choi, CJ Yu, ...
Nature 454 (7205), 748-753, 2008
|Directed assembly of block copolymer blends into nonregular device-oriented structures|
MP Stoykovich, M Müller, SO Kim, HH Solak, EW Edwards, JJ De Pablo, ...
Science 308 (5727), 1442-1446, 2005
|Optical systems fabricated by printing-based assembly|
J Rogers, R Nuzzo, M Meitl, E Menard, A Baca, M Motala, J Ahn, S Park, ...
US Patent 10,504,882, 2019
|Directed self-assembly of block copolymers for nanolithography: fabrication of isolated features and essential integrated circuit geometries|
MP Stoykovich, H Kang, KC Daoulas, G Liu, CC Liu, JJ de Pablo, ...
ACS Nano 1 (3), 168-175, 2007
|Block copolymers and conventional lithography|
MP Stoykovich, PF Nealey
materials today 9 (9), 20-29, 2006
|Stretchable and foldable electronic devices|
JA Rogers, Y Huang, HC Ko, M Stoykovich, WM Choi, J Song, JH Ahn, ...
US Patent 10,064,269, 2018
|Controlled buckling structures in semiconductor interconnects and nanomembranes for stretchable electronics|
JA Rogers, M Meitl, Y Sun, HC Ko, A Carlson, WM Choi, M Stoykovich, ...
US Patent 10,355,113, 2019
|Directed assembly of lamellae‐forming block copolymers by using chemically and topographically patterned substrates|
SM Park, MP Stoykovich, R Ruiz, Y Zhang, CT Black, PF Nealey
Advanced Materials 19 (4), 607-611, 2007
|Dimensions and shapes of block copolymer domains assembled on lithographically defined chemically patterned substrates|
EW Edwards, M Müller, MP Stoykovich, HH Solak, JJ de Pablo, PF Nealey
Macromolecules 40 (1), 90-96, 2007
|Curvilinear electronics formed using silicon membrane circuits and elastomeric transfer elements|
HC Ko, G Shin, S Wang, MP Stoykovich, JW Lee, DH Kim, JS Ha, ...
small 5 (23), 2703-2709, 2009
|Methods and compositions for forming aperiodic patterned copolymer films|
PF Nealey, SO Kim, EW Edwards, JJ de Pablo
US Patent 8,287,957, 2012
|Mechanism and kinetics of ordering in diblock copolymer thin films on chemically nanopatterned substrates|
EW Edwards, MP Stoykovich, M Müller, HH Solak, JJ De Pablo, ...
Journal of Polymer Science Part B: Polymer Physics 43 (23), 3444-3459, 2005
|Hierarchical assembly of nanoparticle superstructures from block copolymer-nanoparticle composites|
H Kang, FA Detcheverry, AN Mangham, MP Stoykovich, KC Daoulas, ...
Physical review letters 100 (14), 148303, 2008
|Mechanics of noncoplanar mesh design for stretchable electronic circuits|
J Song, Y Huang, J Xiao, S Wang, KC Hwang, HC Ko, DH Kim, ...
Journal of Applied Physics 105 (12), 123516, 2009
|Fabrication of complex three-dimensional nanostructures from self-assembling block copolymer materials on two-dimensional chemically patterned templates with mismatched symmetry|
KC Daoulas, M Müller, MP Stoykovich, SM Park, YJ Papakonstantopoulos, ...
Physical review letters 96 (3), 036104, 2006
|Solvent-dependent surface plasmon response and oxidation of copper nanocrystals|
KP Rice, EJ Walker Jr, MP Stoykovich, AE Saunders
The Journal of Physical Chemistry C 115 (5), 1793-1799, 2011
|Remediation of line edge roughness in chemical nanopatterns by the directed assembly of overlying block copolymer films|
MP Stoykovich, KC Daoulas, M Müller, H Kang, JJ de Pablo, PF Nealey
Macromolecules 43 (5), 2334-2342, 2010
|Long-range order and orientation of cylinder-forming block copolymers on chemically nanopatterned striped surfaces|
EW Edwards, MP Stoykovich, HH Solak, PF Nealey
Macromolecules 39 (10), 3598-3607, 2006
|Directed copolymer assembly on chemical substrate patterns: A phenomenological and single-chain-in-mean-field simulations study of the influence of roughness in the substrate …|
KC Daoulas, M Müller, MP Stoykovich, H Kang, JJ de Pablo, PF Nealey
Langmuir 24 (4), 1284-1295, 2008