Mark P Stoykovich
Mark P Stoykovich
Pritzker School of Molecular Engineering, University of Chicago
Verified email at uchicago.edu
Title
Cited by
Cited by
Year
Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates
SO Kim, HH Solak, MP Stoykovich, NJ Ferrier, JJ de Pablo, PF Nealey
Nature 424 (6947), 411-414, 2003
17772003
A hemispherical electronic eye camera based on compressible silicon optoelectronics
HC Ko, MP Stoykovich, J Song, V Malyarchuk, WM Choi, CJ Yu, ...
Nature 454 (7205), 748-753, 2008
11042008
Directed assembly of block copolymer blends into nonregular device-oriented structures
MP Stoykovich, M Müller, SO Kim, HH Solak, EW Edwards, JJ De Pablo, ...
Science 308 (5727), 1442-1446, 2005
10572005
Optical systems fabricated by printing-based assembly
J Rogers, R Nuzzo, M Meitl, E Menard, A Baca, M Motala, J Ahn, S Park, ...
US Patent 10,504,882, 2019
683*2019
Directed self-assembly of block copolymers for nanolithography: fabrication of isolated features and essential integrated circuit geometries
MP Stoykovich, H Kang, KC Daoulas, G Liu, CC Liu, JJ de Pablo, ...
ACS Nano 1 (3), 168-175, 2007
4782007
Block copolymers and conventional lithography
MP Stoykovich, PF Nealey
materials today 9 (9), 20-29, 2006
4222006
Stretchable and foldable electronic devices
JA Rogers, Y Huang, HC Ko, M Stoykovich, WM Choi, J Song, JH Ahn, ...
US Patent 10,064,269, 2018
312*2018
Controlled buckling structures in semiconductor interconnects and nanomembranes for stretchable electronics
JA Rogers, M Meitl, Y Sun, HC Ko, A Carlson, WM Choi, M Stoykovich, ...
US Patent 10,355,113, 2019
287*2019
Directed assembly of lamellae‐forming block copolymers by using chemically and topographically patterned substrates
SM Park, MP Stoykovich, R Ruiz, Y Zhang, CT Black, PF Nealey
Advanced Materials 19 (4), 607-611, 2007
2702007
Dimensions and shapes of block copolymer domains assembled on lithographically defined chemically patterned substrates
EW Edwards, M Müller, MP Stoykovich, HH Solak, JJ de Pablo, PF Nealey
Macromolecules 40 (1), 90-96, 2007
1672007
Curvilinear electronics formed using silicon membrane circuits and elastomeric transfer elements
HC Ko, G Shin, S Wang, MP Stoykovich, JW Lee, DH Kim, JS Ha, ...
small 5 (23), 2703-2709, 2009
1642009
Methods and compositions for forming aperiodic patterned copolymer films
PF Nealey, SO Kim, EW Edwards, JJ de Pablo
US Patent 8,287,957, 2012
1522012
Mechanism and kinetics of ordering in diblock copolymer thin films on chemically nanopatterned substrates
EW Edwards, MP Stoykovich, M Müller, HH Solak, JJ De Pablo, ...
Journal of Polymer Science Part B: Polymer Physics 43 (23), 3444-3459, 2005
1502005
Hierarchical assembly of nanoparticle superstructures from block copolymer-nanoparticle composites
H Kang, FA Detcheverry, AN Mangham, MP Stoykovich, KC Daoulas, ...
Physical review letters 100 (14), 148303, 2008
1382008
Mechanics of noncoplanar mesh design for stretchable electronic circuits
J Song, Y Huang, J Xiao, S Wang, KC Hwang, HC Ko, DH Kim, ...
Journal of Applied Physics 105 (12), 123516, 2009
1322009
Fabrication of complex three-dimensional nanostructures from self-assembling block copolymer materials on two-dimensional chemically patterned templates with mismatched symmetry
KC Daoulas, M Müller, MP Stoykovich, SM Park, YJ Papakonstantopoulos, ...
Physical review letters 96 (3), 036104, 2006
1272006
Solvent-dependent surface plasmon response and oxidation of copper nanocrystals
KP Rice, EJ Walker Jr, MP Stoykovich, AE Saunders
The Journal of Physical Chemistry C 115 (5), 1793-1799, 2011
1262011
Remediation of line edge roughness in chemical nanopatterns by the directed assembly of overlying block copolymer films
MP Stoykovich, KC Daoulas, M Müller, H Kang, JJ de Pablo, PF Nealey
Macromolecules 43 (5), 2334-2342, 2010
1092010
Long-range order and orientation of cylinder-forming block copolymers on chemically nanopatterned striped surfaces
EW Edwards, MP Stoykovich, HH Solak, PF Nealey
Macromolecules 39 (10), 3598-3607, 2006
922006
Directed copolymer assembly on chemical substrate patterns: A phenomenological and single-chain-in-mean-field simulations study of the influence of roughness in the substrate …
KC Daoulas, M Müller, MP Stoykovich, H Kang, JJ de Pablo, PF Nealey
Langmuir 24 (4), 1284-1295, 2008
812008
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Articles 1–20