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Keith T. Wong
Keith T. Wong
Process engineering manager, Applied Materials
Bestätigte E-Mail-Adresse bei amat.com
Titel
Zitiert von
Zitiert von
Jahr
What a difference a bond makes: the structural, chemical, and physical properties of methyl-terminated Si (111) surfaces
KT Wong, NS Lewis
Accounts of chemical research 47 (10), 3037-3044, 2014
1002014
Periodic trends in organic functionalization of group IV semiconductor surfaces
JS Kachian, KT Wong, SF Bent
Accounts of chemical research 43 (2), 346-355, 2010
1002010
Self-assembled monolayer blocking with intermittent air-water exposure
T Kaufman-Osborn, KT WONG
US Patent 10,192,752, 2019
542019
Modular device and method for moving fluids to and from a sample delivery element
J Ramunas, JG Santiago, HM Blau, KT Wong, V Shkolnikov, K Stahl, ...
US Patent App. 12/802,063, 2010
522010
Gas delivery system for high pressure processing chamber
AM Khan, Q Liang, S Malik, KT WONG, SD Nemani
US Patent 10,179,941, 2019
252019
Synthesis and characterization of atomically flat methyl-terminated Ge (111) surfaces
KT Wong, YG Kim, MP Soriaga, BS Brunschwig, NS Lewis
Journal of the American Chemical Society 137 (28), 9006-9014, 2015
232015
Reaction of Hydroquinone and p-Benzoquinone with the Ge(100)-2 × 1 Surface
B Shong, KT Wong, SF Bent
The Journal of Physical Chemistry C 116 (7), 4705-4713, 2012
232012
High pressure wafer processing systems and related methods
Q Liang, SD Nemani, AM Khan, VR Kasibhotla, S Malik, S Kang, KT Wong
US Patent 10,224,224, 2018
222018
High pressure treatment of silicon nitride film
KT Wong, S Kang, SD Nemani, EY Yieh
US Patent 10,847,360, 2020
212020
Single versus Dual Attachment in the Adsorption of Diisocyanates at the Ge (100)-2× 1 Surface
KT Wong, SN Chopra, SF Bent
The Journal of Physical Chemistry C 116 (23), 12670-12679, 2012
212012
Reaction of Phenyl Isocyanate and Phenyl Isothiocyanate with the Ge (100)-2× 1 Surface
PW Loscutoff, KT Wong, SF Bent
The Journal of Physical Chemistry C 114 (33), 14193-14201, 2010
212010
Methods for fabricating nanowire for semiconductor applications
KT WONG, S Sun, SS Kang, NS Kim, SD Nemani, EY Yieh
US Patent 10,269,571, 2019
202019
Selective oxidation for 3D device isolation
S Sun, KT Wong, K Leschkies, KIM Namsung, S Nemani
US Patent 10,790,183, 2020
172020
High pressure wafer processing systems and related methods
Q Liang, SD Nemani, AM Khan, VR Kasibhotla, S Malik, S Kang, KT Wong
US Patent 10,529,603, 2020
162020
Strong Carbon-Surface Dative Bond Formation by tert-Butyl Isocyanide on the Ge(100)-2 × 1 Surface
B Shong, KT Wong, SF Bent
Journal of the American Chemical Society 136 (16), 5848-5851, 2014
162014
Tungsten defluorination by high pressure treatment
KT Wong, TJ Kwon, S Kang, EY Yieh
US Patent 10,622,214, 2020
152020
Low interface trap density in scaled bilayer gate oxides on 2D materials via nanofog low temperature atomic layer deposition
I Kwak, M Kavrik, JH Park, L Grissom, B Fruhberger, KT Wong, S Kang, ...
Applied Surface Science 463, 758-766, 2019
152019
Adsorption of Structural and Stereoisomers of Cyclohexanediamine at the Ge (100)-2× 1 Surface: Geometric Effects in Adsorption on a Semiconductor Surface
KT Wong, SF Bent
The Journal of Physical Chemistry C 117 (37), 19063-19073, 2013
152013
Selective Pulsed Chemical Vapor Deposition of Water-Free TiO2/Al2O3 and HfO2/Al2O3 Nanolaminates on Si and SiO2 in Preference to SiCOH
J Huang, Y Cho, Z Zhang, A Jan, KT Wong, SD Nemani, E Yieh, ...
ACS Applied Materials & Interfaces, 2022
142022
Reaction of tert-butyl isocyanate and tert-butyl isothiocyanate at the Ge (100)− 2× 1 Surface
PW Loscutoff, KT Wong, SF Bent
Surface Science 604 (19-20), 1791-1799, 2010
132010
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