Chi-Chun Liu
Chi-Chun Liu
IBM Research
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Directed self-assembly of block copolymers for nanolithography: fabrication of isolated features and essential integrated circuit geometries
MP Stoykovich, H Kang, KC Daoulas, G Liu, CC Liu, JJ de Pablo, ...
Acs Nano 1 (3), 168-175, 2007
Chemical patterns for directed self-assembly of lamellae-forming block copolymers with density multiplication of features
CC Liu, A Ramírez-Hernández, E Han, GSW Craig, Y Tada, H Yoshida, ...
Macromolecules 46 (4), 1415-1424, 2013
Perpendicular orientation of domains in cylinder-forming block copolymer thick films by controlled interfacial interactions
E Han, KO Stuen, M Leolukman, CC Liu, PF Nealey, P Gopalan
Macromolecules 42 (13), 4896-4901, 2009
Fabrication of lithographically defined chemically patterned polymer brushes and mats
CC Liu, E Han, MS Onses, CJ Thode, S Ji, P Gopalan, PF Nealey
Macromolecules 44 (7), 1876-1885, 2011
One‐step direct‐patterning template utilizing self‐assembly of POSS‐containing block copolymers
T Hirai, M Leolukman, CC Liu, E Han, YJ Kim, Y Ishida, T Hayakawa, ...
Advanced Materials 21 (43), 4334-4338, 2009
Generalization of the use of random copolymers to control the wetting behavior of block copolymer films
S Ji, CC Liu, JG Son, K Gotrik, GSW Craig, P Gopalan, FJ Himpsel, ...
Macromolecules 41 (23), 9098-9103, 2008
Two-Dimensional Pattern Formation Using Graphoepitaxy of PS-b-PMMA Block Copolymers for Advanced FinFET Device and Circuit Fabrication
H Tsai, JW Pitera, H Miyazoe, S Bangsaruntip, SU Engelmann, CC Liu, ...
ACS nano 8 (5), 5227-5232, 2014
DSA grapho-epitaxy process with etch stop material
JA Abdallah, ME Colburn, SJ Holmes, D Kawamura, C Liu, ...
US Patent 8,859,433, 2014
Metal nanodot memory by self-assembled block copolymer lift-off
AJ Hong, CC Liu, Y Wang, J Kim, F Xiu, S Ji, J Zou, PF Nealey, KL Wang
Nano letters 10 (1), 224-229, 2010
Directed self-assembly of block copolymers on chemical patterns: A platform for nanofabrication
S Ji, L Wan, CC Liu, PF Nealey
Progress in Polymer Science 54, 76-127, 2016
Molecular transfer printing using block copolymers
S Ji, CC Liu, G Liu, PF Nealey
ACS nano 4 (2), 599-609, 2010
Domain Orientation and Grain Coarsening in Cylinder-Forming Poly(styrene-b-methyl methacrylate) Films
S Ji, CC Liu, W Liao, AL Fenske, GSW Craig, PF Nealey
Macromolecules 44 (11), 4291-4300, 2011
Integration of block copolymer directed assembly with 193 immersion lithography
CC Liu, PF Nealey, AK Raub, PJ Hakeem, SRJ Brueck, E Han, P Gopalan
Journal of Vacuum Science & Technology B, Nanotechnology and …, 2010
Graphoepitaxial assembly of symmetric block copolymers on weakly preferential substrates
E Han, H Kang, CC Liu, PF Nealey, P Gopalan
Advanced Materials 22 (38), 4325-4329, 2010
Plasma etch removal of poly (methyl methacrylate) in block copolymer lithography
YH Ting, SM Park, CC Liu, X Liu, FJ Himpsel, PF Nealey, AE Wendt
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2008
Towards an all-track 300 mm process for directed self-assembly
CC Liu, CJ Thode, PA Rincon Delgadillo, GSW Craig, PF Nealey, ...
Journal of Vacuum Science & Technology B, Nanotechnology and …, 2011
An adaptive finite volume method for incompressible heat flow problems in solidification
CW Lan, CC Liu, CM Hsu
Journal of Computational Physics 178 (2), 464-497, 2002
Pattern transfer using poly(styrene-block-methyl methacrylate) copolymer films and reactive ion etching
CC Liu, PF Nealey, YH Ting, AE Wendt
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2007
Orientation of block copolymer resists on interlayer dielectrics with tunable surface energy
HS Suh, H Kang, CC Liu, PF Nealey, K Char
Macromolecules 43 (1), 461-466, 2010
Surface roughening of polystyrene and poly (methyl methacrylate) in Ar/O2 plasma etching
YH Ting, CC Liu, SM Park, H Jiang, PF Nealey, AE Wendt
Polymers 2 (4), 649-663, 2010
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