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Halid Mulaosmanovic
Halid Mulaosmanovic
GlobalFoundries Inc.
Bestätigte E-Mail-Adresse bei polimi.it
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Zitiert von
Jahr
A FeFET based super-low-power ultra-fast embedded NVM technology for 22nm FDSOI and beyond
S Dünkel, M Trentzsch, R Richter, P Moll, C Fuchs, O Gehring, M Majer, ...
2017 IEEE International Electron Devices Meeting (IEDM), 19.7. 1-19.7. 4, 2017
4992017
A 28nm HKMG super low power embedded NVM technology based on ferroelectric FETs
M Trentzsch, S Flachowsky, R Richter, J Paul, B Reimer, D Utess, ...
2016 IEEE International Electron Devices Meeting (IEDM), 11.5. 1-11.5. 4, 2016
3922016
Switching Kinetics in Nanoscale Hafnium Oxide Based Ferroelectric Field-Effect Transistors
H Mulaosmanovic, J Ocker, S Mueller, U Schroeder, J Müller, ...
ACS Applied Materials & Interfaces 9 (4), 3792–3798, 2017
3122017
Next generation ferroelectric materials for semiconductor process integration and their applications
T Mikolajick, S Slesazeck, H Mulaosmanovic, MH Park, S Fichtner, ...
Journal of Applied Physics 129 (10), 2021
2882021
Novel ferroelectric FET based synapse for neuromorphic systems
H Mulaosmanovic, J Ocker, S Müller, M Noack, J Müller, P Polakowski, ...
2017 Symposium on VLSI Technology, T176-T177, 2017
2572017
Ferroelectric field-effect transistors based on HfO2: a review
H Mulaosmanovic, ET Breyer, S Dünkel, S Beyer, T Mikolajick, ...
Nanotechnology 32 (50), 502002, 2021
2162021
Mimicking biological neurons with a nanoscale ferroelectric transistor
H Mulaosmanovic, E Chicca, M Bertele, T Mikolajick, S Slesazeck
Nanoscale 10 (46), 21755-21763, 2018
2072018
Ferroelectric FETs With 20-nm-Thick HfO2 Layer for Large Memory Window and High Performance
H Mulaosmanovic, ET Breyer, T Mikolajick, S Slesazeck
IEEE Transactions on Electron Devices 66 (9), 3828-3833, 2019
1512019
Evidence of single domain switching in hafnium oxide based FeFETs: Enabler for multi-level FeFET memory cells
H Mulaosmanovic, S Slesazeck, J Ocker, M Pesic, S Muller, S Flachowsky, ...
2015 IEEE International Electron Devices Meeting (IEDM), 26.8. 1-26.8. 3, 2015
1482015
Ferroelectricity in doped hafnium oxide: materials, properties and devices
U Schroeder, CS Hwang, H Funakubo
Woodhead Publishing, 2019
1422019
FeFET: A versatile CMOS compatible device with game-changing potential
S Beyer, S Dünkel, M Trentzsch, J Müller, A Hellmich, D Utess, J Paul, ...
2020 IEEE International Memory Workshop (IMW), 1-4, 2020
1382020
Domain pinning: Comparison of hafnia and PZT based ferroelectrics
FPG Fengler, M Pešić, S Starschich, T Schneller, C Künneth, U Böttger, ...
Advanced Electronic Materials 3 (4), 1600505, 2017
1292017
Hafnia-based double-layer ferroelectric tunnel junctions as artificial synapses for neuromorphic computing
B Max, M Hoffmann, H Mulaosmanovic, S Slesazeck, T Mikolajick
ACS Applied Electronic Materials 2 (12), 4023-4033, 2020
1272020
Multilevel ferroelectric memory cell for an integrated circuit
S Slesazeck, H Mulaosmanovic
US Patent 9,830,969, 2017
1092017
Accumulative polarization reversal in nanoscale ferroelectric transistors
H Mulaosmanovic, T Mikolajick, S Slesazeck
ACS applied materials & interfaces 10 (28), 23997-24002, 2018
1012018
High endurance strategies for hafnium oxide based ferroelectric field effect transistor
J Muller, P Polakowski, S Muller, H Mulaosmanovic, J Ocker, T Mikolajick, ...
2016 16th non-volatile memory technology symposium (NVMTS), 1-7, 2016
982016
Reconfigurable NAND/NOR logic gates in 28 nm HKMG and 22 nm FD-SOI FeFET technology
ET Breyer, H Mulaosmanovic, T Mikolajick, S Slesazeck
2017 IEEE International Electron Devices Meeting (IEDM), 28.5. 1-28.5. 4, 2017
912017
Computing with ferroelectric FETs: Devices, models, systems, and applications
A Aziz, ET Breyer, A Chen, X Chen, S Datta, SK Gupta, M Hoffmann, ...
2018 Design, Automation & Test in Europe Conference & Exhibition (DATE …, 2018
882018
Ferroelectric-gate field effect transistor memories
H Ishiwara, M Okuyama, S Sakai, SM Yoon
Springer 131, 141-155, 2016
842016
Random number generation based on ferroelectric switching
H Mulaosmanovic, T Mikolajick, S Slesazeck
IEEE Electron Device Letters 39 (1), 135-138, 2017
822017
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