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Kenneth A. Goldberg
Kenneth A. Goldberg
Optical Physicist, Advanced Light Source, Lawrence Berkeley National Laboratory
Verified email at lbl.gov - Homepage
Title
Cited by
Cited by
Year
Phase-shifting point diffraction interferometer
H Medecki, E Tejnil, KA Goldberg, J Bokor
Optics letters 21 (19), 1526-1528, 1996
2151996
Fourier-transform method of phase-shift determination
KA Goldberg, J Bokor
Applied optics 40 (17), 2886-2894, 2001
1602001
Extreme-ultraviolet phase-shifting point-diffraction interferometer: a wave-front metrology tool with subangstrom reference-wave accuracy
PP Naulleau, KA Goldberg, SH Lee, C Chang, D Attwood, J Bokor
Applied Optics 38 (35), 7252-7263, 1999
1441999
Hartmann wave-front measurement at 13.4 nm with λEUV/120 accuracy
P Mercère, P Zeitoun, M Idir, S Le Pape, D Douillet, X Levecq, G Dovillaire, ...
Optics letters 28 (17), 1534-1536, 2003
1282003
Status of EUV micro-exposure capabilities at the ALS using the 0.3-NA MET optic
P Naulleau, KA Goldberg, EH Anderson, K Bradley, R Delano, P Denham, ...
Emerging Lithographic Technologies VIII 5374, 881-891, 2004
1122004
Extreme ultraviolet carrier-frequency shearing interferometry of a lithographic four-mirror optical system
PP Naulleau, KA Goldberg, J Bokor
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2000
942000
Critical challenges for EUV resist materials
PP Naulleau, CN Anderson, LM Baclea-An, P Denham, S George, ...
Advances in Resist Materials and Processing Technology XXVIII 7972, 17-26, 2011
902011
Fourier-synthesis custom-coherence illuminator for extreme ultraviolet microfield lithography
PP Naulleau, KA Goldberg, P Batson, J Bokor, P Denham, S Rekawa
Applied Optics 42 (5), 820-826, 2003
892003
System integration and performance of the EUV engineering test stand
DA Tichenor, AK Ray-Chaudhuri, WC Replogle, RH Stulen, GD Kubiak, ...
Emerging Lithographic Technologies V 4343, 19-37, 2001
802001
EUV engineering test stand
DA Tichenor, GD Kubiak, WC Replogle, LE Klebanoff, JB Wronosky, ...
Emerging Lithographic Technologies IV 3997, 48-69, 2000
782000
Modal wavefront reconstruction from its gradient
I Mochi, KA Goldberg
Applied Optics 54 (12), 3780-3785, 2015
752015
At-wavelength interferometry for extreme ultraviolet lithography
E Tejnil, KA Goldberg, SH Lee, H Medecki, PJ Batson, PE Denham, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1997
751997
Tunable coherent radiation in the soft X-ray and extreme ultraviolet spectral regions
DT Attwood, P Naulleau, KA Goldberg, E Tejnil, C Chang, R Beguiristain, ...
IEEE Journal of Quantum Electronics 35 (5), 709-720, 1999
741999
Microscopy of extreme ultraviolet lithography masks with 13.2 nm tabletop laser illumination
F Brizuela, Y Wang, CA Brewer, F Pedaci, W Chao, EH Anderson, Y Liu, ...
Optics letters 34 (3), 271-273, 2009
732009
Actinic inspection of extreme ultraviolet programed multilayer defects and cross-comparison measurements
KA Goldberg, A Barty, Y Liu, P Kearney, Y Tezuka, T Terasawa, JS Taylor, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2006
642006
Sub-70 nm extreme ultraviolet lithography at the advanced light source static microfield exposure station using the engineering test stand set-2 optic
P Naulleau, KA Goldberg, EH Anderson, D Attwood, P Batson, J Bokor, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2002
642002
Extreme ultraviolet microexposures at the Advanced Light Source using the 0.3 numerical aperture micro-exposure tool optic
PP Naulleau, KA Goldberg, E Anderson, JP Cain, P Denham, K Jackson, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004
632004
At-wavelength alignment and testing of the 0.3 NA MET optic
KA Goldberg, PP Naulleau, PE Denham, SB Rekawa, K Jackson, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004
602004
Dual-domain point diffraction interferometer
PP Naulleau, KA Goldberg
Applied optics 38 (16), 3523-3533, 1999
581999
Characterization of the accuracy of EUV phase-shifting point diffraction interferometry
PP Naulleau, KA Goldberg, SH Lee, CHC Chang, CJ Bresloff, PJ Batson, ...
Emerging Lithographic Technologies II 3331, 114-123, 1998
581998
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