| Double pattern EDA solutions for 32nm HP and beyond GE Bailey, A Tritchkov, JW Park, L Hong, V Wiaux, E Hendrickx, ... Design for Manufacturability through Design-Process Integration 6521, 476-487, 2007 | 93 | 2007 |
| Intensive optimization of masks and sources for 22nm lithography AE Rosenbluth, DO Melville, K Tian, S Bagheri, J Tirapu-Azpiroz, K Lai, ... Optical Microlithography XXII 7274, 67-81, 2009 | 66 | 2009 |
| Dual-mask model-based proximity correction for high-performance 0.10-um CMOS process SR Palmer, ME Mason, JN Randall, T Aton, K Kim, AV Tritchkov, J Burdorf, ... 20th Annual BACUS Symposium on Photomask Technology 4186, 921-932, 2001 | 56 | 2001 |
| Characterization and correction of optical proximity effects in deep‐ultraviolet lithography using behavior modeling A Yen, A Tritchkov, JP Stirniman, G Vandenberghe, R Jonckheere, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1996 | 52 | 1996 |
| Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations D Melville, AE Rosenbluth, K Tian, K Lai, S Bagheri, J Tirapu-Azpiroz, ... Optical Microlithography XXIII 7640, 51-68, 2010 | 34 | 2010 |
| IC layout parsing for multiple masks A Tritchkov, EY Sahouria, L Hong US Patent 8,713,483, 2014 | 30 | 2014 |
| Lithography simulation with aerial image—variable threshold resist model J Randall, H Gangala, A Tritchkov Microelectronic engineering 46 (1-4), 59-63, 1999 | 28 | 1999 |
| Model-based SRAF insertion through pixel-based mask optimization at 32nm and beyond K Sakajiri, A Tritchkov, Y Granik Photomask and Next-Generation Lithography Mask Technology XV 7028, 325-336, 2008 | 25 | 2008 |
| Lithography enabling for the 65 nm node gate layer patterning with alternating PSM A Tritchkov, S Jeong, C Kenyon Optical Microlithography XVIII 5754, 215-225, 2005 | 24 | 2005 |
| Optical proximity effects and correction strategies for chemical-amplified DUV resists MO de Beeck, B Bruggeman, H Botermans, V Van Driessche, A Yen, ... Optical Microlithography IX 2726, 622-633, 1996 | 22 | 1996 |
| Hyper-NA imaging of 45nm node random CH layouts using inverse lithography E Hendrickx, A Tritchkov, K Sakajiri, Y Granik, M Kempsell, ... Optical Microlithography XXI 6924, 196-205, 2008 | 20 | 2008 |
| Computational lithography: exhausting the resolution limits of 193-nm projection lithography systems DOS Melville, AE Rosenbluth, A Waechter, M Millstone, J Tirapu-Azpiroz, ... Journal of Vacuum Science & Technology B 29 (6), 2011 | 19 | 2011 |
| Inverse lithography for 45-nm-node contact holes at 1.35 numerical aperture ML Kempsell, E Hendrickx, A Tritchkov, K Sakajiri, K Yasui, S Yoshitake, ... Journal of Micro/Nanolithography, MEMS and MOEMS 8 (4), 043001-043001-9, 2009 | 19 | 2009 |
| Optically induced mask critical dimension error magnification in 248 nm lithography JN Randall, A Tritchkov Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1998 | 18 | 1998 |
| Reduction of mask-induced CD errors by optical proximity correction J Randall, AV Tritchkov, RM Jonckheere, P Jaenen, KG Ronse Optical Microlithography XI 3334, 124-130, 1998 | 18 | 1998 |
| Electron beam/DUV intra-level mix-and-match lithography for random logic 0.25 μm CMOS R Jonckheere, A Tritchkov, V Van Driessche Microelectronic engineering 27 (1-4), 231-234, 1995 | 18 | 1995 |
| Lithographic benefits and mask manufacturability study of curvilinear masks VW Guo, F Jiang, J Rankin, I Bork, A Tritchkov, A Wei, Y Sun, S Jayaram, ... Photomask Technology 2018 10810, 106-118, 2018 | 16 | 2018 |
| Directed self-assembly (DSA) grapho-epitaxy template generation with immersion lithography Y Ma, J Lei, JA Torres, L Hong, J Word, G Fenger, A Tritchkov, ... Alternative Lithographic Technologies VII 9423, 23-33, 2015 | 14 | 2015 |
| Double-patterning decomposition, design compliance, and verification algorithms at 32nm HP A Tritchkov, P Glotov, S Komirenko, E Sahouria, A Torres, A Seoud, ... Photomask Technology 2008 7122, 251-265, 2008 | 14 | 2008 |
| Study on various curvilinear data representations and their impact on mask and wafer manufacturing J Choi, S Ryu, S Lee, M Kim, JS Park, P Buck, I Bork, B Durvasula, ... Journal of Micro/Nanopatterning, Materials, and Metrology 20 (4), 041403-041403, 2021 | 13 | 2021 |
