| Source optimization for image fidelity and throughput Y Granik Journal of Micro/Nanolithography, MEMS and MOEMS 3 (4), 509-522, 2004 | 156 | 2004 |
| Fast pixel-based mask optimization for inverse lithography Y Granik Journal of Micro/Nanolithography, MEMS and MOEMS 5 (4), 043002-043002-13, 2006 | 153 | 2006 |
| Solving inverse problems of optical microlithography Y Granik Optical Microlithography XVIII 5754, 506-526, 2005 | 124 | 2005 |
| Model-based OPC using the MEEF matrix NB Cobb, Y Granik 22nd Annual BACUS Symposium on Photomask Technology 4889, 1281-1292, 2002 | 113 | 2002 |
| Correction for etch proximity: new models and applications Y Granik Optical Microlithography XIV 4346, 98-112, 2001 | 113 | 2001 |
| Contrast based resolution enhancing technology JAT Robles, Y Granik US Patent 7,013,439, 2006 | 102 | 2006 |
| MEEF as a matrix Y Granik, NB Cobb 21st Annual BACUS Symposium on Photomask Technology 4562, 980-991, 2002 | 92 | 2002 |
| New process models for OPC at sub-90-nm nodes Y Granik, NB Cobb Optical Microlithography XVI 5040, 1166-1175, 2003 | 89 | 2003 |
| Universal process modeling with VTRE for OPC Y Granik, NB Cobb, T Do Optical Microlithography XV 4691, 377-394, 2002 | 87 | 2002 |
| Matrix optical process correction Y Granik, N Cobb US Patent 6,928,634, 2005 | 86 | 2005 |
| Contrast based resolution enhancement for photolithographic processing JAT Robles, Y Granik US Patent 7,293,249, 2007 | 85 | 2007 |
| Improved modeling performance with an adapted vectorial formulation of the Hopkins imaging equation K Adam, Y Granik, A Torres, NB Cobb Optical Microlithography XVI 5040, 78-91, 2003 | 72 | 2003 |
| Calculation system for inverse masks Y Granik, K Sakajiri US Patent 7,552,416, 2009 | 70 | 2009 |
| Intensive optimization of masks and sources for 22nm lithography AE Rosenbluth, DO Melville, K Tian, S Bagheri, J Tirapu-Azpiroz, K Lai, ... Optical Microlithography XXII 7274, 67-81, 2009 | 66 | 2009 |
| Integrated device structure prediction based on model curvature Y Granik, NB Cobb, FM Schellenberg US Patent 6,643,616, 2003 | 66 | 2003 |
| Using OPC to optimize for image slope and improve process window NB Cobb, Y Granik Photomask and Next-Generation Lithography Mask Technology X 5130, 838-846, 2003 | 65 | 2003 |
| Matrix optical process correction Y Granik, NB Cobb US Patent 7,237,221, 2007 | 61 | 2007 |
| CD variation analysis technique and its application to the study of PSM mask misalignment Y Granik, NB Cobb, EY Sahouria 20th Annual BACUS Symposium on Photomask Technology 4186, 853-861, 2001 | 61 | 2001 |
| Subresolution process windows and yield estimation technique based on detailed full-chip CD simulation Y Granik, NB Cobb, EY Sahouria, O Toublan, L Capodieci, RJ Socha Process Control and Diagnostics 4182, 335-341, 2000 | 61 | 2000 |
| Challenges and opportunities in applying grapho-epitaxy DSA lithography to metal cut and contact/via applications Y Ma, JA Torres, G Fenger, Y Granik, J Ryckaert, G Vanderberghe, ... 30th European Mask and Lithography Conference 9231, 222-231, 2014 | 57 | 2014 |
