| Charge ordering in studied by resonant soft x-ray diffraction J Fink, E Schierle, E Weschke, J Geck, D Hawthorn, V Soltwisch, H Wadati, ... Physical Review B 79 (10), 100502, 2009 | 154 | 2009 |
| Phase diagram of charge order in La 1. 8− x Eu 0. 2 Sr x CuO 4 from resonant soft x-ray diffraction J Fink, V Soltwisch, J Geck, E Schierle, E Weschke, B Büchner Physical Review B 83 (9), 092503, 2011 | 152 | 2011 |
| Benchmarking five global optimization approaches for nano-optical shape optimization and parameter reconstruction PI Schneider, X Garcia Santiago, V Soltwisch, M Hammerschmidt, ... ACS Photonics 6 (11), 2726-2733, 2019 | 106 | 2019 |
| Comparison of stripe modulations in La 1.875 Ba 0.125 CuO 4 and La 1.48 Nd 0.4 Sr 0.12 CuO 4 SB Wilkins, MPM Dean, J Fink, M Hücker, J Geck, V Soltwisch, E Schierle, ... Physical Review B 84 (19), 195101, 2011 | 89 | 2011 |
| Cycloidal Order of 4 f Moments as a Probe of Chiral Domains in DyMnO 3 E Schierle, V Soltwisch, D Schmitz, R Feyerherm, A Maljuk, F Yokaichiya, ... Physical review letters 105 (16), 167207, 2010 | 75 | 2010 |
| Multiparameter characterization of subnanometre Cr/Sc multilayers based on complementary measurements A Haase, S Bajt, P Hönicke, V Soltwisch, F Scholze Journal of applied crystallography 49 (6), 2161-2171, 2016 | 40 | 2016 |
| Element sensitive reconstruction of nanostructured surfaces with finite elements and grazing incidence soft X-ray fluorescence V Soltwisch, P Hönicke, Y Kayser, J Eilbracht, J Probst, F Scholze, ... Nanoscale 10 (13), 6177-6185, 2018 | 38 | 2018 |
| Alternative materials for high numerical aperture extreme ultraviolet lithography mask stacks O Wood II, S Raghunathan, P Mangat, V Philipsen, V Luong, P Kearney, ... Extreme Ultraviolet (EUV) Lithography VI 9422, 122-133, 2015 | 37 | 2015 |
| Grazing-incidence small-angle X-ray scattering (GISAXS) on small periodic targets using large beams M Pflüger, V Soltwisch, J Probst, F Scholze, M Krumrey IUCrJ 4 (4), 431-438, 2017 | 36 | 2017 |
| Reconstructing detailed line profiles of lamellar gratings from GISAXS patterns with a Maxwell solver V Soltwisch, A Fernández Herrero, M Pflüger, A Haase, J Probst, C Laubis, ... Journal of Applied Crystallography 50 (5), 1524-1532, 2017 | 35 | 2017 |
| Imaging impact of multilayer tuning in EUV masks, experimental validation V Philipsen, E Hendrickx, E Verduijn, S Raghunathan, O Wood II, ... Photomask Technology 2014 9235, 115-127, 2014 | 29 | 2014 |
| Ultrafast dynamics of antiferromagnetic order studied by femtosecond resonant soft x-ray diffraction K Holldack, N Pontius, E Schierle, T Kachel, V Soltwisch, R Mitzner, ... Applied Physics Letters 97 (6), 2010 | 28 | 2010 |
| Status of EUV reflectometry at PTB C Laubis, A Barboutis, M Biel, C Buchholz, B Dubrau, A Fischer, A Hesse, ... Extreme Ultraviolet (EUV) Lithography IV 8679, 582-593, 2013 | 26 | 2013 |
| Applicability of the Debye-Waller damping factor for the determination of the line-edge roughness of lamellar gratings AF Herrero, M Pflüger, J Probst, F Scholze, V Soltwisch Optics Express 27 (22), 32490-32507, 2019 | 25 | 2019 |
| Mask absorber development to enable next-generation EUVL V Philipsen, KV Luong, K Opsomer, L Souriau, J Rip, C Detavernier, ... Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation …, 2019 | 23 | 2019 |
| Correlated diffuse x-ray scattering from periodically nanostructured surfaces V Soltwisch, A Haase, J Wernecke, J Probst, M Schoengen, S Burger, ... Physical Review B 94 (3), 035419, 2016 | 23 | 2016 |
| Determination of optical constants of thin films in the EUV R Ciesielski, Q Saadeh, V Philipsen, K Opsomer, JP Soulié, M Wu, ... Applied Optics 61 (8), 2060-2078, 2022 | 22 | 2022 |
| Shape-and element-sensitive reconstruction of periodic nanostructures with grazing incidence x-ray fluorescence analysis and machine learning A Andrle, P Hönicke, G Gwalt, PI Schneider, Y Kayser, F Siewert, ... Nanomaterials 11 (7), 1647, 2021 | 19 | 2021 |
| Study of novel EUVL mask absorber candidates M Wu, D Thakare, JF De Marneffe, P Jaenen, L Souriau, K Opsomer, ... Journal of Micro/Nanopatterning, Materials, and Metrology 20 (2), 021002-021002, 2021 | 19 | 2021 |
| Interface morphology of Mo/Si multilayer systems with varying Mo layer thickness studied by EUV diffuse scattering A Haase, V Soltwisch, S Braun, C Laubis, F Scholze Optics Express 25 (13), 15441-15455, 2017 | 19 | 2017 |
Frank ScholzeFachbereichsleiter Radiometrie mit Synchrotronstrahlung, Physikalisch-Technische BundesanstaltVerified email at ptb.de
