| Atomic layer etching at the tipping point: an overview GS Oehrlein, D Metzler, C Li ECS Journal of Solid State Science and Technology 4 (6), N5041, 2015 | 274 | 2015 |
| Fluorocarbon assisted atomic layer etching of SiO2 and Si using cyclic Ar/C4F8 and Ar/CHF3 plasma D Metzler, C Li, S Engelmann, RL Bruce, EA Joseph, GS Oehrlein Journal of Vacuum Science & Technology A 34 (1), 2016 | 111 | 2016 |
| Fluorocarbon based atomic layer etching of Si3N4 and etching selectivity of SiO2 over Si3N4 C Li, D Metzler, CS Lai, EA Hudson, GS Oehrlein Journal of Vacuum Science & Technology A 34 (4), 2016 | 99 | 2016 |
| Achieving ultrahigh etching selectivity of SiO2 over Si3N4 and Si in atomic layer etching by exploiting chemistry of complex hydrofluorocarbon precursors KY Lin, C Li, S Engelmann, RL Bruce, EA Joseph, D Metzler, GS Oehrlein Journal of Vacuum Science & Technology A 36 (4), 2018 | 53 | 2018 |
| Characterizing fluorocarbon assisted atomic layer etching of Si using cyclic Ar/C4F8 and Ar/CHF3 plasma D Metzler, C Li, S Engelmann, RL Bruce, EA Joseph, GS Oehrlein The Journal of chemical physics 146 (5), 2017 | 49 | 2017 |
| Investigation of thin oxide layer removal from Si substrates using an SiO2 atomic layer etching approach: the importance of the reactivity of the substrate D Metzler, C Li, CS Lai, EA Hudson, GS Oehrlein Journal of Physics D: Applied Physics 50 (25), 254006, 2017 | 34 | 2017 |
| Effect of the chamber wall on fluorocarbon-assisted atomic layer etching of SiO2 using cyclic Ar/C4F8 plasma M Kawakami, D Metzler, C Li, GS Oehrlein Journal of Vacuum Science & Technology A 34 (4), 2016 | 31 | 2016 |
| Selective atomic layer etching of HfO2 over silicon by precursor and substrate-dependent selective deposition KY Lin, C Li, S Engelmann, RL Bruce, EA Joseph, D Metzler, GS Oehrlein Journal of Vacuum Science & Technology A 38 (3), 2020 | 20 | 2020 |
| Impact of hydrofluorocarbon molecular structure parameters on plasma etching of ultra-low-K dielectric C Li, R Gupta, V Pallem, GS Oehrlein Journal of Vacuum Science & Technology A 34 (3), 2016 | 19 | 2016 |
| Electron beam injection from a hollow cathode plasma into a downstream reactive environment: Characterization of secondary plasma production and Si3N4 and Si etching C Li, V Godyak, T Hofmann, K Edinger, GS Oehrlein Journal of Vacuum Science & Technology A 38 (3), 2020 | 10 | 2020 |
| Etching of Si3N4 induced by electron beam plasma from hollow cathode plasma in a downstream reactive environment C Li, T Hofmann, K Edinger, V Godyak, GS Oehrlein Journal of Vacuum Science & Technology B 38 (3), 2020 | 6 | 2020 |
| Application of cyclic fluorocarbon/argon discharges to device patterning D Metzler, K Uppireddi, RL Bruce, H Miyazoe, Y Zhu, W Price, ES Sikorski, ... Journal of Vacuum Science & Technology A 34 (1), 2016 | 6 | 2016 |
| Effect of nonvertical ion bombardment due to edge effects on polymer surface morphology evolution and etching uniformity A Pranda, C Li, Y Seo, GS Oehrlein Journal of Vacuum Science & Technology A 39 (4), 2021 | 1 | 2021 |
| Leveraging precursor molecular composition and structure for atomic layer etching GS Oehrlein, KY Lin, C Li US Patent 11,171,013, 2021 | | 2021 |
| Achieving etching selectivity for atomic layer etching processes by utilizing material-selective deposition phenomena GS Oehrlein, KY Lin, C Li US Patent 10,790,157, 2020 | | 2020 |
| Ultra-high Si3N4 to SiO2 Selective Etching by Fluorocarbon Based Remote Plasma C Li, T Hofmann, K Edinger, GS Oehrlein AVS 64th International Symposium & Exhibition, 2017 | | 2017 |
| Plasma-Based Removal of Native Oxide Layers on Si and SiGe Substrates While Minimizing Surface Residues C Li, D Metzler, CS Lai, EA Hudson, GS Oehrlein AVS 63rd International Symposium & Exhibition, 2016 | | 2016 |
| Fluorocarbon Based Atomic Layer Etching of Si3N4 and Selectivity of SiO2 over Si3N4 C Li, D Metzler, CS Lai, EA Hudson, GS Oehrlein, M Danek, A Dulkin AVS 62nd International Symposium & Exhibition, 2015 | | 2015 |
| Study of Hydrofluorocarbon Precursor Parameters for Plasma Etching of ULK Dielectric C Li, R Gupta, V Pallem, GS Oehrlein AVS 61st International Symposium & Exhibition, 2014 | | 2014 |
GS OehrleinUniversity of MarylandVerified email at umd.edu
