| Aligning the band gap of graphene nanoribbons by monomer doping C Bronner, S Stremlau, M Gille, F Brauße, A Haase, S Hecht, P Tegeder Angewandte Chemie International Edition 52 (16), 4422-4425, 2013 | 289 | 2013 |
| Multiparameter characterization of subnanometre Cr/Sc multilayers based on complementary measurements A Haase, S Bajt, P Hönicke, V Soltwisch, F Scholze Journal of applied crystallography 49 (6), 2161-2171, 2016 | 40 | 2016 |
| Reconstructing detailed line profiles of lamellar gratings from GISAXS patterns with a Maxwell solver V Soltwisch, A Fernández Herrero, M Pflüger, A Haase, J Probst, C Laubis, ... Journal of Applied Crystallography 50 (5), 1524-1532, 2017 | 35 | 2017 |
| Electronic structure changes during the surface-assisted formation of a graphene nanoribbon C Bronner, M Utecht, A Haase, P Saalfrank, T Klamroth, P Tegeder The Journal of chemical physics 140 (2), 2014 | 25 | 2014 |
| Correlated diffuse x-ray scattering from periodically nanostructured surfaces V Soltwisch, A Haase, J Wernecke, J Probst, M Schoengen, S Burger, ... Physical Review B 94 (3), 035419, 2016 | 23 | 2016 |
| Interface morphology of Mo/Si multilayer systems with varying Mo layer thickness studied by EUV diffuse scattering A Haase, V Soltwisch, S Braun, C Laubis, F Scholze Optics Express 25 (13), 15441-15455, 2017 | 19 | 2017 |
| Nanometrology on gratings with GISAXS: FEM reconstruction and fourier analysis V Soltwisch, J Wernecke, A Haase, J Probst, M Schoengen, M Krumrey, ... Metrology, Inspection, and Process Control for Microlithography XXVIII 9050 …, 2014 | 19 | 2014 |
| Extended asymmetric-cut multilayer X-ray gratings M Prasciolu, A Haase, F Scholze, HN Chapman, S Bajt Optics express 23 (12), 15195-15204, 2015 | 12 | 2015 |
| Update on EUV radiometry at PTB C Laubis, A Barboutis, C Buchholz, A Fischer, A Haase, F Knorr, ... Extreme Ultraviolet (EUV) Lithography VII 9776, 632-639, 2016 | 11 | 2016 |
| Determination of line profiles on photomasks using DUV, EUV, and x-ray scattering F Scholze, B Bodermann, S Burger, J Endres, A Haase, M Krumrey, ... 30th European Mask and Lithography Conference 9231, 161-171, 2014 | 10 | 2014 |
| Determination of line profiles on nano-structured surfaces using EUV and x-ray scattering V Soltwisch, J Wernecke, A Haase, J Probst, M Schoengen, M Krumrey, ... Photomask Technology 2014 9235, 322-330, 2014 | 10 | 2014 |
| PTB-Mitteilungen 124 F Scholze, A Haase, M Krumrey, V Soltwisch, J Wernecke Heft 4 (8), 2014 | 7 | 2014 |
| Characterization of Mo/Si mirror interface roughness for different Mo layer thickness using resonant diffuse EUV scattering A Haase, V Soltwisch, F Scholze, S Braun Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V …, 2015 | 6 | 2015 |
| Multimethod metrology of multilayer mirrors using EUV and X-Ray radiation A Haase PQDT-Global, 2017 | 5 | 2017 |
| Role of dynamic effects in the characterization of multilayers by means of power spectral density A Haase, V Soltwisch, C Laubis, F Scholze Applied Optics 53 (14), 3019-3027, 2014 | 5 | 2014 |
| Investigating surface structures by EUV scattering V Soltwisch, C Laubis, AF Herrero, M Pflüger, A Haase, F Scholze Extreme Ultraviolet (EUV) Lithography VIII 10143, 142-152, 2017 | 4 | 2017 |
| Ar beam induced desorption from different materials at TSL OB Malyshev, B Zajec, A Haase, L Westerberg, M Leandersson, ... Vacuum 85 (2), 338-343, 2010 | 3 | 2010 |
| Characterization of optical material parameters for EUV Lithography applications at PTB C Laubis, A Haase, V Soltwisch, F Scholze 31st European Mask and Lithography Conference 9661, 215-221, 2015 | 1 | 2015 |
| Monomer Doping of Self-Assembled Graphene Nanoribbons for Band Gap Alignment C Bronner, S Stremlau, M Gille, F Brauße, A Haase, S Hecht, P Tegeder APS March Meeting Abstracts 2014, F30. 010, 2014 | | 2014 |
| Investigation of Nanostructured Surfaces by Scattering Procedures F Scholze, A Haase, M Krumrey, V Soltwisch, J Wernecke mitteilungen S, 48, 0 | | |
Christopher BronnerUniversity of California, BerkeleyVerified email at berkeley.edu
