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Shweta Tomer
Shweta Tomer
CSIR National Physical Laboratory
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Year
Silicon Surface Passivation by Atomic Layer Deposited Hafnium Oxide Films: Trap States Investigation Using Constant Voltage Stress Studies
S Tomer, M Devi, A Kumar, S Laxmi, CMS Rauthan, V Vandana
IEEE Journal of Photovoltaics 10 (6), 1614-1623, 2020
132020
Importance of precursor delivery mechanism for Tetra-kis-ethylmethylaminohafnium/water atomic layer deposition process
S Tomer, J Panigrahi, R Srivastava, CMS Rauthan
Thin Solid Films 692, 137629, 2019
102019
Heterostructure nanoarchitectonics with ZnO/SnO2 for ultrafast and selective detection of CO gas at low ppm levels
AK Mauraya, D Mahana, G Jhaa, BK Pradhan, S Tomer, P Singh, ...
Ceramics International 48 (24), 36556-36569, 2022
62022
A novel analytical method for determination of diode parameters from the dark forward IV characteristics of a silicon solar cell
A Kumar, SN Singh, Jyoti, S Tomer, Vandana, SK Srivastava, M Dutta, ...
Physica Scripta, 2023
22023
ALD deposited bipolar HfOx films for silicon surface passivation
S Tomer, A Kumar, M Devi
Surfaces and Interfaces, 103208, 2023
22023
Effect of ALD window on thermal ALD deposited HfOx/Si interface for silicon surface passivation
S Tomer, J Panigrahi, P Pathi, G Gupta
Materials Today: Proceedings 46, 5761-5765, 2021
22021
High-Quality Silicon Surface Passivation by Thermal-ALD Deposited Hafnium Oxide Films
S Tomer, M Devi, A Kumar, S Laxmi, S Satapathy, KK Maurya, P Singh, ...
IEEE Journal of Photovoltaics, 2023
12023
XPS and spectroscopic ellipsometry studies of HfO2/Si interface
S Tomer, R Singh, J Panigrahi, L Subha, CMS Rauthan
Proceedings of the seventeenth international conference on thin films: abstracts, 2017
2017
Thermal ALD deposited hafnium oxide thin films for silicon surface passivation
S Tomer
Ghaziabad, 0
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