Silicon Surface Passivation by Atomic Layer Deposited Hafnium Oxide Films: Trap States Investigation Using Constant Voltage Stress Studies S Tomer, M Devi, A Kumar, S Laxmi, CMS Rauthan, V Vandana IEEE Journal of Photovoltaics 10 (6), 1614-1623, 2020 | 13 | 2020 |
Importance of precursor delivery mechanism for Tetra-kis-ethylmethylaminohafnium/water atomic layer deposition process S Tomer, J Panigrahi, R Srivastava, CMS Rauthan Thin Solid Films 692, 137629, 2019 | 10 | 2019 |
Heterostructure nanoarchitectonics with ZnO/SnO2 for ultrafast and selective detection of CO gas at low ppm levels AK Mauraya, D Mahana, G Jhaa, BK Pradhan, S Tomer, P Singh, ... Ceramics International 48 (24), 36556-36569, 2022 | 6 | 2022 |
A novel analytical method for determination of diode parameters from the dark forward IV characteristics of a silicon solar cell A Kumar, SN Singh, Jyoti, S Tomer, Vandana, SK Srivastava, M Dutta, ... Physica Scripta, 2023 | 2 | 2023 |
ALD deposited bipolar HfOx films for silicon surface passivation S Tomer, A Kumar, M Devi Surfaces and Interfaces, 103208, 2023 | 2 | 2023 |
Effect of ALD window on thermal ALD deposited HfOx/Si interface for silicon surface passivation S Tomer, J Panigrahi, P Pathi, G Gupta Materials Today: Proceedings 46, 5761-5765, 2021 | 2 | 2021 |
High-Quality Silicon Surface Passivation by Thermal-ALD Deposited Hafnium Oxide Films S Tomer, M Devi, A Kumar, S Laxmi, S Satapathy, KK Maurya, P Singh, ... IEEE Journal of Photovoltaics, 2023 | 1 | 2023 |
XPS and spectroscopic ellipsometry studies of HfO2/Si interface S Tomer, R Singh, J Panigrahi, L Subha, CMS Rauthan Proceedings of the seventeenth international conference on thin films: abstracts, 2017 | | 2017 |
Thermal ALD deposited hafnium oxide thin films for silicon surface passivation S Tomer Ghaziabad, 0 | | |