| Processing systems and methods for halide scavenging A Wang, X Chen, Z Li, H Hamana, C Zhijun, CM Hsu, J Huang, NK Ingle, ... US Patent 9,991,134, 2018 | 227 | 2018 |
| Processing systems and methods for halide scavenging A Wang, X Chen, Z Li, H Hamana, C Zhijun, CM Hsu, J Huang, NK Ingle, ... US Patent 9,153,442, 2015 | 215 | 2015 |
| Selective etch of silicon nitride C Zhijun, Z Li, A Wang, NK Ingle, S Venkataraman US Patent 8,956,980, 2015 | 212 | 2015 |
| Dry-etch for selective tungsten removal X Wang, CM Hsu, NK Ingle, Z Li, A Wang US Patent 8,980,763, 2015 | 202 | 2015 |
| Processing systems and methods for halide scavenging A Wang, X Chen, Z Li, H Hamana, C Zhijun, CM Hsu, J Huang, NK Ingle, ... US Patent 9,184,055, 2015 | 187 | 2015 |
| Dry-etch for selective tungsten removal X Wang, CM Hsu, NK Ingle, Z Li, A Wang US Patent 9,412,608, 2016 | 180 | 2016 |
| Processing systems and methods for halide scavenging A Wang, X Chen, Z Li, H Hamana, C Zhijun, CM Hsu, J Huang, NK Ingle, ... US Patent 9,093,371, 2015 | 179 | 2015 |
| Processing systems and methods for halide scavenging A Wang, X Chen, Z Li, H Hamana, C Zhijun, CM Hsu, J Huang, NK Ingle, ... US Patent 9,023,732, 2015 | 179 | 2015 |
| Processing systems and methods for halide scavenging A Wang, X Chen, Z Li, H Hamana, C Zhijun, CM Hsu, J Huang, NK Ingle, ... US Patent 9,449,850, 2016 | 177 | 2016 |
| Selective etch of silicon nitride C Zhijun, Z Li, A Wang, NK Ingle, S Venkataraman US Patent 9,209,012, 2015 | 168 | 2015 |
| Processing systems and methods for halide scavenging A Wang, X Chen, Z Li, H Hamana, C Zhijun, CM Hsu, J Huang, NK Ingle, ... US Patent 9,659,792, 2017 | 165 | 2017 |
| Silicon selective removal Z Li, CM Hsu, H Zhang, J Zhang US Patent 9,881,805, 2018 | 153 | 2018 |
| Processing systems and methods for halide scavenging A Wang, X Chen, Z Li, H Hamana, C Zhijun, CM Hsu, J Huang, NK Ingle, ... US Patent 9,704,723, 2017 | 147 | 2017 |
| Anisotropic gap etch J Xue, CM Hsu, Z Li, L Godet, A Wang, NK Ingle US Patent 9,502,258, 2016 | 136 | 2016 |
| Highly selective doped oxide removal method C Zhijun, Z Li, NK Ingle, A Wang, S Venkataraman US Patent 9,406,523, 2016 | 127 | 2016 |
| A silica sol–gel design strategy for nanostructured metallic materials SC Warren, MR Perkins, AM Adams, M Kamperman, AA Burns, H Arora, ... Nature Materials 11 (5), 460-467, 2012 | 124 | 2012 |
| Methods for selective etching of a silicon material using HF gas without nitrogen etchants NK Ingle, A Wang, Z Li, M Korolik US Patent 9,831,097, 2017 | 97 | 2017 |
| Effect of hydrotropic salt on the assembly transitions and rheological responses of cationic gemini surfactant solutions T Lu, J Huang, Z Li, S Jia, H Fu The Journal of Physical Chemistry B 112 (10), 2909-2914, 2008 | 95 | 2008 |
| Aqueous surfactant two-phase systems in a mixture of cationic gemini and anionic surfactants T Lu, Z Li, J Huang, H Fu Langmuir 24 (19), 10723-10728, 2008 | 75 | 2008 |
| Linking experiment and theory for three-dimensional networked binary metal nanoparticle–triblock terpolymer superstructures Z Li, K Hur, H Sai, T Higuchi, A Takahara, H Jinnai, SM Gruner, U Wiesner Nature communications 5 (1), 3247, 2014 | 72 | 2014 |
