Johan Böhlmark
Johan Böhlmark
Lamina Technologies
Verified email at lamina-tech.ch - Homepage
Title
Cited by
Cited by
Year
Ionized physical vapor deposition (IPVD): A review of technology and applications
U Helmersson, M Lattemann, J Bohlmark, AP Ehiasarian, ...
Thin solid films 513 (1-2), 1-24, 2006
10312006
The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge
J Bohlmark, M Lattemann, JT Gudmundsson, AP Ehiasarian, ...
Thin Solid Films 515 (4), 1522-1526, 2006
3042006
Ionization of sputtered metals in high power pulsed magnetron sputtering
J Bohlmark, J Alami, C Christou, AP Ehiasarian, U Helmersson
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 23 (1 …, 2005
2692005
Ion-assisted physical vapor deposition for enhanced film properties on nonflat surfaces
J Alami, POÅ Persson, D Music, JT Gudmundsson, J Bohlmark, ...
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 23 (2 …, 2005
2552005
Investigation of high power impulse magnetron sputtering pretreated interfaces for adhesion enhancement of hard coatings on steel
M Lattemann, AP Ehiasarian, J Bohlmark, PÅO Persson, U Helmersson
Surface and Coatings Technology 200 (22-23), 6495-6499, 2006
1482006
Phase tailoring of Ta thin films by highly ionized pulsed magnetron sputtering
J Alami, P Eklund, JM Andersson, M Lattemann, E Wallin, J Bohlmark, ...
Thin Solid Films 515 (7-8), 3434-3438, 2007
1282007
Spatial electron density distribution in a high-power pulsed magnetron discharge
J Bohlmark, JT Gudmundsson, J Alami, M Latteman, U Helmersson
IEEE Transactions on Plasma Science 33 (2), 346-347, 2005
1282005
Plasma dynamics in a highly ionized pulsed magnetron discharge
J Alami, JT Gudmundsson, J Bohlmark, J Birch, U Helmersson
Plasma Sources Science and Technology 14 (3), 525, 2005
1222005
Guiding the deposition flux in an ionized magnetron discharge
J Bohlmark, M Östbye, M Lattemann, H Ljungcrantz, T Rosell, ...
Thin Solid Films 515 (4), 1928-1931, 2006
1032006
Microstructure control of CrNx films during high power impulse magnetron sputtering
G Greczynski, J Jensen, J Böhlmark, L Hultman
Surface and Coatings Technology 205 (1), 118-130, 2010
802010
Measurement of the magnetic field change in a pulsed high current magnetron discharge
J Bohlmark, U Helmersson, M VanZeeland, I Axnäs, J Alami, N Brenning
Plasma Sources Science and Technology 13 (4), 654, 2004
782004
Industrial-scale deposition of highly adherent CNx films on steel substrates
E Broitman, Z Czigány, G Greczynski, J Böhlmark, R Cremer, L Hultman
Surface and Coatings Technology 204 (21-22), 3349-3357, 2010
372010
High power impulse magnetron sputtering discharges and thin film growth: A brief review
U Helmersson, M Lattemann, J Alami, J Böhlmark, AP Ehiasarian, ...
302005
La 9.33 Si 6 O 26 electrolyte thin films for IT-SOFC application deposited by a HIPIMS/DC hybrid magnetron sputtering process
CY Ma, P Briois, J Böhlmark, F Lapostolle, A Billard
Ionics 14 (6), 471-476, 2008
272008
Fundamentals of high power impulse magnetron sputtering
J Böhlmark
Institutionen för fysik, kemi och biologi, 2006
252006
Ultra-hard AlMgB 14 coatings fabricated by RF magnetron sputtering from a stoichiometric target
AM Grishin, SI Khartsev, J Böhlmark, M Ahlgren
JETP letters 100 (10), 680-687, 2015
172015
Reactive film growth of TiN by using high power impulse magnetron sputtering (HIPIMS)
J Böhlmark, M Lattemann, H Stranning, T Selinder, J Carlsson, ...
92006
Multilayered coated cutting tool
J Böhlmark, H Blomqvist
US Patent 8,758,890, 2014
52014
Evaluation of arc evaporated coatings on rounded surfaces and sharp edges
J Bohlmark, H Blomqvist, L Landälv, S Amerioun, M Ahlgren
Materials Science Forum 681, 145-150, 2011
42011
The ion energy distributions in a high power impulse magnetron plasma
J Bohlmark
47th Annual Technical Conference Proceedings of the Society of Vacuum …, 2004
32004
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Articles 1–20