Anil Kottantharayil
Title
Cited by
Cited by
Year
Analysis of the parasitic S/D resistance in multiple-gate FETs
A Dixit, A Kottantharayil, N Collaert, M Goodwin, M Jurczak, K De Meyer
IEEE Transactions on Electron Devices 52 (6), 1132-1140, 2005
3932005
Bulk planar junctionless transistor (BPJLT): An attractive device alternative for scaling
S Gundapaneni, S Ganguly, A Kottantharayil
IEEE Electron device letters 32 (3), 261-263, 2011
2022011
Multiple gate semiconductor device and method for forming same
A Kottantharayil, R Loo
US Patent App. 10/899,659, 2005
1882005
Effect of band-to-band tunneling on junctionless transistors
S Gundapaneni, M Bajaj, RK Pandey, KVRM Murali, S Ganguly, ...
IEEE transactions on electron devices 59 (4), 1023-1029, 2012
1582012
Enhanced Electrostatic Integrity of Short-Channel Junctionless Transistor With High- Spacers
S Gundapaneni, S Ganguly, A Kottantharayil
IEEE Electron Device Letters 32 (10), 1325-1327, 2011
1232011
Highly manufacturable FinFETs with sub-10nm fin width and high aspect ratio fabricated with immersion lithography
MJH Van Dal, N Collaert, G Doornbos, G Vellianitis, G Curatola, ...
2007 IEEE symposium on VLSI technology, 110-111, 2007
1052007
A functional 41-stage ring oscillator using scaled FinFET devices with 25-nm gate lengths and 10-nm fin widths applicable for the 45-nm CMOS node
N Collaert, A Dixit, M Goodwin, KG Anil, R Rooyackers, B Degroote, ...
IEEE Electron Device Letters 25 (8), 568-570, 2004
882004
Work function of Ni silicide phases on HfSiON and SiO/sub 2: NiSi, Ni/sub 2/Si, Ni/sub 31/Si/sub 12/, and Ni/sub 3/Si fully silicided gates
JA Kittl, MA Pawlak, A Lauwers, C Demeurisse, K Opsomer, KG Anil, ...
IEEE electron device letters 27 (1), 34-36, 2005
782005
Dual-Spacer Device Architecture for the Improvement of Performance of Silicon n-Channel Tunnel FETs
HG Virani, RBR Adari, A Kottantharayil
IEEE transactions on electron devices 57 (10), 2410-2417, 2010
712010
Layout density analysis of FinFETs
KG Anil, K Henson, S Biesemans, N Collaert
ESSDERC'03. 33rd Conference on European Solid-State Device Research, 2003 …, 2003
652003
Performance improvement of tall triple gate devices with strained SiN layers
N Collaert, A De Keersgieter, KG Anil, R Rooyackers, G Eneman, ...
IEEE electron device letters 26 (11), 820-822, 2005
602005
Impact of stochastic mismatch on measured SRAM performance of FinFETs with resist/spacer-defined fins: Role of line-edge-roughness
A Dixit, KG Anil, E Baravelli, P Roussel, A Mercha, C Gustin, M Bamal, ...
2006 International Electron Devices Meeting, 1-4, 2006
552006
Study of soiling loss on photovoltaic modules with artificially deposited dust of different gravimetric densities and compositions collected from different locations in India
JJ John, S Warade, G Tamizhmani, A Kottantharayil
IEEE journal of photovoltaics 6 (1), 236-243, 2015
532015
Visual degradation in field-aged crystalline silicon PV modules in India and correlation with electrical degradation
S Chattopadhyay, R Dubey, V Kuthanazhi, JJ John, CS Solanki, ...
IEEE Journal of photovoltaics 4 (6), 1470-1476, 2014
532014
Demonstration of fully Ni-silicided metal gates on HfO/sub 2/based high-k gate dielectrics as a candidate for low power applications
KG Anil, A Veloso, S Kubicek, T Schram, E Augendre, JF de Marneffe, ...
Digest of Technical Papers. 2004 Symposium on VLSI Technology, 2004., 190-191, 2004
512004
GIDL (gate-induced drain leakage) and parasitic schottky barrier leakage elimination in aggressively scaled HfO/sub 2/TiN FinFET devices
T Hoffmann, G Doornbos, I Ferain, N Collaert, P Zimmerman, M Goodwin, ...
IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest …, 2005
452005
Extraction of the top and sidewall mobility in FinFETs and the impact of fin-patterning processes and gate dielectrics on mobility
VV Iyengar, A Kottantharayil, FM Tranjan, M Jurczak, K De Meyer
IEEE transactions on electron devices 54 (5), 1177-1184, 2007
422007
Comprehensive study of performance degradation of field‐mounted photovoltaic modules in India
R Dubey, S Chattopadhyay, V Kuthanazhi, A Kottantharayil, ...
Energy Science & Engineering 5 (1), 51-64, 2017
412017
Enhanced performance of PMOS MUGFET via integration of conformal plasma-doped source/drain extensions
D Lenoble, K Anil, A De Keersgieter, P Eybens, N Collaert, R Rooyackers, ...
2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers., 168-169, 2006
402006
Ni fully silicided gates for 45 nm CMOS applications
JA Kittl, A Lauwers, MA Pawlak, MJH van Dal, A Veloso, KG Anil, ...
Microelectronic engineering 82 (3-4), 441-448, 2005
372005
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