| The effect of magnetic field strength and geometry on the deposition rate and ionized flux fraction in the HiPIMS discharge H Hajihoseini, M Čada, Z Hubička, S Ünaldi, MA Raadu, N Brenning, ... Plasma 2 (2), 201-221, 2019 | 50 | 2019 |
| Optimization of HiPIMS discharges: The selection of pulse power, pulse length, gas pressure, and magnetic field strength N Brenning, A Butler, H Hajihoseini, M Rudolph, MA Raadu, ... Journal of Vacuum Science & Technology A 38 (3), 2020 | 41 | 2020 |
| Optimizing the deposition rate and ionized flux fraction by tuning the pulse length in high power impulse magnetron sputtering M Rudolph, N Brenning, MA Raadu, H Hajihoseini, JT Gudmundsson, ... Plasma Sources Science and Technology 29 (5), 05LT01, 2020 | 41 | 2020 |
| Role of ionization fraction on the surface roughness, density, and interface mixing of the films deposited by thermal evaporation, dc magnetron sputtering, and HiPIMS: An … M Kateb, H Hajihoseini, JT Gudmundsson, S Ingvarsson Journal of Vacuum Science & Technology A 37 (3), 2019 | 30 | 2019 |
| Terahertz radiation enhancement in dipole photoconductive antenna on LT-GaAs using a gold plasmonic nanodisk array Mohammad Bashirpour, Jafar Poursafar, Mohammadreza Kolahdouz, Mohsen Hajari ... Optics & Laser Technology 120, 2019 | 28 | 2019 |
| Effect of substrate bias on properties of HiPIMS deposited vanadium nitride films H Hajihoseini, M Kateb, S Ingvarsson, JT Gudmundsson Thin Solid Films 663, 126-130, 2018 | 26 | 2018 |
| Influence of the magnetic field on the discharge physics of a high power impulse magnetron sputtering discharge M Rudolph, N Brenning, H Hajihoseini, MA Raadu, TM Minea, A Anders, ... Journal of Physics D: Applied Physics 55 (1), 015202, 2021 | 25 | 2021 |
| Comparison of magnetic and structural properties of permalloy Ni80Fe20 grown by dc and high power impulse magnetron sputtering M Kateb, H Hajihoseini, JT Gudmundsson, S Ingvarsson Journal of Physics D: Applied Physics 51 (28), 285005, 2018 | 24 | 2018 |
| Vanadium and vanadium nitride thin films grown by high power impulse magnetron sputtering H Hajihoseini, JT Gudmundsson Journal of Physics D: Applied Physics 50 (50), 505302, 2017 | 22 | 2017 |
| On the electron energy distribution function in the high power impulse magnetron sputtering discharge M Rudolph, A Revel, D Lundin, H Hajihoseini, N Brenning, MA Raadu, ... Plasma Sources Science and Technology 30 (4), 045011, 2021 | 19 | 2021 |
| On how to measure the probabilities of target atom ionization and target ion back-attraction in high-power impulse magnetron sputtering M Rudolph, H Hajihoseini, MA Raadu, JT Gudmundsson, N Brenning, ... Journal of Applied Physics 129 (3), 2021 | 19 | 2021 |
| Oblique angle deposition of nickel thin films by high-power impulse magnetron sputtering H Hajihoseini, M Kateb, SÞ Ingvarsson, JT Gudmundsson Beilstein Journal of Nanotechnology 10 (1), 1914-1921, 2019 | 19 | 2019 |
| Nano patterning and fabrication of single polypyrrole nanowires by electron beam lithography M Mahmoodian, H Hajihoseini, S Mohajerzadeh, M Fathipour Synthetic Metals 249, 14-24, 2019 | 19 | 2019 |
| HiPIMS optimization by using mixed high-power and low-power pulsing N Brenning, H Hajihoseini, M Rudolph, MA Raadu, JT Gudmundsson, ... Plasma Sources Science and Technology 30 (1), 015015, 2021 | 18 | 2021 |
| Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputtering H Hajihoseini, M Čada, Z Hubička, S Ünaldi, MA Raadu, N Brenning, ... Journal of Vacuum Science & Technology A 38 (3), 2020 | 17 | 2020 |
| Modeling of high power impulse magnetron sputtering discharges with graphite target H Eliasson, M Rudolph, N Brenning, H Hajihoseini, M Zanáška, ... Plasma Sources Science and Technology 30 (11), 115017, 2021 | 11 | 2021 |
| Strained interface layer contributions to the structural and electronic properties of epitaxial V2O3 films H Hajihoseini, EB Thorsteinsson, VV Sigurjonsdottir, UB Arnalds Applied Physics Letters 118 (16), 2021 | 11 | 2021 |
| Operating modes and target erosion in high power impulse magnetron sputtering M Rudolph, N Brenning, H Hajihoseini, MA Raadu, J Fischer, ... Journal of Vacuum Science & Technology A 40 (4), 2022 | 10 | 2022 |
| Plasma 2, 201 (2019) H Hajihoseini, M Čada, Z Hubička, S Ünaldi, MA Raadu, N Brenning, ... | 9 | |
| Target ion and neutral spread in high power impulse magnetron sputtering H Hajihoseini, N Brenning, M Rudolph, MA Raadu, D Lundin, J Fischer, ... Journal of Vacuum Science & Technology A 41 (1), 2023 | 8 | 2023 |
Jon Tomas GudmundssonUniversity of IcelandVerified email at hi.is
