Jon Tomas Gudmundsson
Jon Tomas Gudmundsson
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Title
Cited by
Cited by
Year
Ionized physical vapor deposition (IPVD): A review of technology and applications
U Helmersson, M Lattemann, J Bohlmark, AP Ehiasarian, ...
Thin solid films 513 (1-2), 1-24, 2006
10282006
High power impulse magnetron sputtering discharge
JT Gudmundsson, N Brenning, D Lundin, U Helmersson
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 30 (3†…, 2012
5272012
On the film density using high power impulse magnetron sputtering
M Samuelsson, D Lundin, J Jensen, MA Raadu, JT Gudmundsson, ...
Surface and Coatings Technology 205 (2), 591-596, 2010
3132010
The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge
J Bohlmark, M Lattemann, JT Gudmundsson, AP Ehiasarian, ...
Thin Solid Films 515 (4), 1522-1526, 2006
3032006
Ion-assisted physical vapor deposition for enhanced film properties on nonflat surfaces
J Alami, POŇ Persson, D Music, JT Gudmundsson, J Bohlmark, ...
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 23 (2†…, 2005
2532005
Oxygen discharges diluted with argon: dissociation processes
JT Gudmundsson, EG Thorsteinsson
Plasma Sources Science and Technology 16 (2), 399, 2007
2462007
Spatial and temporal behavior of the plasma parameters in a pulsed magnetron discharge
JT Gudmundsson, J Alami, U Helmersson
Surface and Coatings Technology 161 (2-3), 249-256, 2002
2282002
The low pressure Cl/O discharge and the role of ClO
EGTJT Gudmundsson
Plasma Sources Science and Technology 19 (5), 055008, 2010
208*2010
Electronegativity of low-pressure high-density oxygen discharges
JT Gudmundsson, IG Kouznetsov, KK Patel, MA Lieberman
Journal of Physics D: Applied Physics 34 (7), 1100, 2001
2062001
Evolution of the electron energy distribution and plasma parameters in a pulsed magnetron discharge
JT Gudmundsson, J Alami, U Helmersson
Applied Physics Letters 78 (22), 3427-3429, 2001
1562001
On the effect of the electron energy distribution on the plasma parameters of an argon discharge: a global (volume-averaged) model study
JT Gudmundsson
Plasma Sources Science and Technology 10 (1), 76, 2001
1552001
Improved volume-averaged model for steady and pulsed-power electronegative discharges
S Kim, MA Lieberman, AJ Lichtenberg, JT Gudmundsson
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 24 (6†…, 2006
1342006
Spatial electron density distribution in a high-power pulsed magnetron discharge
J Bohlmark, JT Gudmundsson, J Alami, M Latteman, U Helmersson
IEEE Transactions on Plasma Science 33 (2), 346-347, 2005
1272005
Experimental studies of O2/Ar plasma in a planar inductive discharge
JT Gudmundsson, T Kimura, MA Lieberman
Plasma Sources Science and Technology 8 (1), 22, 1999
1251999
Plasma dynamics in a highly ionized pulsed magnetron discharge
J Alami, JT Gudmundsson, J Bohlmark, J Birch, U Helmersson
Plasma Sources Science and Technology 14 (3), 525, 2005
1222005
The high power impulse magnetron sputtering discharge as an ionized physical vapor deposition tool
JT Gudmundsson
Vacuum 84 (12), 1360-1364, 2010
1112010
On the road to self-sputtering in high power impulse magnetron sputtering: particle balance and discharge characteristics
C Huo, D Lundin, MA Raadu, A Anders, JT Gudmundsson, N Brenning
Plasma Sources Science and Technology 23 (2), 025017, 2014
1052014
Recombination and detachment in oxygen discharges: the role of metastable oxygen molecules
JT Gudmundsson
Journal of Physics D: Applied Physics 37 (15), 2073, 2004
1022004
Low pressure hydrogen discharges diluted with argon explored using a global model
AT Hjartarson, EG Thorsteinsson, JT Gudmundsson
Plasma Sources Science and Technology 19 (6), 065008, 2010
962010
On the plasma parameters of a planar inductive oxygen discharge
JT Gudmundsson, AM Marakhtanov, KK Patel, VP Gopinath, ...
Journal of Physics D: Applied Physics 33 (11), 1323, 2000
962000
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Articles 1–20