Martin Knaut
Martin Knaut
Bestätigte E-Mail-Adresse bei
Zitiert von
Zitiert von
Atomic Layer Deposition for Coating of High Aspect Ratio TiO2 Nanotube Layers
R Zazpe, M Knaut, H Sopha, L Hromadko, M Albert, J Prikryl, ...
Langmuir 32 (41), 10551-10558, 2016
Ternary and quarternary TiSiN and TiSiCN nanocomposite coatings obtained by Chemical Vapor Deposition
I Endler, M Höhn, J Schmidt, S Scholz, M Herrmann, M Knaut
Surface and Coatings Technology 215, 133-140, 2013
Comparison of static and dynamic 18F-FDG PET/CT for quantification of pulmonary inflammation in acute lung injury
A Braune, F Hofheinz, T Bluth, T Kiss, J Wittenstein, M Scharffenberg, ...
Journal of Nuclear Medicine 60 (11), 1629-1634, 2019
Top-down fabricated reconfigurable FET with two symmetric and high-current on-states
M Simon, B Liang, D Fischer, M Knaut, A Tahn, T Mikolajick, WM Weber
IEEE Electron Device Letters 41 (7), 1110-1113, 2020
Atomic layer deposition for high aspect ratio through silicon vias
M Knaut, M Junige, V Neumann, H Wojcik, T Henke, C Hossbach, A Hiess, ...
Microelectronic Engineering 107, 80-83, 2013
In-situ real-time ellipsometric investigations during the atomic layer deposition of ruthenium: A process development from [(ethylcyclopentadienyl)(pyrrolyl) ruthenium] and …
M Knaut, M Junige, M Albert, JW Bartha
Journal of Vacuum Science & Technology A 30 (1), 2012
Experimental and simulation approach for process optimization of atomic layer deposited thin films in high aspect ratio 3D structures
MC Schwille, T Schössler, J Barth, M Knaut, F Schön, A Höchst, M Oettel, ...
Journal of Vacuum Science & Technology A 35 (1), 2017
Electrical evaluation of Ru–W (-N), Ru–Ta (-N) and Ru–Mn films as Cu diffusion barriers
H Wojcik, R Kaltofen, U Merkel, C Krien, S Strehle, J Gluch, M Knaut, ...
Microelectronic engineering 92, 71-75, 2012
A wired-AND transistor: Polarity controllable FET with multiple inputs
M Simon, J Trommer, B Liang, D Fischer, T Baldauf, MB Khan, A Heinzig, ...
2018 76th Device Research Conference (DRC), 1-2, 2018
Atomic layer deposited high-κ nanolaminates for silicon surface passivation
F Benner, PM Jordan, C Richter, DK Simon, I Dirnstorfer, M Knaut, ...
Journal of Vacuum Science & Technology B 32 (3), 2014
Preparation and characterization of CVD-TiN-coated carbon fibers for applications in metal matrix composites
AZ Abidin, R Kozera, M Höhn, I Endler, M Knaut, A Boczkowska, A Czulak, ...
Thin Solid Films 589, 479-486, 2015
Barrier performance optimization of atomic layer deposited diffusion barriers for organic light emitting diodes using x-ray reflectivity investigations
A Singh, H Klumbies, U Schröder, L Müller-Meskamp, M Geidel, M Knaut, ...
Applied Physics Letters 103 (23), 2013
Hard x-ray nanofocusing by refractive lenses of constant thickness
F Seiboth, M Scholz, J Patommel, R Hoppe, F Wittwer, J Reinhardt, ...
Applied Physics Letters 105 (13), 2014
Al2O3-TiO2 Nanolaminates for Conductive Silicon Surface Passivation
I Dirnstorfer, T Chohan, PM Jordan, M Knaut, DK Simon, JW Bartha, ...
IEEE Journal of Photovoltaics 6 (1), 86-91, 2015
Growth of aluminum oxide thin films with enhanced film density by the integration of in situ flash annealing into low-temperature atomic layer deposition
T Henke, M Knaut, C Hossbach, M Geidel, M Albert, JW Bartha
Surface and Coatings Technology 309, 600-608, 2017
Characterization of Ru–Mn composites for ULSI interconnects
H Wojcik, C Krien, U Merkel, JW Bartha, M Knaut, M Geidel, B Adolphi, ...
Microelectronic engineering 112, 103-109, 2013
Flash-enhanced atomic layer deposition: basics, opportunities, review, and principal studies on the flash-enhanced growth of thin films
T Henke, M Knaut, C Hossbach, M Geidel, L Rebohle, M Albert, ...
ECS Journal of Solid State Science and Technology 4 (7), P277, 2015
Effect of wet chemical substrate pretreatment on the growth behavior of Ta (N) films deposited by thermal ALD
S Strehle, H Schumacher, D Schmidt, M Knaut, M Albert, JW Bartha
Microelectronic engineering 85 (10), 2064-2067, 2008
Atomic layer deposition of anatase TiO2 on porous electrodes for dye-sensitized solar cells
I Dirnstorfer, H Mähne, T Mikolajick, M Knaut, M Albert, K Dubnack
Journal of Vacuum Science & Technology A 31 (1), 2013
Monitoring atomic layer deposition processes in situ and in real-time by spectroscopic ellipsometry
M Junige, M Geidel, M Knaut, M Albert, JW Bartha
2011 Semiconductor Conference Dresden, 1-4, 2011
Das System kann den Vorgang jetzt nicht ausführen. Versuchen Sie es später erneut.
Artikel 1–20