| Crystallization behavior of thin ALD-Al2O3 films S Jakschik, U Schroeder, T Hecht, M Gutsche, H Seidl, JW Bartha Thin solid films 425 (1-2), 216-220, 2003 | 360 | 2003 |
| Chemical bonding and reaction at metal/polymer interfaces PS Ho, PO Hahn, JW Bartha, GW Rubloff, FK LeGoues, BD Silverman Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 3 (3 …, 1985 | 313 | 1985 |
| Doped organic transistors operating in the inversion and depletion regime B Lüssem, ML Tietze, H Kleemann, C Hoßbach, JW Bartha, A Zakhidov, ... Nature communications 4 (1), 2775, 2013 | 215 | 2013 |
| PET/MRI in head and neck cancer: initial experience I Platzek, B Beuthien-Baumann, M Schneider, V Gudziol, J Langner, ... European journal of nuclear medicine and molecular imaging 40, 6-11, 2013 | 166* | 2013 |
| Photoemission spectroscopy study of aluminum–polyimide interface JW Bartha, PO Hahn, F LeGoues, PS Ho Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 3 (3 …, 1985 | 157 | 1985 |
| Low temperature etching of Si in high density plasma using SF6/O2 JW Bartha, J Greschner, M Puech, P Maquin Microelectronic Engineering 27 (1-4), 453-456, 1995 | 121 | 1995 |
| Physical characterization of thin ALD–Al2O3 films S Jakschik, U Schroeder, T Hecht, D Krueger, G Dollinger, A Bergmaier, ... Applied Surface Science 211 (1-4), 352-359, 2003 | 100 | 2003 |
| Thickness dependent barrier performance of permeation barriers made from atomic layer deposited alumina for organic devices H Klumbies, P Schmidt, M Hähnel, A Singh, U Schroeder, C Richter, ... Organic Electronics 17, 138-143, 2015 | 97 | 2015 |
| Atomic Layer Deposition for Coating of High Aspect Ratio TiO2 Nanotube Layers R Zazpe, M Knaut, H Sopha, L Hromadko, M Albert, J Prikryl, ... Langmuir 32 (41), 10551-10558, 2016 | 95 | 2016 |
| Interaction of metals with model polymer surfaces: Core level photoemission studies PN Sanda, JW Bartha, JG Clabes, JL Jordan, C Feger, BD Silverman, ... Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 4 (3 …, 1986 | 92 | 1986 |
| Structure and thermal stability of graded Ta–TaN diffusion barriers between Cu and SiO2 R Hübner, M Hecker, N Mattern, V Hoffmann, K Wetzig, C Wenger, ... Thin Solid Films 437 (1-2), 248-256, 2003 | 87 | 2003 |
| Anisotropy of thermal expansion of thin polyimide films G Elsner, J Kempf, JW Bartha, HH Wagner Thin Solid Films 185 (1), 189-197, 1990 | 84 | 1990 |
| Atomic Layer Deposition of Titanium Dioxide Thin Films from Cp*Ti(OMe)3 and Ozone M Rose, J Niinistö, P Michalowski, L Gerlich, L Wilde, I Endler, ... The Journal of Physical Chemistry C 113 (52), 21825-21830, 2009 | 65 | 2009 |
| PECVD (plasma enhanced chemical vapor deposition) method for depositing of tungsten or layers containing tungsten by in situ formation of tungsten fluorides JW Bartha, T Bayer, J Greschner, G Kraus, G Schmid US Patent 4,918,033, 1990 | 63 | 1990 |
| Temperature dependence of the sticking coefficient in atomic layer deposition M Rose, JW Bartha, I Endler Applied surface science 256 (12), 3778-3782, 2010 | 62 | 2010 |
| Breakdown and protection of ALD moisture barrier thin films F Nehm, H Klumbies, C Richter, A Singh, U Schroeder, T Mikolajick, ... ACS applied materials & interfaces 7 (40), 22121-22127, 2015 | 61 | 2015 |
| Temperature dependence of the reflectivity of silicon with surface oxide at wavelengths of 633 and 1047 nm J Heller, JW Bartha, CC Poon, AC Tam Applied Physics Letters 75 (1), 43-45, 1999 | 57 | 1999 |
| Molecular orbital analysis of the XPS spectra of PMDA‐ODA polymide and its polyamic acid precursor BD Silverman, JW Bartha, JG Clabes, PS Ho, AR Rossi Journal of Polymer Science Part A: Polymer Chemistry 24 (12), 3325-3333, 1986 | 53 | 1986 |
| Atomic layer deposition for high aspect ratio through silicon vias M Knaut, M Junige, V Neumann, H Wojcik, T Henke, C Hossbach, A Hiess, ... Microelectronic Engineering 107, 80-83, 2013 | 51 | 2013 |
| Applications of microstructured silicon wafers as internal reflection elements in attenuated total reflection Fourier transform infrared spectroscopy H Schumacher, U Künzelmann, B Vasilev, KJ Eichhorn, JW Bartha Applied spectroscopy 64 (9), 1022-1027, 2010 | 51 | 2010 |
