Johann W. Bartha
Johann W. Bartha
Professor für Halbleitertechnik, Technische Universität Dresden
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Cited by
Cited by
Crystallization behavior of thin ALD-Al2O3 films
S Jakschik, U Schroeder, T Hecht, M Gutsche, H Seidl, JW Bartha
Thin Solid Films 425 (1-2), 216-220, 2003
Chemical bonding and reaction at metal/polymer interfaces
PS Ho, PO Hahn, JW Bartha, GW Rubloff, FK LeGoues, BD Silverman
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 3 (3 …, 1985
Doped organic transistors operating in the inversion and depletion regime
B Lüssem, ML Tietze, H Kleemann, C Hoßbach, JW Bartha, A Zakhidov, ...
Nature communications 4 (1), 1-6, 2013
Photoemission spectroscopy study of aluminum–polyimide interface
JW Bartha, PO Hahn, F Legoues, PS Ho
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 3 (3 …, 1985
Interaction of metals with model polymer surfaces: Core level photoemission studies
PN Sanda, JW Bartha, JG Clabes, JL Jordan, C Feger, BD Silverman, ...
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 4 (3 …, 1986
Low temperature etching of Si in high density plasma using SF6/O2
JW Bartha, J Greschner, M Puech, P Maquin
Microelectronic Engineering 27 (1-4), 453-456, 1995
Structure and thermal stability of graded Ta–TaN diffusion barriers between Cu and SiO2
R Hübner, M Hecker, N Mattern, V Hoffmann, K Wetzig, C Wenger, ...
Thin Solid Films 437 (1-2), 248-256, 2003
Physical characterization of thin ALD–Al2O3 films
S Jakschik, U Schroeder, T Hecht, D Krueger, G Dollinger, A Bergmaier, ...
Applied surface science 211 (1-4), 352-359, 2003
Anisotropy of thermal expansion of thin polyimide films
G Elsner, J Kempf, JW Bartha, HH Wagner
Thin Solid Films 185 (1), 189-197, 1990
Thickness dependent barrier performance of permeation barriers made from atomic layer deposited alumina for organic devices
H Klumbies, P Schmidt, M Hähnel, A Singh, U Schroeder, C Richter, ...
Organic Electronics 17, 138-143, 2015
Atomic Layer Deposition for Coating of High Aspect Ratio TiO2 Nanotube Layers
R Zazpe, M Knaut, H Sopha, L Hromadko, M Albert, J Prikryl, ...
Langmuir 32 (41), 10551-10558, 2016
PECVD (plasma enhanced chemical vapor deposition) method for depositing of tungsten or layers containing tungsten by in situ formation of tungsten fluorides
JW Bartha, T Bayer, J Greschner, G Kraus, G Schmid
US Patent 4,918,033, 1990
Molecular orbital analysis of the XPS spectra of PMDA‐ODA polymide and its polyamic acid precursor
BD Silverman, JW Bartha, JG Clabes, PS Ho, AR Rossi
Journal of Polymer Science Part A: Polymer Chemistry 24 (12), 3325-3333, 1986
Atomic Layer Deposition of Titanium Dioxide Thin Films from Cp*Ti(OMe)3 and Ozone
M Rose, J Niinistö, P Michalowski, L Gerlich, L Wilde, I Endler, ...
The Journal of Physical Chemistry C 113 (52), 21825-21830, 2009
Temperature dependence of the sticking coefficient in atomic layer deposition
M Rose, JW Bartha, I Endler
Applied surface science 256 (12), 3778-3782, 2010
Method of producing micromechanical sensors for the afm/stm profilometry
JW Bartha, T Bayer, J Greschner, G Kraus, H Weiss, O Wolter
US Patent 5,116,462, 1992
Influence of Al/sub 2/O/sub 3/dielectrics on the trap-depth profiles in MOS devices investigated by the charge-pumping method
S Jakschik, A Avellan, U Schroeder, JW Bartha
IEEE transactions on electron devices 51 (12), 2252-2255, 2004
In Situ Reaction Mechanism Studies on Ozone-Based Atomic Layer Deposition of Al2O3 and HfO2
M Rose, J Niinistö, I Endler, JW Bartha, P Kücher, M Ritala
ACS applied materials & interfaces 2 (2), 347-350, 2010
Method to determine the sticking coefficient of precursor molecules in atomic layer deposition
M Rose, JW Bartha
Applied surface science 255 (13-14), 6620-6623, 2009
Breakdown and protection of ALD moisture barrier thin films
F Nehm, H Klumbies, C Richter, A Singh, U Schroeder, T Mikolajick, ...
ACS applied materials & interfaces 7 (40), 22121-22127, 2015
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