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Jan Schäfer
Jan Schäfer
Experimental Physicist, Leibniz Institute for Plasma Science and Technology
Verified email at inp-greifswald.de - Homepage
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Cited by
Year
Self-supported Pt–CoO networks combining high specific activity with high surface area for oxygen reduction
GW Sievers, AW Jensen, J Quinson, A Zana, F Bizzotto, M Oezaslan, ...
Nature materials 20 (2), 208-213, 2021
1462021
Local deposition of SiOx plasma polymer films by a miniaturized atmospheric pressure plasma jet (APPJ)
J Schäfer, R Foest, A Quade, A Ohl, KD Weltmann
Journal of Physics D: Applied Physics 41 (19), 194010, 2008
1342008
Detection of ozone in a MHz argon plasma bullet jet
S Reuter, J Winter, S Iseni, S Peters, A Schmidt-Bleker, M Dünnbier, ...
Plasma Sources Science and Technology 21 (3), 034015, 2012
1322012
White paper on the future of plasma science and technology in plastics and textiles
U Cvelbar, JL Walsh, M Černák, HW de Vries, S Reuter, T Belmonte, ...
Plasma Processes and Polymers 16 (1), 1700228, 2019
932019
Chemical composition and bond structure of carbon-nitride films deposited by CH4/N2 dielectric barrier discharge
A Majumdar, J Schäfer, P Mishra, D Ghose, J Meichsner, R Hippler
Surface and Coatings Technology 201 (14), 6437-6444, 2007
702007
Miniaturized non-thermal atmospheric pressure plasma jet—Characterization of self-organized regimes
J Schäfer, R Foest, A Ohl, KD Weltmann
Plasma Physics and Controlled Fusion 51 (12), 124045, 2009
552009
Chemical Composition of SiOx Films Deposited by an Atmospheric Pressure Plasma Jet (APPJ)
J Schäfer, R Foest, A Quade, A Ohl, KD Weltmann
Plasma Processes and Polymers 6 (S1), S519-S524, 2009
472009
On plasma parameters of a self-organized plasma jet at atmospheric pressure
J Schäfer, F Sigeneger, R Foest, D Loffhagen, KD Weltmann
The european physical journal D 60 (3), 531-538, 2010
462010
Carbon-free SiOx films deposited from octamethylcyclotetrasiloxane (OMCTS) by an atmospheric pressure plasma jet (APPJ)
J Schäfer, R Foest, A Quade, A Ohl, J Meichsner, KD Weltmann
The European Physical Journal D 54, 211-217, 2009
422009
Liquid assisted plasma enhanced chemical vapour deposition with a non-thermal plasma jet at atmospheric pressure
J Schäfer, K Fricke, F Mika, Z Pokorná, L Zajíčková, R Foest
Thin Solid Films 630, 71-78, 2017
392017
Functionalisation and pore size control of electrospun PA6 nanofibres using a microwave jet plasma
D Pavliňák, J Hnilica, A Quade, J Schäfer, M Alberti, V Kudrle
Polymer degradation and stability 108, 48-55, 2014
372014
Evaluation of composition, mechanical properties and structure of nc-TiC/aC: H coatings prepared by balanced magnetron sputtering
P Souček, T Schmidtová, L Zábranský, V Buršíková, P Vašina, O Caha, ...
Surface and Coatings Technology 211, 111-116, 2012
362012
Atmospheric-pressure plasma treatment of polyamide 6 composites for bonding with polyurethane
J Schäfer, T Hofmann, J Holtmannspötter, M Frauenhofer, ...
Journal of Adhesion Science and Technology 29 (17), 1807-1819, 2015
352015
Plasma-functionalized water: from bench to prototype for fresh-cut lettuce
U Schnabel, O Handorf, J Stachowiak, D Boehm, C Weit, T Weihe, ...
Food Engineering Reviews 13, 115-135, 2021
302021
PECVD of nanostructured SiO2 in a modulated microwave plasma jet at atmospheric pressure
J Hnilica, J Schäfer, R Foest, L Zajíčková, V Kudrle
Journal of Physics D: Applied Physics 46 (33), 335202, 2013
302013
Characterization of a periodic instability in filamentary surface wave discharge at atmospheric pressure in argon
J Hnilica, V Kudrle, P Vašina, J Schäfer, V Aubrecht
Journal of Physics D: Applied Physics 45 (5), 055201, 2012
302012
Striated microdischarges in an asymmetric barrier discharge in argon at atmospheric pressure
T Hoder, D Loffhagen, C Wilke, H Grosch, J Schäfer, KD Weltmann, ...
Physical Review E 84 (4), 046404, 2011
292011
Tetrakis (trimethylsilyloxy) silane for nanostructured SiO2-like films deposited by PECVD at atmospheric pressure
J Schäfer, J Hnilica, J Šperka, A Quade, V Kudrle, R Foest, J Vodák, ...
Surface and Coatings Technology 295, 112-118, 2016
282016
Laser schlieren deflectometry for temperature analysis of filamentary non-thermal atmospheric pressure plasma
J Schäfer, R Foest, S Reuter, T Kewitz, J Šperka, KD Weltmann
Review of Scientific Instruments 83 (10), 2012
282012
Room temperature plasma oxidation in DCSBD: A new method for preparation of silicon dioxide films at atmospheric pressure
D Skácelová, V Danilov, J Schäfer, A Quade, P Sťahel, M Černák, ...
Materials Science and Engineering: B 178 (9), 651-655, 2013
272013
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