Self-supported Pt–CoO networks combining high specific activity with high surface area for oxygen reduction GW Sievers, AW Jensen, J Quinson, A Zana, F Bizzotto, M Oezaslan, ... Nature materials 20 (2), 208-213, 2021 | 146 | 2021 |
Local deposition of SiOx plasma polymer films by a miniaturized atmospheric pressure plasma jet (APPJ) J Schäfer, R Foest, A Quade, A Ohl, KD Weltmann Journal of Physics D: Applied Physics 41 (19), 194010, 2008 | 134 | 2008 |
Detection of ozone in a MHz argon plasma bullet jet S Reuter, J Winter, S Iseni, S Peters, A Schmidt-Bleker, M Dünnbier, ... Plasma Sources Science and Technology 21 (3), 034015, 2012 | 132 | 2012 |
White paper on the future of plasma science and technology in plastics and textiles U Cvelbar, JL Walsh, M Černák, HW de Vries, S Reuter, T Belmonte, ... Plasma Processes and Polymers 16 (1), 1700228, 2019 | 93 | 2019 |
Chemical composition and bond structure of carbon-nitride films deposited by CH4/N2 dielectric barrier discharge A Majumdar, J Schäfer, P Mishra, D Ghose, J Meichsner, R Hippler Surface and Coatings Technology 201 (14), 6437-6444, 2007 | 70 | 2007 |
Miniaturized non-thermal atmospheric pressure plasma jet—Characterization of self-organized regimes J Schäfer, R Foest, A Ohl, KD Weltmann Plasma Physics and Controlled Fusion 51 (12), 124045, 2009 | 55 | 2009 |
Chemical Composition of SiOx Films Deposited by an Atmospheric Pressure Plasma Jet (APPJ) J Schäfer, R Foest, A Quade, A Ohl, KD Weltmann Plasma Processes and Polymers 6 (S1), S519-S524, 2009 | 47 | 2009 |
On plasma parameters of a self-organized plasma jet at atmospheric pressure J Schäfer, F Sigeneger, R Foest, D Loffhagen, KD Weltmann The european physical journal D 60 (3), 531-538, 2010 | 46 | 2010 |
Carbon-free SiOx films deposited from octamethylcyclotetrasiloxane (OMCTS) by an atmospheric pressure plasma jet (APPJ) J Schäfer, R Foest, A Quade, A Ohl, J Meichsner, KD Weltmann The European Physical Journal D 54, 211-217, 2009 | 42 | 2009 |
Liquid assisted plasma enhanced chemical vapour deposition with a non-thermal plasma jet at atmospheric pressure J Schäfer, K Fricke, F Mika, Z Pokorná, L Zajíčková, R Foest Thin Solid Films 630, 71-78, 2017 | 39 | 2017 |
Functionalisation and pore size control of electrospun PA6 nanofibres using a microwave jet plasma D Pavliňák, J Hnilica, A Quade, J Schäfer, M Alberti, V Kudrle Polymer degradation and stability 108, 48-55, 2014 | 37 | 2014 |
Evaluation of composition, mechanical properties and structure of nc-TiC/aC: H coatings prepared by balanced magnetron sputtering P Souček, T Schmidtová, L Zábranský, V Buršíková, P Vašina, O Caha, ... Surface and Coatings Technology 211, 111-116, 2012 | 36 | 2012 |
Atmospheric-pressure plasma treatment of polyamide 6 composites for bonding with polyurethane J Schäfer, T Hofmann, J Holtmannspötter, M Frauenhofer, ... Journal of Adhesion Science and Technology 29 (17), 1807-1819, 2015 | 35 | 2015 |
Plasma-functionalized water: from bench to prototype for fresh-cut lettuce U Schnabel, O Handorf, J Stachowiak, D Boehm, C Weit, T Weihe, ... Food Engineering Reviews 13, 115-135, 2021 | 30 | 2021 |
PECVD of nanostructured SiO2 in a modulated microwave plasma jet at atmospheric pressure J Hnilica, J Schäfer, R Foest, L Zajíčková, V Kudrle Journal of Physics D: Applied Physics 46 (33), 335202, 2013 | 30 | 2013 |
Characterization of a periodic instability in filamentary surface wave discharge at atmospheric pressure in argon J Hnilica, V Kudrle, P Vašina, J Schäfer, V Aubrecht Journal of Physics D: Applied Physics 45 (5), 055201, 2012 | 30 | 2012 |
Striated microdischarges in an asymmetric barrier discharge in argon at atmospheric pressure T Hoder, D Loffhagen, C Wilke, H Grosch, J Schäfer, KD Weltmann, ... Physical Review E 84 (4), 046404, 2011 | 29 | 2011 |
Tetrakis (trimethylsilyloxy) silane for nanostructured SiO2-like films deposited by PECVD at atmospheric pressure J Schäfer, J Hnilica, J Šperka, A Quade, V Kudrle, R Foest, J Vodák, ... Surface and Coatings Technology 295, 112-118, 2016 | 28 | 2016 |
Laser schlieren deflectometry for temperature analysis of filamentary non-thermal atmospheric pressure plasma J Schäfer, R Foest, S Reuter, T Kewitz, J Šperka, KD Weltmann Review of Scientific Instruments 83 (10), 2012 | 28 | 2012 |
Room temperature plasma oxidation in DCSBD: A new method for preparation of silicon dioxide films at atmospheric pressure D Skácelová, V Danilov, J Schäfer, A Quade, P Sťahel, M Černák, ... Materials Science and Engineering: B 178 (9), 651-655, 2013 | 27 | 2013 |